Exposure apparatus and exposure method, and flat panel display manufacturing method

Abstract

A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.

1 . An exposure apparatus that exposes a substrate with an illumination light via a projection optical system, comprising:
 a movable body arranged below the projection optical system that holds the substrate;   a drive system that can move the movable body in a first direction and a second direction orthogonal to each other in a predetermined plane orthogonal to an optical axis of the projection optical system;   a measurement system in which one of a grating member with a plurality of grating areas arranged mutually apart in the first direction and a plurality of first heads each irradiating the grating member with a measurement beam that can move in the second direction is provided at the movable body, and the other of the grating member and the plurality of first heads is provided facing the movable body, the measurement system having a measurement device in which one of a scale member and a second head is provided at the plurality of first heads and the other of the scale member and the second head is provided facing the plurality of the first heads, and the measurement device measuring position information of the plurality of first heads in the second direction by irradiating the scale member with a measurement beam via the second head, the measurement system measuring position information of the movable body in at least directions of three degrees of freedom within the predetermined plane, based on measurement information of at least three first heads of the plurality of first heads irradiating at least one of the plurality of grating areas with the measurement beam and measurement information of the measurement device; and   a control system, controlling the drive system based on correction information to compensate for measurement error of the measurement device caused by one of the scale member and the second head, and position information measured by the measurement system, wherein   with each of the plurality of first heads, the measurement beam moves off of one of the plurality of grating areas, and moves to irradiate another grating area adjacent to the one of the plurality of grating areas, while the movable body is moving in the first direction.   
     
     
         2 . The exposure apparatus according to  claim 1 , further comprising:
 a frame member supporting the projection optical system, wherein   in the measurement device, one of the scale member and the second head is provided at the plurality of first heads, and the other of the scale member and the second head is provided at the projection optical system or the frame member.   
     
     
         3 . The exposure apparatus according to  claim 1 , wherein
 the scale member has a plurality of grating sections arranged mutually apart in the second direction,   the measurement device has a plurality of second heads including at least two of the second heads whose positions of the measurement beams are different in the second direction, and   the at least two of the second heads are arranged in the second direction at a spacing wider than a spacing of a pair of grating sections that are adjacent.   
     
     
         4 . The exposure apparatus according to  claim 3 , wherein
 the plurality of second heads include at least one second head whose position of the measurement beam is different from at least one of the at least two of the second heads in one of the first direction and a third direction orthogonal to the predetermined plane.   
     
     
         5 . The exposure apparatus according to  claim 1 , wherein
 the measurement device measures position information of the plurality of first heads in a direction different from the second direction, by irradiating a plurality of the measurement beams at positions mutually different with respect to the scale member.   
     
     
         6 . The exposure apparatus according to  claim 1 , wherein
 the measurement device measures position information of at least one of rotation and tilt of the plurality of first heads.   
     
     
         7 . The exposure apparatus according to  claim 1 , wherein
 the scale member has at least one of a reflective two-dimensional grating or two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         8 . The exposure apparatus according to  claim 1 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of deformation, displacement, flatness, and formation error in the scale member.   
     
     
         9 . The exposure apparatus according to  claim 1 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of displacement and optical properties of the second head.   
     
     
         10 . The exposure apparatus according to  claim 1 , wherein
 the second head has a measurement direction in the second direction, and   the correction information compensates for measurement error of the measurement device in the second direction caused by relative movement between the second head and the scale member in a direction different from the second direction.   
     
     
         11 . The exposure apparatus according to  claim 1 , wherein
 each of the plurality of first heads has a measurement direction that is one of two directions intersecting each other within the predetermined plane, and   the at least three first heads used on measurement in the measurement system include at least one first head whose measurement direction is in one of the two directions and at least two first heads whose measurement direction is in the other of the two directions.   
     
     
         12 . The exposure apparatus according to  claim 11 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         13 . The exposure apparatus according to  claim 1 , wherein
 the plurality of first heads includes a first head whose measurement direction is in a direction different from the first direction within the predetermined plane, and   the measurement system uses measurement information of the measurement device to measure position information of the movable body using the first head having the measurement direction different from the first direction.   
     
