Diaphragm for chemical mechanical polisher

Abstract

A diaphragm for a chemical mechanical polisher is composed of a rubber layer and a fiber layer. The size and shape of the diaphragm are suitably designed according to a gap and relative shifting between the rotary unit and holder to prevent creasing of the diaphragm and thereby decrease friction with a sidewall of the rotary unit and holder. The fibrous layer can improve the strength of the diaphragm in order to improve the lifetime of the diaphragm, reduce the frequency of maintenance of the polisher, and increase throughput.

What is claimed is:  
     
       1. A diaphragm for chemical mechanical polisher, comprising: 
       an elastic layer to connect a rotary unit and a holder, wherein the holder is fitted into the rotary unit, and a gap between the rotary unit and the holder is sealed by the elastic layer; and  
       a fibrous layer attached on the elastic layer to reinforce strength of the elastic layer.  
     
     
       2. The diaphragm according to  claim 1 , wherein the fibrous layer includes a net structure. 
     
     
       3. The diaphragm according to  claim 1 , wherein the elastic layer is composed of rubber. 
     
     
       4. The diaphragm according to  claim 1 , wherein the elastic layer and the fibrous layer are annular. 
     
     
       5. The diaphragm according to  claim 1 , wherein the diaphragm rotates with the rotary unit. 
     
     
       6. A diaphragm for a chemical mechanical polisher, comprising: 
       an external sealing ring mounted on an internal sidewall of a rotary unit;  
       an internal sealing ring mounted on an external sidewall of an holder, wherein the holder is fitted into the rotary unit, and the external sidewall of the holder is adjacent to the internal sidewall of the rotary unit; and  
       a connect ring smoothly connected between the external sealing ring and the internal sealing ring, wherein the width of the connect ring is designed according to a gap distance and a maximum relative shift distance between the external sealing ring and the internal seal ring to reduce creasing of the connect ring.  
     
     
       7. The diaphragm according to  claim 6 , wherein the external sealing ring, the connect ring and the internal ring are integrally formed. 
     
     
       8. A diaphragm for a chemical mechanical polisher, comprising: 
       an external sealing ring mounted on an internal sidewall of a rotary unit;  
       an internal sealing ring mounted on an external sidewall of an holder, wherein the holder is fitted into the rotary unit, and the external sidewall of the holder is adjacent to the internal sidewall of the rotary unit; and  
       a connect ring smoothly connected between the external sealing ring and the internal sealing ring, wherein the width of the connect ring is designed according to a gap distance and a maximum relative shift distance between the external sealing ring and the internal seal ring to reduce creasing of the connect ring,  
       wherein each of the external sealing ring, the connect ring, and the internal ring are composed of a fibrous layer and an elastic layer.  
     
     
       9. The diaphragm according to  claim 8 , wherein the fibrous layer includes a net structure. 
     
     
       10. The diaphragm according to  claim 8 , wherein the elastic layer is composed of rubber. 
     
     
       11. The diaphragm according to  claim 8 , wherein the diaphragm rotates with the rotary unit. 
     
     
       12. A chemical mechanical polisher, comprising: 
       a rotary unit;  
       a holder fitted into the rotary unit; and  
       a diaphragm composed of a rubber layer and a fibrous layer connects the rotary unit and the holder, and seals a gap between the rotary unit and the holder.  
     
     
       13. The polisher according to  claim 12 , further comprising a carrier to hold a substrate. 
     
     
       14. The polisher according to  claim 12 , further comprising a polishing surface to polish a substrate. 
     
     
       15. The polisher according to  claim 12 , wherein the rotary unit, holder and diaphragm are part of a conditioner to condition a polishing surface. 
     
     
       16. The polisher according to  claim 15 , wherein a bottom surface of the holder reconditions a polishing pad by rotating thereon. 
     
     
       17. The polisher according to  claim 16 , wherein in the bottom of the holder comprises a diamond layer. 
     
     
       18. The polisher according to  claim 12 , wherein the fibrous layer includes a net structure. 
     
     
       19. The polisher according to  claim 12 , wherein the elastic layer is composed of rubber. 
     
     
       20. The polisher according to  claim 12 , wherein the diaphragm is annular. 
     
     
       21. The polisher according to  claim 12 , wherein the diaphragm is rotated with the rotary unit.