Method for depositing film

Abstract

The method for depositing a film of the present invention includes the first film deposition step of depositing a first film 103 having hardness higher than hardness of a substrate 101 on a surface of the substrate 101 , the first irradiation step of irradiating particles having energy on the first film 103 , and the second film deposition step of depositing an oil-repellent film 105 on a surface of the first film 103 subjected to the first irradiation step. A method for depositing a film enabling production of an oil-repellent substrate includes an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.

1 . A method for preparing an abrasion resistant oil-repellent film on a substrate comprising:
 a first film deposition process for depositing a first film on a surface of a substrate by a film deposition method of repeating a sputtering treatment and a plasma exposure treatment alternately,   a first irradiation process for irradiating first particles having energy to the first film, and   a second film deposition process for depositing a second film having oil repellency on a surface of the first film after the first irradiation process.   
     
     
         2 . The method for depositing a film according to  claim 1 ,
 wherein the film deposition method is used to deposit a first film on a substrate surface to form a film having a predetermined thickness and the film deposition stops at the point;   as a first irradiation step, irradiation of the first particles starts from reaction gas active species in a first ion beam or first plasma so as to perform a treatment on the deposited first film surface; and   a vacuum deposition method is used to deposit a second film having oil repellency on the surface subjected to the treatment so as to form an abrasion resistant oil-repellent film on the substrate.   
     
     
         3 . The method for depositing a film according to  claim 2 ,
 wherein the first film is configured in a way so that the first film and the second film form the abrasion resistant oil-repellent film on the substrate; and   the abrasion resistance is provided by depositing components constituting the second film in a way such that the components coat a surface of the first film, which the surface is subjected to the treatment as the first irradiation step.   
     
     
         4 . The method for depositing a film according to  claim 2 , wherein a first film deposited on a substrate surface by the film deposition method is formed of an inorganic material selected from SiO 2 , ZrO 2 , Si 3 N 4  and Al 2 O 3  and configured to be a single layer or multilayer. 
     
     
         5 . The method for depositing a film according to  claim 2 , wherein a thickness of the first film is 3 to 1000 nm and a thickness of the second film is 1 to 20 nm. 
     
     
         6 . The method for depositing a film according to  claim 2 , wherein, prior to deposition of a first film on a substrate surface, second particles having energy, which are different from first particles to be irradiated after deposition of the first film, are irradiated to the substrate surface so as to perform a treatment on the substrate surface. 
     
     
         7 . The method for depositing a film according to  claim 6 , wherein second particles are irradiated from reaction gas active species in a second ion beam, which is different from a first ion beam, or second plasma, which is different from first plasma. 
     
     
         8 . The method for depositing a film according to  claim 1 ,
 wherein the film deposition method is used for depositing a first film on a substrate surface so as to form a film having a predetermined thickness and stopping only sputtering processing at the point;   irradiation of plasma is continued as a first irradiation step to perform a treatment on a surface of the deposited first film; and   a vacuum deposition method is used to deposit a second film having oil repellency on a surface subjected to the treatment so as to form an abrasion resistant oil-repellent film on the substrate.   
     
     
         9 . The method of depositing a film according to  claim 8 ,
 wherein the first film is configured in a way so that the first film and the second film form the abrasion resistant oil-repellent film on the substrate; and   the abrasion resistance is provided by depositing components constituting the second film in a way such that the components coat a surface of the first film, which the surface is subjected to the treatment as the first irradiation step.   
     
     
         10 . The method for depositing a film according to  claim 8 , wherein the first film deposited on the substrate surface by the film deposition method is formed of an inorganic material selected from SiO 2 , ZrO 2 , Si 3 N 4  and Al 2 O 3  and configured to be a single layer or multilayer. 
     
     
         11 . The method for depositing a film according to  claim 8 , wherein a thickness of the first film is 3 to 1000 nm and a thickness of the second film is 1 to 20 nm. 
     
     
         12 . The method for depositing a film according to  claim 8 , wherein, prior to deposition of the first film on the substrate surface, second plasma irradiation, which is different from plasma irradiation subsequent to deposition of the first film, is performed on the substrate surface so as to perform a treatment on the substrate surface. 
     
     
         13 . The method for depositing a film according to  claim 1 , wherein the substrate is a glass substrate with a pencil hardness of 6H and the second film is formed from a fluorine-containing organosilicon compound. 
     
     
         14 . The method for depositing a film according to  claim 1 , wherein the substrate is a display for a plasma display panel, cathode ray tube, liquid crystal display, electroluminescence display, cover glass for watches or gauges, or touch surfaces of touch-sensitive electronic equipment.