Radioisotope production

Abstract

A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

1 . A radioisotope production apparatus comprising:
 an electron source configured to provide an electron beam, the electron source comprising an electron injector and an electron accelerator;   a target support structure configured to support a target; and   a first and a second electron beam distribution apparatus, together configured to scan the electron beam over a surface of the target,   wherein the radioisotope production apparatus is configured to produce radioisotope material based on irradiating the target using the electron beam.   
     
     
         2 . The radioisotope production apparatus of  claim 1 , wherein the first electron beam distribution apparatus comprises a deflector configured to sweep the electron beam through a predetermined angle towards the second electron beam distribution apparatus. 
     
     
         3 . The radioisotope production apparatus of  claim 2 , wherein the deflector is further configured to deflect the electron beam by applying a magnetic or electric field to the electron beam. 
     
     
         4 . The radioisotope production apparatus of  claim 1 , wherein the second electron beam distribution apparatus comprises a deflector or a lens. 
     
     
         5 . The radioisotope production apparatus of  claim 4 , wherein the deflector is configured to direct the electron beam toward the target telecentrically or the lens is configured to collimate the electron beam. 
     
     
         6 . The radioisotope production apparatus of  claim 1 , further comprising a beam splitter configured to direct a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target. 
     
     
         7 . The radioisotope production apparatus of  claim 6 , wherein the first and second electron beam distribution apparatuses are disposed along the first path. 
     
     
         8 . The radioisotope production apparatus of  claim 7 , further comprising third and fourth electron beam distribution apparatuses together configured to scan the electron beam over a further surface of the target, the third and fourth electron beam distribution apparatuses disposed along the second path. 
     
     
         9 . The radioisotope production apparatus of  claim 1 , wherein:
 the target comprises an electron target and a photon target; and   the electron target is configured to receive the electron beam from the second electron beam distribution apparatus and to emit photons towards the photon target.   
     
     
         10 . The radioisotope production apparatus of  claim 8 , wherein:
 the target comprises an electron target and a photon target;   the electron target is configured to receive the electron beam from the second electron beam distribution apparatus and to emit photons towards the photon target; and   the electron target comprises a first part configured to receive the first portion of the electron beam from the first and second electron beam distribution apparatuses and a second part configured to receive the second portion of the electron beam from the third and fourth electron beam distribution apparatuses.   
     
     
         11 . The radioisotope production apparatus of  claim 1 , wherein the electron source is a free electron laser. 
     
     
         12 . A method comprising:
 generating an electron beam using an electron injector and an electron accelerator;   supporting a target on a target support structure;   scanning the electron beam over a surface of the target using first and second electron beam distribution apparatuses; and   producing radioisotope material based on irradiating the target using the electron beam.   
     
     
         13 . The method of  claim 12 , wherein:
 the first electron beam distribution apparatus comprises a deflector; and   the method further comprises sweeping the electron beam through a predetermined angle toward the second electron beam distribution apparatus using the deflector.   
     
     
         14 . The method of  claim 13 , further comprising deflecting the electron beam by applying a magnetic or electric field to the electron beam. 
     
     
         15 . The method of  claim 12 , wherein:
 the second electron beam distribution apparatus comprises a deflector or a lens; and   the method further comprises:
 directing the electron beam toward the target telecentrically; or 
 collimating the electron beam. 
   
     
     
         16 . The method of  claim 12 , further comprising splitting the electron beam to direct a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target. 
     
     
         17 . The method of  claim 16 , further comprising scanning the electron beam over a further surface of the target using third and fourth electron beam distribution apparatuses disposed along the second path, wherein the first and second electron beam distribution apparatuses are disposed along the first path. 
     
     
         18 . The method of  claim 17 , wherein the target comprises an electron target and a photon target and the method further comprises:
 receiving the electron beam from the second electron beam distribution apparatus at the electron target;   emitting photons from the electron target toward the photon target;   receiving the first portion of the electron beam from the first and second electron beam distribution apparatuses at a first part of the electron target; and   receiving the second portion of the electron beam from the third and fourth electron beam distribution apparatuses at a second part of the electron target.   
     
     
         19 . The method of  claim 12 , wherein the target comprises an electron target and a photon target and the method further comprises:
 receiving the electron beam from the second electron beam distribution apparatus at the electron target; and   emitting photons from the electron target toward the photon target.   
     
     
         20 . A lithographic system comprising:
 a free electron laser configured to generate an electron beam and an illumination beam, the free electron laser comprising an electron injector and an electron accelerator;   a lithographic apparatus configured to a project pattern onto a substrate using the illumination beam; and   a radioisotope production apparatus configured to produce radioisotope material based on irradiating the target using the electron beam, the radioisotope production apparatus comprising:
 a target support structure configured to support a target; and 
 a first and a second electron beam distribution apparatus, together configured to scan the electron beam over a surface of the target.