Vacuum process system

Abstract

A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.

1. A vacuum processing system comprising:
 a common transfer chamber extending in a first direction; 
 a plurality of process units linearly extending from the common transfer chamber in a second direction normal to the first direction, each of the process units including a process chamber in which an object is processed and a transfer chamber positioned between the process chamber and the common transfer chamber; 
 a first transfer device for transferring objects between the transfer chambers and the common transfer chamber; and 
 a plurality of second transfer devices, each of the transfer chambers including a second transfer device to linearly move an object in the second direction in order to transfer the object between the process chamber and the transfer chamber of the same process unit, the second transfer device of each transfer chamber being inhibited to transfer the object to another transfer chamber, 
 wherein each of the process units includes a gate valve provided between the transfer chamber and the common transfer chamber through which an object is transferred between the transfer chamber and the common transfer chamber by at least one of the first and second transfer devices. 
 
   
   
     2. The vacuum processing system according to  claim 1 , in which the first transfer device is movable within the common transfer chamber in the first direction. 
   
   
     3. The vacuum processing system according to  claim 1 , in which each transfer chamber includes first and second buffers provided therein and selectively supporting an object in the transfer chamber. 
   
   
     4. The vacuum processing system according to  claim 1 , in which at least one of the second transfer devices includes a supporting portion on which an object is mounted, and the supporting portion is only movable in the second direction during the transferring of the object. 
   
   
     5. The vacuum processing system according to  claim 1 , in which each transfer chamber has an inner space which is changeable between a vacuum state and an atmosphere state. 
   
   
     6. The vacuum processing system according to  claim 1 , in which the transfer chambers have inner spaces which are independently changeable between a vacuum state and an atmosphere state. 
   
   
     7. A vacuum processing system comprising:
 a common transfer chamber having a first transfer device provided therein, the first transfer device being movable in a first direction; and 
 a plurality of process units, each of which includes a process section for processing an object, a vacuum transfer chamber, and a second transfer device provided in the vacuum transfer chamber and configured to transfer an object between the process section and the vacuum transfer chamber, 
 wherein said plurality of process units are arranged along the first direction, the first transfer device transfers objects between the common transfer chamber and the vacuum transfer chambers, and each of said second transfer devices linearly moves an object in a direction normal to the first direction, when the second transfer device transfers the object between the process section and the vacuum transfer chamber. 
 
   
   
     8. The vacuum processing system according to  claim 7 , in which each vacuum transfer chamber includes first and second buffers provided therein and selectively supporting an object in vacuum transfer chamber. 
   
   
     9. The vacuum processing system according to  claim 7 , in which the vacuum transfer chambers have inner spaces which are independently changeable between a vacuum state and an atmosphere state.