     
         14 . The exposure apparatus according to  claim 13 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         15 . The exposure apparatus according to  claim 1 , wherein
 the plurality of first heads can be moved relatively with the movable body in the second direction.   
     
     
         16 . The exposure apparatus according to  claim 1 , wherein
 the plurality of first heads includes two first heads irradiating the measurement beam at a spacing wider than a pair of adjacent grating areas of the plurality of grating areas in the first direction and at least one first head whose position of the measurement beam is different from at least one of the two first heads in the second direction.   
     
     
         17 . The exposure apparatus according to  claim 1 , wherein
 each of the plurality of grating areas has one of a reflective two-dimensional grating and two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         18 . The exposure apparatus according to  claim 1 , wherein
 the grating member has a plurality of scales on which each of the plurality of grating areas is formed.   
     
     
         19 . The exposure apparatus according to  claim 1 , wherein
 the measurement system has a drive section that can move the plurality of first heads in the second direction, and   the control system controls the drive section so that the measurement beam of each of the at least three first heads used for measurement in the measurement system does not move off of the plurality of grating areas in the second direction while the movable body is moving.   
     
     
         20 . The exposure apparatus according to  claim 1 , wherein
 the measurement system has a plurality of movable sections that can move holding one or a plurality of the first heads of the plurality of first heads, and position information of the first head at each of the plurality of movable sections is measured by the measurement device.   
     
     
         21 . The exposure apparatus according to  claim 1 , wherein
 each of the plurality of first heads has a measurement direction in two directions that is one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane, and   the measurement system can measure position information of the movable body in directions of three degrees of freedom including the third direction, different from the directions of three degrees of freedom, using the at least three first heads.   
     
     
         22 . The exposure apparatus according to  claim 1 , wherein
 the plurality of first heads has at least four first heads, and   while the measurement beam of one first head of the at least four first heads moves off of the plurality of grating areas, the measurement beam of at least three first heads remaining irradiates at least one of the plurality of grating areas, and by the movable body moving in the first direction, of the at least four first heads, the one first head having the measurement beam that moves off of the plurality of grating areas is switched.   
     
     
         23 . The exposure apparatus according to  claim 22 , wherein
 the at least four first heads include two first heads whose positions of the measurement beams are different from each other in the first direction, and two first heads whose positions of the measurement beams are different from one of the two first heads in the second direction along with positions of the measurement beams that are different from each other in the first direction, and   the two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         24 . The exposure apparatus according to  claim 22 , wherein
 the grating member has at least two of the plurality of grating areas arranged mutually apart in the second direction,   the at least four first heads irradiate the measurement beams via the at least two first heads whose positions of the measurements beam are different from each other in the first direction on each of the at least two of the plurality of grating areas, and   the at least two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         25 . The exposure apparatus according to  claim 24 , wherein
 the grating member is provided at the movable body, and the plurality of first heads is provided above the movable body, and   the at least two of the plurality of grating areas include a pair of the plurality of grating areas arranged on both sides of a substrate mounting area of the movable body in the second direction.   
     
     
         26 . The exposure apparatus according to  claim 22 , wherein
 during movement of the movable body in the first direction, a non-measurement section in which the measurement beams move off of the plurality of grating areas does not overlap in the at least four first heads.   
     
     
         27 . The exposure apparatus according to  claim 26 , wherein
 the plurality of first heads includes at least one first head whose non-measurement section at least partly overlaps with the non-measurement section of at least one of the at least four first heads, and   in measurement of position information of the movable body, of at least five first heads including the at least four first heads and the at least one first head, at least three first heads irradiating the measurement beams on at least one of the plurality of grating areas are used.   
     
     
         28 . The exposure apparatus according to  claim 22 , wherein
 the control system acquires correction information to control movement of the movable body using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads, based on measurement information of at least three first heads remaining, or position information of the movable body measured using the at least three first heads remaining.   
     
     
         29 . The exposure apparatus according to  claim 28 , wherein
 the correction information is acquired while each of the measurement beams of the at least four first heads irradiates at least one of the plurality of grating areas.   
     
     
         30 . The exposure apparatus according to  claim 28 , wherein
 in one of the at least three first heads remaining before the measurement beam moves off of one of the plurality of grating areas, position information of the movable body is measured using at least three first heads including the one first head whose correction information has been acquired, instead of the one of the at least three first heads remaining.   
     
