US2024123568A1PendingUtilityA1

Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process

Assignee: APPLIED MATERIALS INCPriority: Oct 17, 2014Filed: Jun 21, 2023Published: Apr 18, 2024
Est. expiryOct 17, 2034(~8.3 yrs left)· nominal 20-yr term from priority
B24B 37/24B24B 37/22B24B 37/26B24D 3/28B24D 11/001B24D 11/04B29C 35/0805B29C 64/112B33Y 10/00B33Y 70/00B33Y 80/00C09D 4/00C09G 1/16B33Y 70/10B24D 2203/00B29C 2035/0827B29K 2033/04B29K 2995/0077B29K 2995/0092
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Claims

Abstract

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and methods of manufacturing the same. According to one or more embodiments, a method for forming or otherwise preparing a polishing article by sequentially forming a plurality of polymer layers is provided and includes: (a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, where the polymer precursor composition contains a first precursor component containing an epoxide group and a photoinitiator component which generates a photoacid when exposed to UV light, (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer, and (c) repeating (a) and (b).

Claims

exact text as granted — not AI-modified
1 . A method of forming a polishing article by sequentially forming a plurality of polymer layers, comprising:
 (a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, wherein the polymer precursor composition comprises a first precursor component comprising an epoxide group and a photoinitiator component which generates a photoacid when exposed to UV light;   (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer; and   (c) repeating (a) and (b).   
     
     
         2 . The method of  claim 1 , wherein the first precursor component is a cycloaliphatic epoxide. 
     
     
         3 . The method of  claim 2 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide. 
     
     
         4 . The method of  claim 1 , wherein the photoinitiator comprises an iodonium salt or a sulfonium salt. 
     
     
         5 . The method of  claim 1 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group. 
     
     
         6 . The method of  claim 1 , wherein at least partially curing the plurality of droplets comprises exposing the droplets to UV radiation to fix each droplet, and each of the fixed droplets has a size, when measured across the surface, that is less than an uncured equilibrium size of a droplet that is disposed on the surface. 
     
     
         7 . A polishing pad formed by sequential repetitions of:
 (a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, wherein the polymer precursor composition comprises a first precursor component comprising an epoxide group and a photoinitiator component which generates a photo acid when exposed to UV light;   (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer, wherein individual ones of the plurality of droplets are at least partially cured, and have a size, when measured across the surface, that is less than an uncured equilibrium size of a droplet that is disposed on the surface; and   (c) repeating (a) and (b).   
     
     
         8 . The polishing pad of  claim 7 , wherein the first precursor component is a cycloaliphatic epoxide. 
     
     
         9 . The polishing pad of  claim 8 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide. 
     
     
         10 . The polishing pad of  claim 7 , wherein the photoinitiator comprises an iodonium salt. 
     
     
         11 . The polishing pad of  claim 7 , wherein the photoinitiator comprises a sulfonium salt. 
     
     
         12 . The polishing pad of  claim 7 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group. 
     
     
         13 . A method of forming a polishing article, comprising:
 preparing a polymer precursor composition for forming at least a portion of the polishing article by combining:
 a first precursor component comprising a cycloaliphatic epoxide; 
 an acrylate monomer; 
 a photoinitiator component which generates a photo acid when exposed to UV light; and 
 a viscosity thinning reactive diluent to provide the polymer precursor composition with a viscosity that enables the polymer precursor composition to be dispensed to form a portion of the polishing article by use of an additive manufacturing process. 
   
     
     
         14 . The method of  claim 13 , wherein the first precursor component further comprises an aliphatic, aromatic, arylaliphatic, or heterocyclic epoxide. 
     
     
         15 . The method of  claim 13 , wherein the polymer precursor composition further comprises a second precursor component comprising a diepoxide or a multifunctional epoxide. 
     
     
         16 . The method of  claim 13 , wherein the photoinitiator component comprises an aryl onium salt. 
     
     
         17 . The method of  claim 16 , wherein the photoinitiator comprises an iodonium or sulfonium salt. 
     
     
         18 . The method of  claim 13 , wherein the polymer precursor composition further comprises a curing agent comprising an amine or an alcohol group. 
     
     
         19 . The method of  claim 13 , wherein the polymer precursor composition further comprises a second precursor component selected from the group consisting of bisphenol-F diglycidyl ether, bisphenol-A diglycidyl ether, epoxidized phenol novolac resins, epoxidized cresol novolac resins, epoxidized rubbers, epoxidized oils, epoxidized urethanes, epoxy ethers, polycyclic aliphatic epoxies, polycyclic aromatic epoxies, and any combination thereof, and wherein the second precursor component is different from the first precursor component. 
     
     
         20 . The method of  claim 13 , wherein the polymer precursor composition further comprises a third precursor component selected from the group consisting of ethylene glycol, polyethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, tetraethylene glycol, glycerol, and any combination thereof.

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