Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
Abstract
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and methods of manufacturing the same. According to one or more embodiments, a method for forming or otherwise preparing a polishing article by sequentially forming a plurality of polymer layers is provided and includes: (a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, where the polymer precursor composition contains a first precursor component containing an epoxide group and a photoinitiator component which generates a photoacid when exposed to UV light, (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer, and (c) repeating (a) and (b).
Claims
exact text as granted — not AI-modified1 . A method of forming a polishing article by sequentially forming a plurality of polymer layers, comprising:
(a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, wherein the polymer precursor composition comprises a first precursor component comprising an epoxide group and a photoinitiator component which generates a photoacid when exposed to UV light; (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer; and (c) repeating (a) and (b).
2 . The method of claim 1 , wherein the first precursor component is a cycloaliphatic epoxide.
3 . The method of claim 2 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide.
4 . The method of claim 1 , wherein the photoinitiator comprises an iodonium salt or a sulfonium salt.
5 . The method of claim 1 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group.
6 . The method of claim 1 , wherein at least partially curing the plurality of droplets comprises exposing the droplets to UV radiation to fix each droplet, and each of the fixed droplets has a size, when measured across the surface, that is less than an uncured equilibrium size of a droplet that is disposed on the surface.
7 . A polishing pad formed by sequential repetitions of:
(a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, wherein the polymer precursor composition comprises a first precursor component comprising an epoxide group and a photoinitiator component which generates a photo acid when exposed to UV light; (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer, wherein individual ones of the plurality of droplets are at least partially cured, and have a size, when measured across the surface, that is less than an uncured equilibrium size of a droplet that is disposed on the surface; and (c) repeating (a) and (b).
8 . The polishing pad of claim 7 , wherein the first precursor component is a cycloaliphatic epoxide.
9 . The polishing pad of claim 8 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide.
10 . The polishing pad of claim 7 , wherein the photoinitiator comprises an iodonium salt.
11 . The polishing pad of claim 7 , wherein the photoinitiator comprises a sulfonium salt.
12 . The polishing pad of claim 7 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group.
13 . A method of forming a polishing article, comprising:
preparing a polymer precursor composition for forming at least a portion of the polishing article by combining:
a first precursor component comprising a cycloaliphatic epoxide;
an acrylate monomer;
a photoinitiator component which generates a photo acid when exposed to UV light; and
a viscosity thinning reactive diluent to provide the polymer precursor composition with a viscosity that enables the polymer precursor composition to be dispensed to form a portion of the polishing article by use of an additive manufacturing process.
14 . The method of claim 13 , wherein the first precursor component further comprises an aliphatic, aromatic, arylaliphatic, or heterocyclic epoxide.
15 . The method of claim 13 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide.
16 . The method of claim 13 , wherein the photoinitiator component comprises an aryl onium salt.
17 . The method of claim 16 , wherein the photoinitiator comprises an iodonium or sulfonium salt.
18 . The method of claim 13 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group.
19 . The method of claim 13 , wherein the polymer precursor composition further comprises a second precursor component selected from the group consisting of bisphenol-F diglycidyl ether, bisphenol-A diglycidyl ether, epoxidized phenol novolac resins, epoxidized cresol novolac resins, epoxidized rubbers, epoxidized oils, epoxidized urethanes, epoxy ethers, polycyclic aliphatic epoxies, polycyclic aromatic epoxies, and any combination thereof, and wherein the second precursor component is different from the first precursor component.
20 . The method of claim 13 , wherein the polymer precursor composition further comprises a third precursor component selected from the group consisting of ethylene glycol, polyethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, tetraethylene glycol, glycerol, and any combination thereof.Join the waitlist — get patent alerts
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