US8462516B2ActiveUtilityA1
Interconnect structure and a method of fabricating the same
Est. expiryNov 6, 2027(~1.3 yrs left)· nominal 20-yr term from priority
H10W 90/732H10W 90/724H10W 80/301H10W 72/9415H10W 72/07236H10W 72/07232H10W 72/01255H10W 72/952H10W 72/252H10W 72/241H10W 72/234H10W 72/232H10W 72/222H10W 72/90H10W 72/072H10W 72/012H10W 90/00H10W 72/20H10W 72/877B81C 1/00095Y10T29/49149
74
PatentIndex Score
14
Cited by
47
References
3
Claims
Abstract
An interconnect structure, an interconnect structure for interconnecting first and second components, an interconnect structure for interconnecting a multiple component stack and a substrate, and a method of fabricating an interconnect structure. The interconnect structure comprising a base portion formed on a mounting surface of a first component; a pillar portion extending from the base portion and substantially perpendicularly to the mounting surface; and a head portion formed on the pillar portion and having larger lateral dimensions than the pillar portion; wherein the base portion and the pillar portion are integrally formed of a homogeneous material.
Claims
exact text as granted — not AI-modifiedThe invention claimed is:
1. A micro device interconnect structure for interconnecting a multiple component stack and a substrate, the interconnect structure comprising:
a first base portion formed on a first mounting surface of a first component of the stack;
a first pillar portion extending from the first base portion and substantially perpendicularly to the first mounting surface; and
a first head portion formed on the first pillar portion and having larger lateral dimensions than the first pillar portion;
a second base portion formed on a second mounting surface of a second component of the stack;
a second pillar portion extending from the second base portion and substantially perpendicularly to the second mounting surface; and
a second head portion formed on the second pillar portion and having larger lateral dimensions than the second pillar portion;
a first and a second contact pad formed on a mounting surface of the substrate; and
a connection for connecting the first and second head portions to the first and second contact pads respectively;
wherein the base portions and the pillar portions are integrally formed of a homogeneous material pillar and the first pillar portion is higher than the second pillar portion.
2. The interconnect structure of claim 1 , further comprising a spacer disposed between the first and second components of the stack.
3. The interconnect structure of claim 1 , wherein the connection for connecting the head portion of the interconnect structure to the contact pad comprises one or more of a group consisting of solder, adhesive bonding, surface activated bonding, compression bonding and diffusion bonding.Cited by (0)
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References (0)
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