     
         31 . The exposure apparatus according to  claim 28 , wherein
 each of the plurality of first heads has a measurement direction in two directions being one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane,   the measurement system measures position information of the movable body in directions of three degrees of freedom including the third direction, different from the directions of three degrees of freedom, using the at least three first heads, and   the control system acquires correction information to control movement of the movable body in the different directions of three degrees of freedom using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads, based on measurement information in the third direction of at least three first heads remaining, or position information of the movable body in the third direction measured using the at least three first heads remaining.   
     
     
         32 . The exposure apparatus according to  claim 1 , further comprising:
 a frame member supporting the projection optical system, wherein   the other of the grating member and the plurality of first heads is provided at the frame member.   
     
     
         33 . The exposure apparatus according to  claim 32 , wherein
 in the measurement system, the grating member is provided at the movable body, and the plurality of first heads is provided at the frame member, and   in the measurement device, the second head is provided at the plurality of first heads, and the scale member is provided at the frame member.   
     
     
         34 . The exposure apparatus according to  claim 1 , wherein
 the substrate is held in an opening of the movable body, the apparatus further comprising:   a stage system, having a support section that supports the movable body and the substrate by levitation and moves the substrate supported by levitation in at least the directions of three degrees of freedom with the drive system.   
     
     
         35 . The exposure apparatus according to  claim 1 , further comprising:
 a frame member, supporting the projection optical system;   a holding member arranged above the projection optical system that can move holding a mask illuminated with the illumination light; and   an encoder system that measures position information of the holding member, the system having one of a scale member and a head provided at the holding member and the other of the scale member and the head provided at the projection optical system or the frame member.   
     
     
         36 . The exposure apparatus according to  claim 1 , further comprising:
 an illumination optical system, illuminating a mask with the illumination light, wherein   the projection optical system has a plurality of optical systems each projecting a partial image of a pattern of the mask.   
     
     
         37 . The exposure apparatus according to  claim 36 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and   the plurality of optical systems each project the partial image in a plurality of projection areas whose position is mutually different in a direction orthogonal to a scanning direction in which the substrate is moved in the scan and exposure.   
     
     
         38 . The exposure apparatus according to  claim 1 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and on the scan and exposure, the substrate is moved in the first direction.   
     
     
         39 . The exposure apparatus according to  claim 1 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and on the scan and exposure, the substrate is moved in the second direction.   
     
     
         40 . The exposure apparatus according to  claim 1 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more, and is used in a flat panel display.   
     
     
         41 . A flat panel display manufacturing method, comprising:
 exposing a substrate using the exposure apparatus according to  claim 1 ; and   developing the substrate that has been exposed.   
     
     
         42 . An exposure method, exposing a substrate with an illumination light via a projection optical system, comprising:
 measuring position information of a movable body with a measurement system in which one of a grating member with a plurality of grating areas arranged mutually apart in a first direction within a predetermined plane orthogonal to an optical axis of the projection optical system and a plurality of first heads each irradiating the grating member with a measurement beam that can move in a second direction orthogonal to the first direction within the predetermined plane is provided at the movable body holding the substrate, and the other of the grating member and the plurality of first heads is provided facing the movable body, and by the measurement system having a measurement device that measures position information of the plurality of first heads in the second direction, position information of the movable body is measured in at least directions of three degrees of freedom within the predetermined plane, based on measurement information of at least three first heads irradiating at least one of the plurality of grating areas with the measurement beam of the plurality of first heads and measurement information of the measurement device; and   moving the movable body, based on correction information to compensate for measurement error of the measurement system occurring due to at least one of the grating member, the plurality of first heads, and movement of the movable body, and position information measured with the measurement system, wherein   with each of the plurality of first heads, the measurement beam moves off of one of the plurality of grating areas, and moves to irradiate another grating area adjacent to the one of the plurality of grating areas, while the movable body is moving in the first direction.   
     
     
         43 . The exposure method according to  claim 42 , wherein
 the correction information compensates for measurement error of the measurement system caused by at least one of deformation, displacement, flatness, and formation error in at least one of the plurality of grating areas.   
     
     
         44 . The exposure method according to  claim 42 , wherein
 the correction information compensates for measurement error of the measurement system caused by at least one of optical property and displacement in a direction different from the second direction of at least one head of the plurality of first heads.   
     
     
         45 . The exposure method according to  claim 42 , wherein
 each of the plurality of first heads has a measurement direction being one of two directions intersecting each other within the predetermined plane, and   the correction information compensates for measurement error of the measurement system in the measurement direction caused by relative movement between the first head and the grating member in a direction different from the measurement direction.   
     
     
         46 . The exposure method according to  claim 45 , wherein
 the direction different from the measurement direction includes at least one of a third direction orthogonal to the predetermined plane, a rotation direction around an axis orthogonal to the predetermined plane, and a rotation direction around an axis parallel to the predetermined plane.   
     
     
         47 . The exposure method according to  claim 45 , wherein
 the measurement direction of each of the plurality of first heads is different from the first direction and the second direction, and   the direction different from the measurement direction includes at least one of the first direction and the second direction.   
     
     
         48 . The exposure method according to  claim 42 , wherein
 the correction information compensates for measurement error of the measurement system caused by a difference of position in the third direction orthogonal to the predetermined plane between a reference surface for position control of the movable body or a reference surface that the substrate coincides with on exposure operation of the substrate and a grating surface of the grating section.   
     
     
         49 . The exposure method according to  claim 48 , wherein
 the reference surface includes an image plane of the projection optical system.   
     
     
         50 . The exposure method according to  claim 42 , wherein
 the measurement device has a scale member provided at one of the plurality of first heads and the projection optical system or the frame member and a second head provided at the other of the plurality of first heads and the projection optical system or the frame member, and position information of the plurality of first heads is measured by the measurement device irradiating the scale member with a measurement beam via the second head.   
     
     
         51 . The exposure method according to  claim 50 , wherein
 the correction information includes correction information to compensate for measurement error of the measurement device caused by at least one of the scale member and the second head.   
     
     
         52 . The exposure method according to  claim 50 , wherein
 the scale member has a plurality of grating sections arranged mutually apart in the second direction,   position information of the plurality of first heads is measured by the measurement device having a plurality of second heads including at least two of the second heads whose positions of the measurement beams are different in the second direction, and   the at least two second heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the second direction.   
     
     
         53 . The exposure method according to  claim 52 , wherein
 the plurality of second heads include at least one second head whose position of the measurement beam is different from at least one of the at least two of the second heads in one of the first direction and a third direction orthogonal to the predetermined plane.   
     
     
         54 . The exposure method according to  claim 50 , wherein
 position information of the plurality of first heads in a direction different from the second direction is measured, by irradiating a plurality of the measurement beams at positions mutually different with respect to the scale member.   
     
     
         55 . The exposure method according to  claim 50 , wherein
 the measurement device measures position information of at least one of rotation and tilt of the plurality of first heads.   
     
     
         56 . The exposure method according to  claim 50 , wherein
 the scale member has one of a reflective two-dimensional grating and two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         57 . The exposure method according to  claim 50 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of deformation, displacement, flatness, and formation error in the scale member.   
     
     
         58 . The exposure method according to  claim 50 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of displacement and optical properties of the second head.   
     
     
         59 . The exposure method according to  claim 50 , wherein
 the second head has a measurement direction in the second direction, and   the correction information compensates for measurement error of the measurement device in the second direction caused by relative movement between the second head and the scale member in a direction different from the second direction.   
     
     
         60 . The exposure method according to  claim 42 , wherein
 each of the plurality of first heads has a measurement direction that is one of two directions intersecting each other within the predetermined plane, and   the at least three first heads used on measurement in the measurement system include at least one first head whose measurement direction is in one of the two directions and at least two first heads whose measurement direction is in the other of the two directions.   
     
     
         61 . The exposure method according to  claim 60 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         62 . The exposure method according to  claim 42 , wherein
 the plurality of first heads includes a first head whose measurement direction is in a direction different from the first direction within the predetermined plane, and   measurement information of the measurement device is used to measure position information of the movable body using the first head whose measurement direction is in a direction different from the first direction.   
     
     
         63 . The exposure method according to  claim 62 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         64 . The exposure method according to  claim 42 , wherein
 the plurality of first heads can be moved relatively with the movable body in the second direction.   
     
     
         65 . The exposure method according to  claim 42 , wherein
 the plurality of first heads includes two first heads irradiating the measurement beams at a spacing wider than a pair of adjacent grating areas of the plurality of grating areas in the first direction, and at least one first head whose position of the measurement beam is different from at least one of the two first heads in the second direction.   
     
     
         66 . The exposure method according to  claim 42 , wherein
 each of the plurality of grating areas has one of a reflective two-dimensional grating and two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         67 . The exposure method according to  claim 42 , wherein
 the plurality of grating areas is formed on a plurality of scales mutually different.   
     
     
         68 . The exposure method according to  claim 42 , wherein
 the at least three first heads used for measurement in the measurement system are moved so that each of the measurement beams of the at least three first heads does not move off of the plurality of grating areas in the second direction while the movable body is moving.   
     
     
         69 . The exposure method according to  claim 42 , wherein
 one or a plurality of heads of the plurality of heads is held by each of a plurality of movable sections, and position information of the head is measured by the measurement device at each of the plurality of movable sections.   
     
     
         70 . The exposure method according to  claim 42 , wherein
 each of the plurality of first heads has a measurement direction in two directions that are one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane, and   position information of the movable body in directions of three degrees of freedom including the third direction, which is different from the directions of three degrees of freedom, is measured using the at least three first heads.   
     
     
         71 . The exposure method according to  claim 42 , wherein
 the plurality of first heads has at least four first heads, and   of the at least four first heads, while the measurement beam of one first head moves off of the plurality of grating areas, the measurement beams of at least three first heads remaining irradiate at least one of the plurality of grating areas, and by the movable body moving in the first direction, of the at least four first heads, the one first head whose measurement beam moves off of the plurality of grating areas is switched.   
     
     
         72 . The exposure method according to  claim 71 , wherein
 the at least four first heads include two first heads whose positions of the measurement beams are different from each other in the first direction, and two first heads whose positions of the measurement beams are different from one of the two first heads in the second direction along with positions of the measurement beams that are different from each other in the first direction, and   the two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         73 . The exposure method according to  claim 71 , wherein
 the grating member has at least two of the plurality of grating areas arranged mutually apart in the second direction,   the at least four first heads irradiate the measurement beam via the at least two first heads whose positions of the measurement beams are different from each other in the first direction on each of the at least two of the plurality of grating areas, and   the at least two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         74 . The exposure method according to  claim 73 , wherein
 the grating member is provided at the movable body, and the plurality of first heads is provided above the movable body, and   the at least two of the plurality of grating areas include a pair of the plurality of grating areas arranged on both sides of a substrate mounting area of the movable body in the second direction.   
     
     
         75 . The exposure method according to  claim 71 , wherein
 during movement of the movable body in the first direction, a non-measurement section in which the measurement beams move off of the plurality of grating areas does not overlap in the at least four first heads.   
     
     
         76 . The exposure method according to  claim 75 , wherein
 the plurality of first heads includes at least one first head whose non-measurement section at least partly overlaps with the non-measurement section of at least one of the at least four first heads, and   on measurement of position information of the movable body, of at least five first heads including the at least four first heads and the at least one first head, at least three first heads irradiating the measurement beam on at least one of the plurality of grating areas are used.   
     
     
         77 . The exposure method according to  claim 71 , wherein
 correction information to control movement of the movable body using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads is acquired, based on measurement information of at least three first heads remaining, or position information of the movable body measured using the at least three first heads remaining.   
     
     
         78 . The exposure method according to  claim 77 , wherein
 the correction information is acquired while each of the measurement beams of the at least four first heads irradiates at least one of the plurality of grating areas.   
     
     
         79 . The exposure method according to  claim 77 , wherein
 in one of the at least three first heads remaining before the measurement beam moves off of one of the plurality of grating areas, position information of the movable body is measured using at least three first heads including the one first head whose correction information has been acquired, instead of the one of the at least three first heads remaining.   
     
