Exposure apparatus, flat panel display manufacturing method, and device manufacturing method

Abstract

A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

1 . An exposure apparatus that irradiates an object held by a movable body which moves in a first direction and a second direction orthogonal to each other with an illumination light via an optical system, while the movable body is moving in the first direction, comprising:
 a first measured section measured based on movement of the movable body in the first direction;   a first measuring section measuring the first measured section while relatively moving in the first direction with respect to the first measured section, based on movement of the movable body in the first direction;   a plurality of second measured sections arranged at different positions in the first direction, being measured based on movement of the movable body in the second direction; and   a plurality of second measuring sections arranged at each of the plurality of second measured sections that measures the second measured sections while relatively moving in the second direction with respect to the second measured section, based on movement of the movable body in the second direction.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein
 position information of the movable body in the first direction and the second direction is obtained, based on an output of the first measuring section and an output of the second measuring section.   
     
     
         3 . The exposure apparatus according to  claim 1 , wherein
 the first measuring section and the second measuring section move integrally,   position information in the first direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the first measured section, based on movement of the movable body in the first direction, and   position information in the second direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the second measured section, based on movement of the movable body in the second direction.   
     
     
         4 . The exposure apparatus according to  claim 3 , wherein
 the first measured section includes a first grating member in which a plurality of grating areas is arranged separately in the first direction,   
       the first measuring section includes a head irradiating the first grating member with a measurement beam,
 the second measured section includes a second grating member in which a plurality of grating areas is arranged separately in the second direction, and 
 the second measuring section includes a head irradiating the second grating member with a measurement beam. 
 
     
     
         5 . The exposure apparatus according to  claim 1 , wherein
 the first measured section is provided on the movable body.   
     
     
         6 . The exposure apparatus according to  claim 1 , wherein
 the second measured section is provided at a holding member that holds the optical system.   
     
     
         7 . The exposure apparatus according to  claim 1 , wherein
 the plurality of second measured sections is arranged at a separate positions in the first direction.   
     
     
         8 . The exposure apparatus according to  claim 1 , wherein
 the optical system comprises a plurality of lens modules including a plurality of projection lenses arranged side by side in the second direction that irradiates a substrate with the illumination light,   the plurality of lens modules is arranged separately in the first direction, and   the plurality of second measured sections is arranged so that positions in the first direction overlap with respect to each of the plurality of lens modules.   
     
     
         9 . The exposure apparatus according to  claim 1 , wherein
 the apparatus has a mark measurement system that measures a mark formed on the substrate,   the optical system includes a projection optical system that irradiates a substrate with the illumination light, and   the plurality of second measured sections is arranged so that positions in the first direction overlap with respect to each of the measurement system and the projection optical system.   
     
     
         10 . The exposure apparatus according to  claim 9 , wherein
 of the plurality of second measured sections, a second measured section corresponding to the measurement system is structured so that length in the second direction is shorter than that of a second measuring section corresponding to the projection optical system.   
     
     
         11 . The exposure apparatus according to  claim 9 , wherein
 the mark measurement system is provided in a plurality of numbers arranged apart in the second direction, and with relative spacing between at least two mark measurement systems being changeable.   
     
     
         12 .- 34 . (canceled) 
     
     
         35 . The exposure apparatus according to  claim 1 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         36 . The exposure apparatus according to  claim 1 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         37 . The exposure apparatus according to  claim 36 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         38 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 1 , and   developing the object which has been exposed.   
     
     
         39 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 1 ; and   developing the object which has been exposed.   
     
     
         40 . An exposure apparatus that irradiates an object held by a movable body which moves in a first direction and a second direction orthogonal to each other with an illumination light via an optical system, while the movable body is moving in the first direction, comprising:
 a plurality of measured sections arranged at positions different in the first direction measured based on movement of the movable body in the second direction to obtain position information in the second direction of the movable body; and   a plurality of measuring sections provided at each of the plurality of measured sections that measures the measured sections while relatively moving in the second direction with respect to the measured section, based on movement of the object in the second direction.   
     
     
         41 . The exposure apparatus according to  claim 40 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         42 . The exposure apparatus according to  claim 40 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         43 . The exposure apparatus according to  claim 42 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         44 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 40 , and   developing the object which has been exposed.   
     
     
         45 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 40 ; and   developing the object which has been exposed.   
     
