Inventor · disambiguated record
Olav Waldemar Vladimir Frijns
Also filed as: FRIJNS OLAV WALDEMAR VLADIMIR
20 granted patents·1 pending application·74 citations·filing 2003–2021
93Inventor score
Files withASML NETHERLANDS BV15FRIJNS OLAV WALDEMAR VLADIMIR2ASML HOLDING NV1DONDERS SJOERD NICOLAAS LAMBERTUS1VAN SCHOOT JAN BERNARD PLECHELMUS1
Top patents by PatentIndex Score
21 records- 0185US8610089B2Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning methodDONDERS SJOERD NICOLAAS LAMBERTUS·Filed 2012·Granted Dec 17, 2013·13 cites·19 claims
- 0283US10580545B2Beam delivery apparatus and methodASML NETHERLANDS BV·Filed 2014·Granted Mar 3, 2020·6 cites·38 claims
- 0381US7541603B2Radiation system and lithographic apparatus comprising the sameASML NETHERLANDS BV·Filed 2006·Granted Jun 2, 2009·6 cites·17 claims
- 0480US11170907B2Radioisotope productionASML NETHERLANDS BV·Filed 2016·Granted Nov 9, 2021·4 cites·9 claims
- 0580US10437154B2Lithographic methodASML NETHERLANDS BV·Filed 2017·Granted Oct 8, 2019·2 cites·27 claims
- 0678US9728931B2Electron injector and free electron laserASML NETHERLANDS BV·Filed 2014·Granted Aug 8, 2017·5 cites·43 claims
- 0776US9411238B2Source-collector device, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Aug 9, 2016·4 cites·8 claims
- 0872US8736806B2Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating methodFRIJNS OLAV WALDEMAR VLADIMIR·Filed 2009·Granted May 27, 2014·4 cites·12 claims
- 0969US9823572B2Lithographic methodASML NETHERLANDS BV·Filed 2014·Granted Nov 21, 2017·2 cites·15 claims
- 1066US8766212B2Correction of spatial instability of an EUV source by laser beam steeringFRIJNS OLAV WALDEMAR VLADIMIR·Filed 2006·Granted Jul 1, 2014·4 cites·20 claims
- 1165US9983482B2Radiation collector, radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted May 29, 2018·2 cites·18 claims
- 1265US7470916B2Lithographic apparatus, device manufacturing method and radiation collectorASML NETHERLANDS BV·Filed 2006·Granted Dec 30, 2008·2 cites·25 claims
- 1365US7113261B2Radiation system, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·8 cites·11 claims
- 1464US2021375498A1Radioisotope productionASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1563US7528395B2Radiation source, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted May 5, 2009·10 cites·42 claims
- 1661US9632419B2Radiation sourceVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2012·Granted Apr 25, 2017·2 cites·23 claims
- 1758US7863591B2Radiation system and lithographic apparatus comprising the sameASML NETHERLANDS BV·Filed 2009·Granted Jan 4, 2011·0 cites·12 claims
- 1855US10103508B2Electron injector and free electron laserASML NETHERLANDS BV·Filed 2017·Granted Oct 16, 2018·0 cites·20 claims
- 1949US7724349B2Device arranged to measure a quantity relating to radiation and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted May 25, 2010·0 cites·19 claims
- 2048US9377695B2Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a deviceYAKUNIN ANDREI MIKHAILOVICH·Filed 2012·Granted Jun 28, 2016·0 cites·17 claims
- 2145US12332570B2Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debrisASML HOLDING NV·Filed 2020·Granted Jun 17, 2025·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →