Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method

Abstract

A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 10 16 Ωcm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02×10 −6 K −1 . A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.

1. A chuck for use in holding onto a supporting table by electrostatic force a substrate to be processed in manufacturing devices employing lithographic projection techniques or a lithographic projection mask or a mask blank in a lithographic projection apparatus, a mask handling apparatus such as a mask inspection or cleaning apparatus, or a mask manufacturing apparatus, the chuck comprising:
 a first dielectric member, wherein the first dielectric member has a specific resistivity of at least 10 16  Ωcm and a coefficient of thermal expansion of less than 0.02×10 −6 K −1 .  
 
   
   
     2. A chuck according to  claim 1 , wherein the specific resistivity of the first dielectric member as at least 10 17  Ωcm. 
   
   
     3. A chuck according to  claim 1 , wherein the first dielectric member has a thickness of between 5 and 500 μm. 
   
   
     4. A chuck according to  claim 1 , wherein the first dielectric member is made of a material comprising SiO 2  containing TiO 2  in a quantity of less than 10 wt %. 
   
   
     5. A chuck according to  claim 1 , wherein the first dielectric member is made of a glass material. 
   
   
     6. A chuck according to  claim 1 , wherein a first electrode is provided on a first surface of the first dielectric member. 
   
   
     7. A chuck according to  claim 1 , wherein a first electrode and a second electrode are provided on a first surface of the first dielectric member in spaced apart relationship. 
   
   
     8. A chuck according to  claim 7 , wherein the chuck further comprises a core attached to the first side of the first dielectric member; a second dielectric member attached to the core on a side opposite the first dielectric member, and a third electrode between the core and the second dielectric member. 
   
   
     9. A chuck according to  claim 8 , wherein the core is made of a glass ceramic material. 
   
   
     10. A chuck according to  claim 9 , wherein at least one of the first and second dielectric member is joined to the core by ion exchange between the core and the first or third electrode effected by application of a potential difference between the first and third electrodes. 
   
   
     11. A chuck according to  claim 10 , wherein at least one of the first and second dielectric member is coated with metal before being joined to the core, the metal forming the first or third electrode. 
   
   
     12. A chuck according to  claim 10 , wherein at least one of the first and second dielectric member was joined to the core at between 150-350° C. 
   
   
     13. A chuck according to  claim 1 , wherein the chuck is arranged for applying a potential difference across the first dielectric member. 
   
   
     14. A lithographic projection apparatus, comprising:
 a radiation system constructed and arranged to provide a beam of radiation;  
 a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;  
 a substrate table constructed and arranged to hold a substrate;  
 a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;  
 a chuck according in  claim 1  on the support structure or the substrate table; and  
 at least a first electrode for applying a potential difference across the first dielectric member of the chuck thereby to generate a clamping force.  
 
   
   
     15. An apparatus according to  claim 14 , wherein the electrostatic chuck is separate from the substrate table or support structure and a further electrode is provided in or on the substrate table or support structure. 
   
   
     16. An apparatus according to  claim 14 , wherein the electrostatic chuck is part of the substrate table or support structure. 
   
   
     17. A method of manufacturing members for optical applications including a substrate, minor or mask table or a chuck or a frame for a lithographic projection apparatus, the method comprising:
 joining together a plurality of glass or glass ceramic members using anodic bonding, wherein at least one of the members has a coefficient of thermal expansion of less than 0.1×10 −6 K −1 .  
 
   
   
     18. A method according to  claim 17 , wherein the joining comprises joining a first of the members to a second of the members with an electrode therebetween, the joining also comprising:
 coating the first member in a metal;  
 placing the second member in contact with the metal;  
 providing an electrode on the second member on a surface opposite the surface in contact with the metal; and  
 applying a potential difference between the metal and the electrode thereby to drive an ion current between the metal and the electrode.  
 
   
   
     19. A method according to  claim 18 , wherein the method is a method of manufacturing a chuck and the first member is a glass member with a specific resistivity of at least 10 ≠ Ωcm and the second member is a glass ceramic member. 
   
   
     20. A method according to  claim 18 , further comprising polishing the first member before the coating. 
   
   
     21. A method according to  claim 18 , wherein the coating comprises vapor deposition. 
   
   
     22. A method according to  claim 18 , further comprising polishing the second member before the placing. 
   
   
     23. A method according to  claim 18 , wherein the providing comprises placing a third glass member which has been coated in a metal on the second member. 
   
   
     24. A method according to  claim 18 , further comprising, after the providing, elevating the temperature of the first and second members, wherein the applying occurs at the elevated temperature. 
   
   
     25. A method according to  claim 23 , further comprising, after the providing, elevating the temperature of the first, second and third members, wherein the applying occurs at the elevated temperature. 
   
   
     26. A method according to  claim 24 , wherein the temperature is elevated to between 150-350° C. 
   
   
     27. A method according to  claim 25 , wherein the temperature is elevated to between 150-350° C. 
   
   
     28. A method according to  claim 18 , further comprising cooling the members at a rate of between −0.01 to −1.0 K/min. 
   
   
     29. A method of manufacturing an electrostatic chuck, comprising;
 the method of  claim 17 ; and  
 machining away the coating of metal of the first member not covered by the second member.  
 
   
   
     30. A device manufacturing method, comprising:
 projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate;  
 providing an electrostatic chuck for holding the substrate to a substrate table, the electrostatic chuck comprising a first dielectric member;  
 positioning the substrate on a first surface of the first dielectric member; and  
 applying a potential difference between first and second electrodes thereby applying a potential difference across the dielectric member to generate a clamping force on the substrate, wherein the first dielectric member has a specific resistivity of at least 10 16  Ωcm and a coefficient of thermal expansion of less than 0.02×10 −6 K −1 .  
 
   
   
     31. A chuck according to  claim 1 , wherein the first dielectric member is made of a glass ceramic material. 
   
   
     32. A chuck according to  claim 31 , wherein the glass ceramic material comprises SiO 2  and at least one alkaline metal oxide selected from Na 2 O, Li 2 O and K 2 O.