Inventor · disambiguated record
Ichiro Shiono
Also filed as: SHIONO ICHIRO
14 granted patents·15 pending applications·76 citations·filing 2001–2021
89Inventor score
Files withSHINCRON CO LTD11MITSUBISHI MATERIALS CORP7SUMITOMO MITSUBISHI SILICON3NAGAE EKISHU2SHIONO ICHIRO2
Top patents by PatentIndex Score
29 records- 0186US6525338B2Semiconductor substrate, field effect transistor, method of forming SiGe layer and method of forming strained Si layer using same, and method of manufacturing field effect transistorMITSUBISHI MATERIALS CORP·Filed 2001·Granted Feb 25, 2003·41 cites·15 claims
- 0278US9422620B2Translucent hard thin filmSUGAWARA TAKUYA·Filed 2012·Granted Aug 23, 2016·2 cites·6 claims
- 0378US8826856B2Optical thin-film vapor deposition apparatus and optical thin-film production methodNAGAE EKISHU·Filed 2009·Granted Sep 9, 2014·5 cites·14 claims
- 0476US9157146B2Method for depositing silicon carbide filmSUGAWARA TAKUYA·Filed 2011·Granted Oct 13, 2015·2 cites·16 claims
- 0573US9499897B2Thin film forming apparatusSHINCRON CO LTD·Filed 2012·Granted Nov 22, 2016·1 cites·17 claims
- 0672US2019249307A1Method for depositing filmSHINCRON CO LTD·Filed 2019·Application pending·0 cites
- 0767US9365920B2Method for depositing filmSHIONO ICHIRO·Filed 2009·Granted Jun 14, 2016·1 cites·20 claims
- 0866US7405142B2Semiconductor substrate and field-effect transistor, and manufacturing method for sameSUMCO CORP·Filed 2003·Granted Jul 29, 2008·13 cites·39 claims
- 0962US2016177451A1Method for depositing filmSHINCRON CO LTD·Filed 2016·Application pending·0 cites
- 1060US2015284842A1Thin film formation apparatus, sputtering cathode, and method of forming thin filmSHINCRON CO LTD·Filed 2012·Application pending·0 cites
- 1159US2011168544A1Manufacturing Method of Optical FilterSHINCRON CO LTD·Filed 2009·Application pending·0 cites
- 1257US2019284685A1Thin film formation apparatus, sputtering cathode, and method of forming thin filmSHINCRON CO LTD·Filed 2019·Application pending·0 cites
- 1357US2011100806A1Bias sputtering deviceSHINCRON CO LTD·Filed 2009·Application pending·0 cites
- 1455US7056789B2Production method for semiconductor substrate and production method for field effect transistor and semiconductor substrate and field effect transistorSUMITOMO MITSUBISHI SILICON·Filed 2002·Granted Jun 6, 2006·5 cites·7 claims
- 1554US2011097511A1Deposition apparatus and manufacturing method of thin film deviceSHINCRON CO LTD·Filed 2009·Application pending·0 cites
- 1653US9315415B2Method for depositing film and oil-repellent substrateSHIONO ICHIRO·Filed 2009·Granted Apr 19, 2016·1 cites·15 claims
- 1753US2011111581A1Deposition apparatus and manufacturing method of thin film deviceSHINCRON CO LTD·Filed 2009·Application pending·0 cites
- 1853US2011262656A1Optical thin-film vapor deposition apparatus and optical thin-film production methodNAGAE EKISHU·Filed 2011·Application pending·0 cites
- 1952US7198997B2Method for producing semiconductor substrate, method for producing field effect transistor, semiconductor substrate, and field effect transistorSUMITOMO MITSUBISHI SILICON·Filed 2002·Granted Apr 3, 2007·5 cites·12 claims
- 2051US10577687B2Ag alloy sputtering target and Ag alloy film manufacturing methodMITSUBISHI MATERIALS CORP·Filed 2016·Granted Mar 3, 2020·0 cites·7 claims
- 2149US2023313381A1Plasma-resistant coating film, sol gel liquid for forming said film, method for forming plasma-resistant coating film, and substrate with plasma-resistant coating filmMITSUBISHI MATERIALS CORP·Filed 2021·Application pending·0 cites
- 2248US2014199493A1Film formation method and film formation apparatusSHINCRON CO LTD·Filed 2012·Application pending·0 cites
- 2346US10996346B2α-ray measuring deviceMITSUBISHI MATERIALS CORP·Filed 2019·Granted May 4, 2021·0 cites·20 claims
- 2446US2019271069A1Cu-Ga SPUTTERING TARGET AND METHOD OF MANUFACTURING Cu-Ga SPUTTERING TARGETMITSUBISHI MATERIALS CORP·Filed 2017·Application pending·0 cites
- 2545US2014205762A1Method for depositing film and film deposition systemSHINCRON CO LTD·Filed 2011·Application pending·0 cites
- 2642US2021310113A1Multilayer film, and ag alloy sputtering targetMITSUBISHI MATERIALS CORP·Filed 2018·Application pending·0 cites
- 2742US2019039131A1Sputtering target and method of manufacturing sputtering targetMITSUBISHI MATERIALS CORP·Filed 2017·Application pending·0 cites
- 2836US7138650B2Semiconductor substrate, field-effect transistor, and their manufacturing method of the sameSUMITOMO MITSUBISHI SILICON·Filed 2002·Granted Nov 21, 2006·0 cites·28 claims
- 2925US10415135B2Thin film formation method and thin film formation apparatusHINATA YOHEI·Filed 2011·Granted Sep 17, 2019·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →