Inventor · disambiguated record
Takuya Sugawara
Also filed as: SUGAWARA TAKUYA
29 granted patents·17 pending applications·200 citations·filing 1995–2019
96Inventor score
Top patents by PatentIndex Score
46 records- 0186US6897149B2Method of producing electronic device materialTOKYO ELECTRON LTD·Filed 2002·Granted May 24, 2005·24 cites·34 claims
- 0285US7429539B2Nitriding method of gate oxide filmTOKYO ELECTRON LTD·Filed 2006·Granted Sep 30, 2008·7 cites·31 claims
- 0385US7217659B2Process for producing materials for electronic deviceTOKYO ELECTRON LTD·Filed 2005·Granted May 15, 2007·5 cites·44 claims
- 0482US7163877B2Method and system for modifying a gate dielectric stack containing a high-k layer using plasma processingTEXAS INSTRUMENTS INC·Filed 2004·Granted Jan 16, 2007·26 cites·51 claims
- 0581US7226874B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 5, 2007·24 cites·17 claims
- 0681US6313047B2MOCVD method of tantalum oxide filmTOKYO ELECTRON LTD·Filed 2001·Granted Nov 6, 2001·27 cites·22 claims
- 0779US7968472B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Jun 28, 2011·5 cites·9 claims
- 0878US9422620B2Translucent hard thin filmSUGAWARA TAKUYA·Filed 2012·Granted Aug 23, 2016·2 cites·6 claims
- 0976US9157146B2Method for depositing silicon carbide filmSUGAWARA TAKUYA·Filed 2011·Granted Oct 13, 2015·2 cites·16 claims
- 1074US8021987B2Method of modifying insulating filmTOKYO ELECTRON LTD·Filed 2009·Granted Sep 20, 2011·3 cites·24 claims
- 1174US7662236B2Method for forming insulation filmTOKYO ELECTRON LTD·Filed 2008·Granted Feb 16, 2010·3 cites·8 claims
- 1272US7655574B2Method of modifying insulating filmTOKYO ELECTRON LTD·Filed 2005·Granted Feb 2, 2010·3 cites·14 claims
- 1372US2019249307A1Method for depositing filmSHINCRON CO LTD·Filed 2019·Application pending·0 cites
- 1471US7226848B2Substrate treating method and production method for semiconductor deviceTOKYO ELECTRON LTD·Filed 2002·Granted Jun 5, 2007·11 cites·20 claims
- 1570US7517818B2Method for forming a nitrided germanium-containing layer using plasma processingTOKYO ELECTRON LTD·Filed 2005·Granted Apr 14, 2009·3 cites·23 claims
- 1668US7955922B2Manufacturing method of fin-type field effect transistorTOKYO ELECTRON LTD·Filed 2008·Granted Jun 7, 2011·3 cites·11 claims
- 1768US7446052B2Method for forming insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 4, 2008·10 cites·18 claims
- 1867US9365920B2Method for depositing filmSHIONO ICHIRO·Filed 2009·Granted Jun 14, 2016·1 cites·20 claims
- 1967US7517751B2Substrate treating methodTOKYO ELECTRON LTD·Filed 2005·Granted Apr 14, 2009·2 cites·5 claims
- 2067US7250375B2Substrate processing method and material for electronic deviceTOKYO ELECTRON LTD·Filed 2002·Granted Jul 31, 2007·9 cites·51 claims
- 2166US7560396B2Material for electronic device and process for producing the sameTOKYO ELECTRON LTD·Filed 2003·Granted Jul 14, 2009·10 cites·8 claims
- 2266US7232772B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 19, 2007·7 cites·11 claims
- 2364US8336487B2Film forming apparatusISHIDA YOSHIHIRO·Filed 2011·Granted Dec 25, 2012·1 cites·5 claims
- 2463US2007218687A1Process for producing materials for electronic deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2562US8409961B2Alteration method and alteration apparatus for titanium nitrideSUGAWARA TAKUYA·Filed 2009·Granted Apr 2, 2013·2 cites·6 claims
- 2662US2016177451A1Method for depositing filmSHINCRON CO LTD·Filed 2016·Application pending·0 cites
- 2760US2015284842A1Thin film formation apparatus, sputtering cathode, and method of forming thin filmSHINCRON CO LTD·Filed 2012·Application pending·0 cites
- 2859US2011168544A1Manufacturing Method of Optical FilterSHINCRON CO LTD·Filed 2009·Application pending·0 cites
- 2958US2010096707A1Method for Forming Insulation FilmTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3057US2019284685A1Thin film formation apparatus, sputtering cathode, and method of forming thin filmSHINCRON CO LTD·Filed 2019·Application pending·0 cites
- 3156US2009035950A1Nitriding method of gate oxide filmTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3255US2009163036A1Substrate Treating MethodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3353US9315415B2Method for depositing film and oil-repellent substrateSHIONO ICHIRO·Filed 2009·Granted Apr 19, 2016·1 cites·15 claims
- 3452US7759598B2Substrate treating method and production method for semiconductor deviceTOKYO ELECTRON LTD·Filed 2007·Granted Jul 20, 2010·0 cites·3 claims
- 3552US2007204959A1Substrate processing method and material for electronic deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3652US2007224837A1Method for producing material of electronic deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3749US7622402B2Method for forming underlying insulation filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 24, 2009·2 cites·19 claims
- 3849US2010068896A1Method of processing substrateTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3949US2005233599A1Method for producing material of electronic deviceMAKOTO ANDO·Filed 2005·Application pending·0 cites
- 4047US2020279724A1Film formation deviceSHINCRON CO LTD·Filed 2018·Application pending·0 cites
- 4144US7517812B2Method and system for forming a nitrided germanium-containing layer using plasma processingTOKYO ELECTRON LTD·Filed 2005·Granted Apr 14, 2009·0 cites·19 claims
- 4242US2019390321A1Film-formation methodTOKAI UNIV EDUCATIONAL SYSTEM·Filed 2018·Application pending·0 cites
- 4341US5728989AInsulation gas filled circuit breakerHITACHI LTD·Filed 1995·Granted Mar 17, 1998·7 cites·15 claims
- 4440US8735304B2Film forming method, film forming apparatus, and storage mediumMOROZUMI YUICHIRO·Filed 2012·Granted May 27, 2014·0 cites·4 claims
- 4540US2004142577A1Method for producing material of electronic deviceFiled 2002·Application pending·0 cites
- 4637US2005227500A1Method for producing material of electronic deviceTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →