Inventor · disambiguated record
Ashwin Chockalingam
Also filed as: CHOCKALINGAM ASHWIN · CHOCKALINGAM ASHWIN MURUGAPPAN
25 granted patents·13 pending applications·211 citations·filing 2015–2024
95Inventor score
Files withAPPLIED MATERIALS INC38
Top patents by PatentIndex Score
38 records- 0199US11745302B2Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2021·Granted Sep 5, 2023·5 cites·20 claims
- 0299US10456886B2Porous chemical mechanical polishing padsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 29, 2019·26 cites·20 claims
- 0399US10399201B2Advanced polishing pads having compositional gradients by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·24 cites·21 claims
- 0499US10391605B2Method and apparatus for forming porous advanced polishing pads using an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Aug 27, 2019·19 cites·12 claims
- 0598US11724362B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2020·Granted Aug 15, 2023·5 cites·24 claims
- 0698US10773509B2Pad structure and fabrication methodsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 15, 2020·15 cites·20 claims
- 0797US10953515B2Apparatus and method of forming a polishing pads by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2016·Granted Mar 23, 2021·16 cites·29 claims
- 0897US10875145B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Dec 29, 2020·17 cites·19 claims
- 0997US10875153B2Advanced polishing pad materials and formulationsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·16 cites·21 claims
- 1097US10821573B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 3, 2020·17 cites·25 claims
- 1197US10618141B2Apparatus for forming a polishing article that has a desired zeta potentialAPPLIED MATERIALS INC·Filed 2016·Granted Apr 14, 2020·18 cites·20 claims
- 1297US10384330B2Polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2015·Granted Aug 20, 2019·22 cites·22 claims
- 1393US11446788B2Precursor formulations for polishing pads produced by an additive manufacturing processAPPLIED MATERIALS INC·Filed 2019·Granted Sep 20, 2022·3 cites·18 claims
- 1488US10589399B2Textured small pad for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2017·Granted Mar 17, 2020·3 cites·5 claims
- 1586US2024123568A1Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing processAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1685US2023330805A1Porous chemical mechanical polishing padsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1784US11851570B2Anionic polishing pads formed by printing processesAPPLIED MATERIALS INC·Filed 2019·Granted Dec 26, 2023·1 cites·20 claims
- 1883US11772229B2Method and apparatus for forming porous advanced polishing pads using an additive manufacturing processAPPLIED MATERIALS INC·Filed 2019·Granted Oct 3, 2023·1 cites·18 claims
- 1982US11638979B2Additive manufacturing of polishing padsAPPLIED MATERIALS INC·Filed 2020·Granted May 2, 2023·1 cites·13 claims
- 2082US2022402091A1Method and apparatus for forming porous advanced polishing pads using an additive manufacturing processAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2180US11826876B2Hydrophilic and zeta potential tunable chemical mechanical polishing padsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 28, 2023·1 cites·19 claims
- 2276US2021347005A1Polishing pad with window and manufacturing methods thereofAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2374US11980992B2Integrated abrasive polishing pads and manufacturing methodsAPPLIED MATERIALS INC·Filed 2022·Granted May 14, 2024·0 cites·19 claims
- 2474US11471999B2Integrated abrasive polishing pads and manufacturing methodsAPPLIED MATERIALS INC·Filed 2018·Granted Oct 18, 2022·1 cites·14 claims
- 2571US2019224809A1Porous chemical mechanical polishing padsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2670US11965103B2Additive manufacturing of polishing padsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 23, 2024·0 cites·16 claims
- 2770US2025205848A1Polishing head for substrate polishingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2869US11072050B2Polishing pad with window and manufacturing methods thereofAPPLIED MATERIALS INC·Filed 2018·Granted Jul 27, 2021·0 cites·20 claims
- 2969US2023256560A1Additive manufacturing of polishing padsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3069US2023219190A1Additive manufacturing of polishing padsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3166US11951590B2Polishing pads with interconnected poresAPPLIED MATERIALS INC·Filed 2021·Granted Apr 9, 2024·0 cites·20 claims
- 3265US11524384B2Abrasive delivery polishing pads and manufacturing methods thereofAPPLIED MATERIALS INC·Filed 2018·Granted Dec 13, 2022·0 cites·13 claims
- 3364US11612978B2Additive manufacturing of polishing padsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·0 cites·10 claims
- 3460US2023364735A1Polishing pads with improved planarization efficiencyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3559US2023219189A1Apparatus and method for selective material removal during polishingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3659US2022362904A1Polishing pads having improved pore structureAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3753US2020230781A1Polishing pads formed using an additive manufacturing process and methods related theretoAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3851US2023125502A1Situ sensing of surface condition for polishing padsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ashwin Chockalingam files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →