Template manufacturing method, template inspecting method and inspecting apparatus, nanoimprint apparatus, nanoimprint system, and device manufacturing method

Abstract

There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

The invention claimed is: 
     
       1. A nanoimprinting apparatus, comprising:
 a master template which has a depression/protrusion pattern; 
 a replica template which is manufactured from the master template by an imprinting method; 
 an inspection light source part which radiates inspection light of plane waves; 
 a stage configured to dispose the master template and the replica template so as to be in close proximity with each other; 
 a detection part which detects light of a component different from the plane waves, the light of the component being generated by the plane wave transmitting through the master template and the replica template; 
 a transport unit which transports the replica template from the stage; 
 a holding part which receives the transported replica template from the transport unit and holds the transported replica template; 
 a substrate mounting platform which is disposed opposing the replica template held by the holding part and whereon a substrate is mounted, the substrate being coated with a liquid resin; 
 a pressing part which presses at least one of the replica template and the substrate such that the resin is stamped with the depression/protrusion pattern; 
 an optical system, which is disposed between the detection part, on one side; and the master template and the replica template, on an other side, and in a radiation direction of the inspection light; and 
 a light shielding member, which is disposed at a pupil position of the optical system and which blocks the plane waves. 
 
     
     
       2. A nanoimprinting system, comprising:
 a master template which has a depression/protrusion pattern; 
 a replica template which is manufactured from the master template by an imprinting method; 
 an inspection light source part which radiates inspection light of plane waves; 
 a stage configured to dispose the master template and the replica template so as to be in close proximity with each other; 
 a detection part which detects light of a component different from the plane waves, the light of the component being generated by the plane wave transmitting through the master template and the replica template; 
 a transport unit which transports the replica template from the stage; 
 two holding parts which receive two pieces of the transported replica template respectively from the transport unit and which hold the transported replica templates; 
 two substrate mounting platforms which are disposed opposing the two pieces of the replica templates held by the two holding parts and whereon substrates are mounted, each of the substrates being coated with a liquid resin; 
 two pressing parts each of which presses at least one of the replica template and the substrate such that the resin is stamped with the depression/protrusion pattern, and 
 an optical system which is disposed between the detection part, on one side, and the master template and the replica template, on an other side, and in a direction different from a radiation direction of the inspection light. 
 
     
     
       3. The nanoimprinting apparatus according to  claim 1 , wherein the stage can adjust a distance between the master template and the replica template. 
     
     
       4. The nanoimprinting apparatus according to  claim 1 , wherein the stage fills a space between the master template and the replica template with a liquid. 
     
     
       5. The nanoimprinting apparatus according to  claim 4 , wherein a refractive index of the liquid is different from a refractive index of the master template or a refractive index of the replica template. 
     
     
       6. The nanoimprinting apparatus according to  claim 1 , wherein the inspection light is light of a first short wavelength, which is shorter than wavelengths of visible light, and a second short wavelength, which is different from the first short wavelength. 
     
     
       7. The nanoimprinting apparatus according to  claim 1 , wherein the light of the component different from the plane waves includes a spherical wave component. 
     
     
       8. The nanoimprinting system according to  claim 2 , wherein the stage can adjust a distance between the master template and the replica template. 
     
     
       9. The nanoimprinting system according to  claim 2 , wherein the stage fills a space between the master template and the replica template with a liquid. 
     
     
       10. The nanoimprinting system according to  claim 9 , wherein a refractive index of the liquid is different from a refractive index of the master template or a refractive index of the replica template. 
     
     
       11. The nanoimprinting system according to  claim 2 , wherein the inspection light is light of a first short wavelength, which is shorter than wavelengths of visible light, and a second short wavelength, which is different from the first short wavelength. 
     
     
       12. The nanoimprinting system according to  claim 2 , wherein the light of the component different from the plane waves includes a spherical wave component. 
     
     
       13. A nanoimprinting apparatus, comprising:
 a master template which has a depression/protrusion pattern; 
 a replica template which is manufactured from the master template by an imprinting method; 
 an inspection light source part which radiates inspection light of plane waves; 
 a stage configured to dispose the master template and the replica template so as to be in close proximity with each other; 
 a detection part which detects light of a component different from the plane waves, the light of the component being generated by the plane wave transmitting through the master template and the replica template; 
 a transport unit which transports the replica template from the stage; 
 a holding part which receives the transported replica template from the transport unit and holds the transported replica template; 
 a substrate mounting platform which is disposed opposing the replica template held by the holding part and whereon a substrate is mounted, the substrate being coated with a liquid resin; 
 a pressing part which presses at least one of the replica template and the substrate such that the resin is stamped with the depression/protrusion pattern; and 
 an optical system which is disposed between the detection part, on one side, and the master template and the replica template, on an other side, and in a direction different from a radiation direction of the inspection light.