     
         46 . An exposure apparatus that irradiates an object held within a plane including a first direction and a second direction orthogonal to each other movable in the first direction and the second direction with an illumination light via an optical system, while the object is moved in the first direction, comprising:
 a plurality of measured sections arranged at positions different in the first direction measured based on movement of the object in the second direction to obtain position information in the second direction of the object; and   a plurality of measuring sections provided at each of the plurality of measured sections that measures the measured sections while relatively moving in the second direction with respect to the measured section, based on movement of the object in the second direction.   
     
     
         47 . The exposure apparatus according to  claim 46 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         48 . The exposure apparatus according to  claim 46 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         49 . The exposure apparatus according to  claim 48 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         50 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 46 , and   developing the object which has been exposed.   
     
     
         51 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 46 ; and   developing the object which has been exposed.   
     
     
         52 . An exposure apparatus that irradiates an object held by a movable body which moves in a first direction and a second direction orthogonal to each other with an illumination light via an optical system, while the movable body is moving in the first direction, comprising:
 a first measured section measured based on movement of the movable body in the first direction; and   a first measuring section measuring the first measured section while relatively moving in the first direction with respect to the first measured section, based on movement of the movable body in the first direction when being arranged facing the first measured section, wherein   the first measuring section includes a plurality of first measuring sections that moves in the second direction based on movement of the movable body in the second direction and is arranged facing the first measured section at different positions in the second direction.   
     
     
         53 . The exposure apparatus according to  claim 52 , wherein
 the first measured section includes a plurality of first measured sections arranged at different positions in the second direction measured based on movement of the movable body in the first direction, and   each of the plurality of first measuring sections measures each of the first measured sections while relatively moving in the first direction with respect to the first measured section, based on movement of the movable body in the first direction, while maintaining a state of being arranged facing a corresponding first measured section of the plurality of first measured sections.   
     
     
         54 . The exposure apparatus according to  claim 53 , wherein
 the plurality of first measuring sections moves in the second direction based on movement of the movable body in the second direction, while maintaining relative positional relation in the second direction of each of the first measuring sections.   
     
     
         55 . The exposure apparatus according to  claim 52 , wherein
 movable range in the second direction differs among the plurality of first measuring sections.   
     
     
         56 . The exposure apparatus according to  claim 55 , wherein
 movable range in the second direction of the plurality of first measuring sections is continuous.   
     
     
         57 . The exposure apparatus according to  claim 55 , wherein
 the plurality of first measuring sections all measure the second measured section moved to a predetermined position in the second direction.   
     
     
         58 . The exposure apparatus according to  claim 57 , wherein
 the plurality of first measuring sections simultaneously measures the first measured section positioned at the predetermined position.   
     
     
         59 . The exposure apparatus according to  claim 55 , wherein
 movable range in the second direction of the plurality of first measuring sections is discontinuous in the second direction.   
     
     
         60 . The exposure apparatus according to  claim 59 , further having:
 a position measurement system that measures position in the second direction of the movable body in the discontinuous section.   
     
     
         61 . The exposure apparatus according to  claim 60 , wherein
 the measurement system includes an interferometer, and   position of the movable body in the second direction is obtained, based on an output of the first measuring section and an output of the position measurement system.   
     
     
         62 . The exposure apparatus according to  claim 52 , having:
 a second measured section measured based on movement of the movable body in the second direction; and   a plurality of second measuring sections measuring the second measured section while relatively moving in the second direction with respect to the second measured section, based on movement of the movable body in the second direction, wherein   the first measuring section and the second measuring section move integrally,   position information in the first direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the first measured section, based on movement of the movable body in the first direction, and   position information in the second direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the second measured section, based on movement of the movable body in the second direction.   
     
     
         63 . The exposure apparatus according to  claim 62 , wherein
 the first measured section includes a first grating member in which a plurality of grating areas is arranged separately in the first direction,   the first measuring section includes a head irradiating the first grating member with a measurement beam,   the second measured section includes a second grating member in which a plurality of grating areas is arranged separately in the second direction, and   the second measuring section includes a head irradiating the second grating member with a measurement beam.   
     
     
         64 . The exposure apparatus according to  claim 62 , wherein
 the first measured section is provided on the movable body.   
     
     
         65 . The exposure apparatus according to  claim 62 , wherein
 the second measured section is provided at a holding member that holds the optical system.   
     
     
         66 . The exposure apparatus according to  claim 52 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         67 . The exposure apparatus according to  claim 52 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         68 . The exposure apparatus according to  claim 67 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         69 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 52 , and   developing the object which has been exposed.   
     
