Method for cleaning substrate and cleaning device

Abstract

According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

What is claimed is: 
     
         1 . A method for cleaning a substrate, comprising:
 supplying a liquid onto a substrate;   solidifying the liquid on the substrate to form a solidified body; and   melting the solidified body on the substrate,   wherein an internal pressure of the liquid on the substrate is varied when solidifying the liquid.   
     
     
         2 . The method according to  claim 1 , wherein during the solidifying, the internal pressure of the liquid on the substrate is changed to a supercooled state. 
     
     
         3 . The method according to  claim 2 , further comprising:
 measuring a temperature of the liquid on the substrate,   wherein during the solidifying, the internal pressure of the liquid on the substrate is changed based on temperature information which is obtained from the measuring.   
     
     
         4 . The method according to  claim 3 , wherein the internal pressure of the liquid is changed when a stimulus is applied to the liquid. 
     
     
         5 . The method according to  claim 4 , wherein the supplying is performed in a state where the substrate is cooled. 
     
     
         6 . The method according to  claim 2 , wherein the internal pressure of the liquid is changed when a stimulus is applied to the liquid. 
     
     
         7 . The method according to  claim 2 , wherein the supplying is performed in a state where the substrate is cooled. 
     
     
         8 . The method according to  claim 1 , further comprising:
 measuring a temperature of the liquid on the substrate,   wherein during the solidifying, the internal pressure of the liquid on the substrate is changed based on temperature information which is obtained from the measuring.   
     
     
         9 . The method according to  claim 1 , wherein the internal pressure of the liquid is changed when a stimulus is applied to the liquid. 
     
     
         10 . The method according to  claim 1 , wherein the supplying is performed in a state where the substrate is cooled. 
     
     
         11 . A cleaning device, comprising:
 a liquid supplying mechanism for supplying a liquid onto a substrate;   a driving mechanism for rotating the substrate;   a cooling gas supplying mechanism for supplying a cooling gas onto the substrate;   a thermometer for measuring a temperature of the liquid; and   a control device that changes an internal pressure of the liquid based on the temperature of the liquid.   
     
     
         12 . The cleaning device of  claim 11 , wherein the control device controls the driving mechanism to vary a rotational speed of the substrate. 
     
     
         13 . The cleaning device of  claim 11 , wherein
 the liquid comprises a first liquid, and   the control device comprises a liquid supplying nozzle for delivering a second liquid to the liquid.   
     
     
         14 . The cleaning device of  claim 11 , wherein the control device comprises an ultrasound wave generating device. 
     
     
         15 . The cleaning device of  claim 11 , wherein
 the substrate is disposed on a plurality of lift pins, and   the control device comprises a lift pin driving portion that moves the lift pins into and out of contact with the liquid.   
     
     
         16 . The cleaning device of  claim 11 , wherein the control device comprises a vibrating pole that moves into and out of contact with the liquid. 
     
     
         17 . The cleaning device of  claim 11 , wherein the control device comprises a vibrating pole that moves into and out of contact with the substrate. 
     
     
         18 . The cleaning device of  claim 11 , wherein
 the substrate is disposed in a chamber, and   the control device comprises a gas supplying mechanism and exhaust mechanism that varies a pressure in the chamber.   
     
     
         19 . A cleaning device, comprising:
 a liquid supplying mechanism for supplying a liquid onto a substrate;   a driving mechanism for rotating the substrate;   a cooling gas supplying mechanism for supplying a cooling gas onto the substrate;   a thermometer for measuring a temperature of the liquid; and   a control device that changes an internal pressure of the liquid based on the temperature of the liquid.   
     
     
         20 . The cleaning device of  claim 19 , wherein the substrate comprises a nanoimprint template.