Photosensitive resin composition

Abstract

A photosensitive resin composition is comprised of (A) a polyimide resin having a weight-average molecular weight of from 5,000 to 150,000, represented by the general formula (I): wherein X is a specified tetravalent organic group having two benzene rings, Y is a member comprised of 30-100 mol % of a specific organic group having two benzene rings and 70-0 mol % of another specific divalent aromatic organic group, Z is a divalent organic group represented by the general formula (VI): wherein b is an integer of 5 to 80; and m and n each represent a number satisfying that m/(m+n) is 0.98 to 0.70 and n/(m+n) is 0.02 to 0.30; (B) an agent selected from a sensitizer and a photopolymerization initiator; and (C) an organic solvent. From this composition, polyimide films having a superior adhesion to substrates and also having no corrosive properties can be formed by low-temperature heat treatment.

What is claimed is: 
     
       1. A photosensitive resin composition comprising; (A) a polyimide resin having a weight-average molecular weight of from 5,000 to 150,000, represented by the general formula (I): ##STR31## wherein X is at least one tetravalent organic group selected from the group consisting of groups represented by the following formulas (II-1) to (II-4): ##STR32## Y is a group comprised of 1) from 30 to 100 mol % of a divalent organic group represented by the general formula (III): ##STR33## wherein a is an integer of 0 or 1, R's are independently an acryloyl group, a methacryloyl group or a hydrogen atom, provided that 50 mol % or more of the whole R's is at least one group selected from the group consisting of the acryloyl group and the methacryloyl group, and 2) from 70 to 0 mol % of a divalent organic group represented by the general formula (IV): ##STR34## wherein Q is a divalent organic group selected from the group consisting of groups represented by the following formulas (V-1) to (V-3): ##STR35## Z is a divalent organic group represented by the following general formula (VI): ##STR36## wherein b is an integer of 5 to 80; and m and n each represent the number of structural units to which the m and n are attached respectively, provided that m/(m+n) is 0.98 to 0.70 and n/(m+n) is 0.02 to 0.30;   (B) an agent selected from the group consisting of a sensitizer and a photopolymerization initiator; and   (C) an organic solvent.   
     
     
       2. The composition of claim 1, wherein in the component (A) said organic group of the general formula (III) is at least one member selected from the group consisting of a radical formed by removing two amino groups from 3,3'-dihydroxy-4,4'-diaminobiphenyl, a radical formed by removing two amino groups from 2,2-bis(3-hydroxy-4-aminophenyl)-1,1,1,3,3,3-hexafluoropropane, and groups formed by substituting at least part of the hydrogen atoms of the phenolic hydroxyl group of these radicals with at least one group selected from the group consisting of an acryloyl group and a methacryloyl group. 
     
     
       3. The composition of claim 1, wherein in the component (A) said organic group of the general formula (IV) is at least one member selected from the group consisting of a radical formed by removing two amino groups from 1,4-bis(3-aminophenoxy)benzene, a radical formed by removing two amino groups from 1,4-bis(4-aminophenoxy)benzene, a radical formed by removing two amino groups from 2,2-bis[4-(4-aminophenoxy)phenyl]propane, and a radical formed by removing two amino groups from 2,2-bis[4-(4-aminophenoxy)phenyl]perfluoropropane. 
     
     
       4. The composition of claim 1, wherein the component (B) is in an amount of from 0.01 to 20 parts by weight based on 100 parts by weight of the component (A), and the component (A) is in such an amount that the component (A) is in an amount of from 3 to 70% by weight based on the total of the components (A) and (C). 
     
     
       5. The composition of claim 1, wherein in the component (A) of the general formula (I), the divalent organic groups represented by the general formulas (III) and (IV) to be held in the whole R groups are in a proportion of from 50 to 100 mol % and from 50 mol % to 0 mol %, respectively; the one group selected from the group consisting of the acryloyl group and methacryloyl group to be held in the whole R groups of the general formula (III) is in a proportion of from 70 to 100 mol %; b in the divalent organic group of the general formula (VI) is an integer of from 7 to 75; and m is a number satisfying that m/(m+n) is 0.98 to 0.85 and n is a number satisfying that n/(m+n) is 0.02 to 0.15.