     
         70 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 52 ; and   developing the object which has been exposed.   
     
     
         71 . An exposure apparatus that irradiates an object held by a movable body which moves in a first direction and a second direction orthogonal to each other with an illumination light via an optical system, while the movable body is moving in the first direction, comprising:
 a plurality of first measured sections arranged at different positions in the second direction, being measured based on movement of the movable body in the first direction; and   a plurality of first measuring sections that measures the first measured sections while relatively moving in the first direction with respect to the first measured sections, based on movement of the movable body in the first direction, at a position to measure the plurality of first measured sections.   
     
     
         72 . The exposure apparatus according to  claim 71 , having:
 a second measured section measured based on movement of the movable body in the second direction; and   a plurality of second measuring sections measuring the second measured section while relatively moving in the second direction with respect to the second measured section, based on movement of the movable body in the second direction, wherein   the first measuring section and the second measuring section move integrally,   position information in the first direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the first measured section, based on movement of the movable body in the first direction, and   position information in the second direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the second measured section, based on movement of the movable body in the second direction.   
     
     
         73 . The exposure apparatus according to  claim 72 , wherein
 the first measured section includes a first grating member in which a plurality of grating areas is arranged separately in the first direction,   the first measuring section includes a head irradiating the first grating member with a measurement beam,   the second measured section includes a second grating member in which a plurality of grating areas is arranged separately in the second direction, and   the second measuring section includes a head irradiating the second grating member with a measurement beam.   
     
     
         74 . The exposure apparatus according to  claim 72 , wherein
 the first measured section is provided on the movable body.   
     
     
         75 . The exposure apparatus according to  claim 72 , wherein
 the second measured section is provided at a holding member that holds the optical system.   
     
     
         76 . The exposure apparatus according to  claim 71 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         77 . The exposure apparatus according to  claim 71 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         78 . The exposure apparatus according to  claim 77 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         79 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 71 , and   developing the object which has been exposed.   
     
     
         80 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 71 ; and   developing the object which has been exposed.   
     
     
         81 . An exposure apparatus that irradiates an object held by a movable body which moves in a first direction and a second direction orthogonal to each other with an illumination light via an optical system, while the movable body is moving in the first direction, comprising:
 a measured section measured based on movement of the movable body in the first direction; and   a measuring section measuring the measured section while relatively moving in the first direction with respect to the measured section, based on movement of the movable body in the first direction when being arranged facing the measured section, wherein   the measured section is movable to a first position and a second position different from each other in the second direction, and   the measuring section includes a first measuring section arranged facing the measured section which has moved to the first position, and a second measuring section arranged facing the measure section which has moved to the second position.   
     
     
         82 . The exposure apparatus according to  claim 81 , having:
 a second measured section measured based on movement of the movable body in the second direction; and   a plurality of second measuring sections measuring the second measured section while relatively moving in the second direction with respect to the second measured section, based on movement of the movable body in the second direction, wherein   the first measuring section and the second measuring section move integrally,   position information in the first direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the first measured section, based on movement of the movable body in the first direction, and   position information in the second direction is obtained based on an output of the first measuring section and the second measuring section on the relative movement with respect to the second measured section, based on movement of the movable body in the second direction.   
     
     
         83 . The exposure apparatus according to  claim 82 , wherein
 the first measured section includes a first grating member in which a plurality of grating areas is arranged separately in the first direction,   the first measuring section includes a head irradiating the first grating member with a measurement beam,   the second measured section includes a second grating member in which a plurality of grating areas is arranged separately in the second direction, and   the second measuring section includes a head irradiating the second grating member with a measurement beam.   
     
     
         84 . The exposure apparatus according to  claim 82 , wherein
 the first measured section is provided on the movable body.   
     
     
         85 . The exposure apparatus according to  claim 82 , wherein
 the second measured section is provided at a holding member that holds the optical system.   
     
     
         86 . The exposure apparatus according to  claim 81 , wherein
 a predetermined pattern is formed on the object using an energy beam as the illumination light.   
     
     
         87 . The exposure apparatus according to  claim 81 , wherein
 the object is a substrate used in a flat panel display.   
     
     
         88 . The exposure apparatus according to  claim 87 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more.   
     
     
         89 . A making method of a flat panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 81 , and   developing the object which has been exposed.   
     
     
         90 . A device manufacturing method, comprising:
 exposing the object using any one of the exposure apparatus according to  claim 81 ; and   developing the object which has been exposed.