     
         80 . The exposure method according to  claim 77 , wherein
 each of the plurality of first heads has a measurement direction in two directions being one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane, and position information of the movable body is measured in directions of three degrees of freedom including the third direction, which is different from the directions of three degrees of freedom, using the at least three first heads, and   correction information to control movement of the movable body in the different directions of three degrees of freedom is acquired using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads, based on measurement information in the third direction of at least three first heads remaining, or position information of the movable body in the third direction measured using the at least three first heads remaining.   
     
     
         81 . The exposure method according to  claim 42 , wherein
 the other of the grating member and the plurality of first heads is provided at a frame member supporting the projection optical system.   
     
     
         82 . The exposure method according to  claim 81 , wherein
 the grating member is provided at the movable body, the plurality of first heads is provided at the frame member, and   the second head is provided at the plurality of first heads, and the scale member is provided at the frame member.   
     
     
         83 . The exposure method according to  claim 42 , wherein
 position information of a holding member that can move holding a mask illuminated with the illumination light is measured by an encoder system, and in the system, one of a scale member and a head is provided at the holding member, and the other of the scale member and the head is provided at the projection optical system or a frame member supporting the projection optical system.   
     
     
         84 . The exposure method according to  claim 42 , wherein
 the projection optical system has a plurality of optical systems projecting a partial image of a pattern of a mask illuminated by the illumination light.   
     
     
         85 . The exposure method according to  claim 84 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and   the plurality of optical systems projects the partial image in each of a plurality of projection areas of mutually different positions in a direction orthogonal to a scanning direction in which the substrate is moved on the scan and exposure.   
     
     
         86 . The exposure method according to  claim 42 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and on the scan and exposure, the substrate is moved in one of the first direction and the second direction.   
     
     
         87 . The exposure method according to  claim 42 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more, and is used to manufacture a flat panel display.   
     
     
         88 . A flat panel display manufacturing method, comprising:
 exposing a substrate using the exposure method according to  claim 42 ; and   developing the substrate that has been exposed.   
     
     
         89 . An exposure method, exposing a substrate with an illumination light via a projection optical system, comprising:
 measuring position information of a movable body with a measurement system in which one of a grating member with a plurality of grating areas arranged mutually apart in a first direction within a predetermined plane orthogonal to an optical axis of the projection optical system and a plurality of first heads each irradiating the grating member with a measurement beam that can move in a second direction orthogonal to the first direction within the predetermined plane is provided at the movable body holding the substrate, and the other of the grating member and the plurality of first heads is provided facing the movable body, and by the measurement system having a measurement device in which one of a scale member and a second head is provided at the plurality of first heads and the other of the scale member and the second head is provided facing the plurality of first heads, the measurement device measuring position information of the plurality of first heads in the second direction by irradiating a measurement beam on the scale member via the second head, position information of the movable body is measured by the measurement system in at least directions of three degrees of freedom within the predetermined plane, based on measurement information of at least three first heads irradiating at least one of the plurality of grating areas with the measurement beam of the plurality of first heads and measurement information of the measurement device; and   moving the movable body, based on correction information to compensate for measurement error of the measurement device caused by at least one of the scale member and the second head, and position information measured by the measurement system, wherein   with each of the plurality of first heads, the measurement beam moves off of one of the plurality of grating areas, and moves to irradiate another grating area adjacent to the one of the plurality of grating areas, while the movable body is moving in the first direction.   
     
     
         90 . The exposure method according to  claim 89 , wherein
 one of the scale member and the second head is provided at the plurality of first heads, and the other of the scale member and the second head provided at the projection optical system or a frame member supporting the projection optical system.   
     
     
         91 . The exposure method according to  claim 89 , wherein
 the scale member has a plurality of grating sections arranged mutually apart in the second direction,   position information of the plurality of first heads is measured by the measurement device having a plurality of second heads including at least two of the second heads whose positions of the measurement beams are different in the second direction, and   the at least two second heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the second direction.   
     
     
         92 . The exposure method according to  claim 91 , wherein
 the plurality of second heads include at least one second head whose position of the measurement beam is different from at least one of the at least two of the second heads in one of the first direction and a third direction orthogonal to the predetermined plane.   
     
     
         93 . The exposure method according to  claim 89 , wherein
 position information of the plurality of first heads in a direction different from the second direction is measured, by irradiating a plurality of the measurement beams at positions mutually different with respect to the scale member.   
     
