Optical semiconductor device with integrated vias implementing inter-die connection
Abstract
The present application discloses an optical semiconductor device. The optical semiconductor device includes a logic die including a core circuit area and a logic peripheral circuit area; a memory die positioned on the logic die and including a memory cell area and a memory peripheral area, and a first inter-die via positioned in the memory peripheral area and electrically connected to the logic peripheral circuit area; and a sensor die positioned on the memory die and including a sensor pixel area and a sensor peripheral area, a first intra-die via positioned in the sensor peripheral area and electrically coupled to the logic peripheral circuit area through the first inter-die via, and a second intra-die via positioned in the sensor peripheral area. A height of the first intra-die via is greater than a height of the second intra-die via.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An optical semiconductor device, comprising:
a logic die comprising:
a core circuit area and a logic peripheral circuit area;
a memory die positioned on the logic die and comprising:
a memory cell area and a memory peripheral area; and
a first inter-die via positioned in the memory peripheral area and electrically connected to the logic peripheral circuit area; and
a sensor die positioned on the memory die and comprising:
a sensor pixel area and a sensor peripheral area;
a first intra-die via positioned in the sensor peripheral area and electrically coupled to the logic peripheral circuit area through the first inter-die via, wherein the first intra-die via has a back end extended to a back surface of the sensor die and a front end extended to a front surface of the sensor die; and
a second intra-die via positioned in the sensor peripheral area;
wherein the height of the first intra-die via is equal to a thickness of the sensor die between the front surface and the back surface thereof.
2 . The optical semiconductor device of claim 1 , wherein the first intra-die via and the second intra-die via are electrically coupled.
3 . The optical semiconductor device of claim 1 , wherein the second intra-die via is electrically connected to a conductive line of the sensor die.
4 . The optical semiconductor device of claim 1 , wherein the first intra-die via is topographically aligned with the first inter-die via and directly positioned on the first inter-die via, such that the front end of the first intra-die via is aligned with and in contact with the back end of the first inter-die via.
5 . The optical semiconductor device of claim 1 , wherein the sensor die comprises:
a dielectric layer positioned on the memory die and defining the front surface of the sensor die at a front surface of the dielectric layer; a substrate positioned on the dielectric layer of the sensor die and defining the back surface of the sensor die at a back surface of the substrate; and a sensor unit positioned in the substrate of the sensor die; wherein the first intra-die via is positioned penetrating along the substrate of the sensor die and the dielectric layer of the sensor die, such that the back end of the first intra-die via is extended to the back surface of the substrate while the front end of the first intra-die via is extended to the front surface of the dielectric layer.
6 . The optical semiconductor device of claim 5 , further comprising a transfer gate positioned in the dielectric layer of the sensor die.
7 . The optical semiconductor device of claim 6 , further comprising a floating diffusion unit positioned in the substrate of the sensor die and positioned in a drain of the transfer gate.
8 . The optical semiconductor device of claim 7 , further comprising a color filter positioned on the substrate of the sensor die and above the sensor unit.
9 . The optical semiconductor device of claim 8 , further comprising a micro-lens positioned on the color filter.
10 . The optical semiconductor device of claim 9 , further comprising an upper layer positioned between the color filter and the substrate of the sensor die;
wherein the upper layer comprises a bottom anti-reflective coating.
11 . The optical semiconductor device of claim 1 , wherein a height of the first intra-die via is greater than a height of the second intra-die via.
12 . The optical semiconductor device of claim 1 , wherein a height ratio of a height of the first intra-die via to a height of the second intra-die via is between about 10:3 and about 5:4.
13 . The optical semiconductor device of claim 1 , wherein the first inter-die via comprises:
a filler layer positioned in the memory peripheral area and electrically connected to the logic peripheral circuit area; and an isolation layer covering two sidewalls of the filler layer.
14 . The optical semiconductor device of claim 13 , wherein the first inter-die via comprises a seed layer positioned between the filler layer and the seed layer.
15 . The optical semiconductor device of claim 14 , wherein the first inter-die via comprises an adhesion layer positioned between the seed layer and the isolation layer.
16 . The optical semiconductor device of claim 15 , wherein the first inter-die via comprises a barrier layer positioned between the adhesion layer and the isolation layer.
17 . The optical semiconductor device of claim 1 , wherein the first inter-die via has a back end extended to a back surface of the memory die and a front end extended through a front surface of the memory die to the logic die.
18 . The optical semiconductor device of claim 1 , wherein the second intra-die via has a back end extended to the back surface of the sensor die and a front end extended toward the front surface of the sensor die.
19 . The optical semiconductor device of claim 1 , wherein each of the first inter-die via, the first intra-die via, and the second intra-die via has a tapered shaped that a width is gradually reduced from the back end to the front end.Join the waitlist — get patent alerts
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