     
         94 . The exposure method according to  claim 89 , wherein
 the measurement device measures position information of at least one of rotation and tilt of the plurality of first heads.   
     
     
         95 . The exposure method according to  claim 89 , wherein
 the scale member has one of a reflective two-dimensional grating and two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         96 . The exposure method according to  claim 89 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of deformation, displacement, flatness, and formation error in the scale member.   
     
     
         97 . The exposure method according to  claim 89 , wherein
 the correction information compensates for measurement error of the measurement device caused by at least one of displacement and optical properties of the second head.   
     
     
         98 . The exposure method according to  claim 89 , wherein
 the second head has a measurement direction in the second direction, and   the correction information compensates for measurement error of the measurement device in the second direction caused by relative movement between the second head and the scale member in a direction different from the second direction.   
     
     
         99 . The exposure method according to  claim 89 , wherein
 each of the plurality of first heads has a measurement direction that is one of two directions intersecting each other within the predetermined plane, and   the at least three first heads used on measurement in the measurement system include at least one first head whose measurement direction is in one of the two directions and at least two first heads whose measurement direction is in the other of the two directions.   
     
     
         100 . The exposure method according to  claim 99 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         101 . The exposure method according to  claim 89 , wherein
 the plurality of first heads includes a first head whose measurement direction is in a direction different from the first direction within the predetermined plane, and   measurement information of the measurement device is used to measure position information of the movable body using the first head whose measurement direction is in a direction different from the first direction.   
     
     
         102 . The exposure method according to  claim 101 , wherein
 the plurality of first heads includes at least two first heads whose measurement direction is in the first direction and at least two heads whose measurement direction is in the second direction.   
     
     
         103 . The exposure method according to  claim 89 , wherein
 the plurality of first heads can be moved relatively with the movable body in the second direction.   
     
     
         104 . The exposure method according to  claim 89 , wherein
 the plurality of first heads includes two first heads irradiating the measurement beams at a spacing wider than a pair of adjacent grating areas of the plurality of grating areas in the first direction, and at least one first head whose position of the measurement beam is different from at least one of the two first heads in the second direction.   
     
     
         105 . The exposure method according to  claim 89 , wherein
 each of the plurality of grating areas has one of a reflective two-dimensional grating and two reflective one-dimensional gratings whose arrangement direction is different from each other.   
     
     
         106 . The exposure method according to  claim 89 , wherein
 the plurality of grating areas is formed on a plurality of scales mutually different.   
     
     
         107 . The exposure method according to  claim 89 , wherein
 the at least three first heads used for measurement in the measurement system are moved so that each of the measurement beams of the at least three first heads does not move off of the plurality of grating areas in the second direction while the movable body is moving.   
     
     
         108 . The exposure method according to  claim 89 , wherein
 one or a plurality of heads of the plurality of heads is held by each of a plurality of movable sections, and position information of the head is measured by the measurement device at each of the plurality of movable sections.   
     
     
         109 . The exposure method according to  claim 89 , wherein
 each of the plurality of first heads has a measurement direction in two directions that are one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane, and   position information of the movable body in directions of three degrees of freedom including the third direction, which is different from the directions of three degrees of freedom, is measured using the at least three first heads.   
     
     
         110 . The exposure method according to  claim 89 , wherein
 the plurality of first heads has at least four first heads, and   of the at least four first heads, while the measurement beam of one first head moves off of the plurality of grating areas, the measurement beams of at least three first heads remaining irradiate at least one of the plurality of grating areas, and by the movable body moving in the first direction, of the at least four first heads, the one first head whose measurement beam moves off of the plurality of grating areas is switched.   
     
     
         111 . The exposure method according to  claim 110 , wherein
 the at least four first heads include two first heads whose positions of the measurement beams are different from each other in the first direction, and two first heads whose positions of the measurement beams are different from one of the two first heads in the second direction along with positions of the measurement beams that are different from each other in the first direction, and   the two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         112 . The exposure method according to  claim 110 , wherein
 the grating member has at least two of the plurality of grating areas arranged mutually apart in the second direction,   the at least four first heads irradiate the measurement beam via the at least two first heads whose positions of the measurement beams are different from each other in the first direction on each of the at least two of the plurality of grating areas, and   the at least two first heads irradiate the measurement beams at a spacing wider than a spacing of a pair of grating areas that are adjacent of the plurality of grating areas in the first direction.   
     
     
         113 . The exposure method according to  claim 112 , wherein
 the grating member is provided at the movable body, and the plurality of first heads is provided above the movable body, and   the at least two of the plurality of grating areas include a pair of the plurality of grating areas arranged on both sides of a substrate mounting area of the movable body in the second direction.   
     
     
         114 . The exposure method according to  claim 110 , wherein
 during movement of the movable body in the first direction, a non-measurement section in which the measurement beams move off of the plurality of grating areas does not overlap in the at least four first heads.   
     
     
         115 . The exposure method according to  claim 114 , wherein
 the plurality of first heads includes at least one first head whose non-measurement section at least partly overlaps with the non-measurement section of at least one of the at least four first heads, and   on measurement of position information of the movable body, of at least five first heads including the at least four first heads and the at least one first head, at least three first heads irradiating the measurement beam on at least one of the plurality of grating areas are used.   
     
     
         116 . The exposure method according to  claim 110 , wherein
 correction information to control movement of the movable body using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads is acquired, based on measurement information of at least three first heads remaining, or position information of the movable body measured using the at least three first heads remaining.   
     
     
         117 . The exposure method according to  claim 116 , wherein
 the correction information is acquired while each of the measurement beams of the at least four first heads irradiates at least one of the plurality of grating areas.   
     
     
         118 . The exposure method according to  claim 116 , wherein
 in one of the at least three first heads remaining before the measurement beam moves off of one of the plurality of grating areas, position information of the movable body is measured using at least three first heads including the one first head whose correction information has been acquired, instead of the one of the at least three first heads remaining.   
     
     
         119 . The exposure method according to  claim 116 , wherein
 each of the plurality of first heads has a measurement direction in two directions being one of two directions intersecting each other within the predetermined plane and a third direction orthogonal to the predetermined plane, and position information of the movable body is measured in directions of three degrees of freedom including the third direction, which is different from the directions of three degrees of freedom, using the at least three first heads, and   correction information to control movement of the movable body in the different directions of three degrees of freedom is acquired using one first head whose measurement beam moves off of the one grating area and moves to irradiate the another grating area of the at least four first heads, based on measurement information in the third direction of at least three first heads remaining, or position information of the movable body in the third direction measured using the at least three first heads remaining.   
     
     
         120 . The exposure method according to  claim 89 , wherein
 the other of the grating member and the plurality of first heads is provided at a frame member supporting the projection optical system.   
     
     
         121 . The exposure method according to  claim 120 , wherein
 the grating member is provided at the movable body, the plurality of first heads is provided at the frame member, and   the second head is provided at the plurality of first heads, and the scale member is provided at the frame member.   
     
     
         122 . The exposure method according to  claim 89 , wherein
 position information of a holding member that can move holding a mask illuminated with the illumination light is measured by an encoder system, and in the system, one of a scale member and a head is provided at the holding member, and the other of the scale member and the head is provided at the projection optical system or a frame member supporting the projection optical system.   
     
     
         123 . The exposure method according to  claim 89 , wherein
 the projection optical system has a plurality of optical systems projecting a partial image of a pattern of a mask illuminated by the illumination light.   
     
     
         124 . The exposure method according to  claim 123 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and   the plurality of optical systems projects the partial image in each of a plurality of projection areas of mutually different positions in a direction orthogonal to a scanning direction in which the substrate is moved on the scan and exposure.   
     
     
         125 . The exposure method according to  claim 89 , wherein
 the substrate is scanned and exposed with the illumination light via the projection optical system, and on the scan and exposure, the substrate is moved in one of the first direction and the second direction.   
     
     
         126 . The exposure method according to  claim 89 , wherein
 the substrate has at least one of a length of a side and a diagonal length that is 500 mm or more, and is used to manufacture a flat panel display.   
     
     
         127 . A flat panel display manufacturing method, comprising:
 exposing a substrate using the exposure method according to  claim 89 ; and   developing the substrate that has been exposed.