Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus and method exposes a substrate via a projection optical system and a liquid supplied to an immersion area below the projection optical system. First and second movable members move below the projection optical system. The first movable member has a mount area that mounts a substrate located in a hole of an upper surface of the first movable member. The upper surface outside the hole can maintain at least a part of the immersion area outside the substrate mounted in the hole. A drive system drives the first and second movable members to move the first and second movable members below the projection optical system relative to the liquid immersion region to replace one member positioned below the projection optical system with the other member such that the liquid immersion area is maintained below the projection optical system.

What is claimed is: 
     
       1. An exposure apparatus that exposes a substrate with illumination light via liquid, the apparatus comprising:
 a catadioptric projection system having (a) a plane-convex lens arranged such that a plane surface is in contact with the liquid and (b) a plurality of lenses at least a part of which is used for adjustment of magnification and distortion; 
 a detection system arranged apart from the projection system and configured to detect a mark on the substrate; 
 a liquid immersion member having an opening through which the illumination light passes and arranged to surround the plane-convex lens and such that a liquid immersion region is formed with the liquid beneath the projection system; 
 a first movable member having an upper surface and arranged below the projection system and below the detection system, the upper surface having a hole in which the substrate can be placed, the first movable member being arranged such that at least part of the liquid immersion region is maintained by the upper surface when the at least part of the liquid immersion region is located outside the substrate, which is placed in the hole; 
 a second movable member having an upper surface and arranged below the projection system and below the detection system, the second movable member being arranged to be movable relative to the first movable member; 
 a drive system having a motor, parts of which are provided at the first and second movable members respectively, the drive system being configured to move the first and second movable members by use of the motor; and 
 a controller coupled to the drive system and configured to control a drive for the first and second movable members, wherein 
 the controller is configured to control the drive system such that, while one of the first and second movable members is arranged opposite to the projection system, another one of the first and second movable members approaches the one of the first and second movable members, and such that the first and second movable members in an approached state move relative to the liquid immersion member in a predetermined direction, which is orthogonal to an optical axis of the projection system, so that the another one of the first and second movable members is arranged opposite to the projection system in place of the one of the first and second movable members while the liquid immersion region is substantially maintained beneath the projection system, 
 when the liquid immersion region is maintained beneath the projection system by the one of the first and second movable members, which is arranged opposite to the projection system, the another one of the first and second movable members is away from beneath the projection system, 
 the exposure apparatus is configured such that the liquid immersion region is formed with the liquid which is supplied via the liquid immersion member, and such that the liquid of the liquid immersion region is collected via the liquid immersion member, and 
 the exposure apparatus is configured such that the substrate is exposed with the illumination light via the projection system and via the liquid of the liquid immersion region, and such that the mark is detected by the detection system not via the liquid. 
 
     
     
       2. The exposure apparatus according to  claim 1 , wherein
 the liquid immersion member has a collection port provided at a lower surface side thereof and surrounding the opening, and has a collection flow path provided inside the liquid immersion member, an edge of the collection flow path being connected to the collection port, and 
 the liquid of the liquid immersion region is collected via the collection port and via the collection flow path. 
 
     
     
       3. The exposure apparatus according to  claim 2 ,
 wherein the liquid immersion member has another collection port that is arranged at the lower surface side and that is arranged further away from the opening than the collection port. 
 
     
     
       4. The exposure apparatus according to  claim 2 , wherein
 a supply port is provided at the lower surface side of the liquid immersion member and between the opening and the collection port, 
 a supply flow path is provided inside the liquid immersion member, an end of the supply flow path being connected to the supply port, and 
 the liquid is supplied to the liquid immersion region via the supply flow path and via the supply port. 
 
     
     
       5. The exposure apparatus according to  claim 4 ,
 wherein the liquid immersion member is provided movably with respect to the projection system. 
 
     
     
       6. The exposure apparatus according to  claim 5 ,
 wherein the liquid immersion member is arranged adjacent a lower end portion of the projection system so that the plane-convex lens is located substantially inside the liquid immersion member. 
 
     
     
       7. The exposure apparatus according to  claim 1 ,
 wherein, when the first and second movable members in the approached state move relative to the liquid immersion member, a positional relationship of the first and second movable members in the predetermined direction is substantially maintained. 
 
     
     
       8. The exposure apparatus according to  claim 7 ,
 wherein the relative movement between the first and second movable members includes (a) an approach between the first and second movable members in the predetermined direction and (b) an adjustment of the positional relationship between the first and second movable members in a direction, which intersects the predetermined direction. 
 
     
     
       9. The exposure apparatus according to  claim 8 ,
 wherein the exposure apparatus is configured such that the liquid immersion region is transferred from the one to the another one of the first and second movable members along with the movement of the first and second movable members, in the approached state, relative to the liquid immersion member. 
 
     
     
       10. The exposure apparatus according to  claim 9 ,
 wherein, when the first and second movable members in the approached state move relative to the liquid immersion member, the liquid immersion region is maintained beneath the projection system by at least one of the first and second movable members in the approached state. 
 
     
     
       11. The exposure apparatus according to  claim 1 ,
 wherein the second movable member is arranged such that the substrate can be placed in a hole on the upper surface of the second movable member, and such that at least part of the liquid immersion region is maintained by the upper surface of the second movable member when the at least part of the liquid immersion region is located outside the substrate, which is placed in the hole on the upper surface of the second movable member. 
 
     
     
       12. The exposure apparatus according to  claim 11 ,
 wherein, when the substrate is arranged opposite to the projection system by the first movable member or by the second movable member and is exposed with the illumination light, the liquid immersion region is formed on a part of the substrate and covers an irradiated area of the illumination light. 
 
     
     
       13. The exposure apparatus according to  claim 12 ,
 wherein the first and second movable members are each arranged such that, when the substrate is placed in the hole, a gap is provided between the upper surface thereof and a surface of the substrate, and the upper surface thereof and the surface of the substrate are substantially coplanar. 
 
     
     
       14. The exposure apparatus according to  claim 13 ,
 wherein each of the first and second movable members has a reference provided on the upper surface thereof, and is arranged to move such that a measurement using the reference is executed via the projection system. 
 
     
     
       15. The exposure apparatus according to  claim 14 ,
 wherein the first and second movable members each have a reference member arranged in a hole on the upper surface thereof, which is different from the hole for the substrate, the reference being formed on a surface of the reference member. 
 
     
     
       16. The exposure apparatus according to  claim 15 ,
 wherein, in each of the first and second movable members, the reference member is provided such that a surface thereof, on which the reference is formed, and the upper surface of the first movable member or of the second movable member are substantially coplanar. 
 
     
     
       17. The exposure apparatus according to  claim 16 ,
 wherein, prior to the movement of the approached first and second movable members relative to the liquid immersion member, different operations between the first and second movable members are executed in parallel. 
 
     
     
       18. The exposure apparatus according to  claim 17 ,
 wherein the movement of the first and second movable members relative to the liquid immersion member is followed by the different operations between the one and the another one of the first and second movable members in a state in which the one of the first and second movable members is away from beneath the projection system and in which the another one of the first and second movable members is arranged opposite to the projection system in place of the one of the first and second movable members. 
 
     
     
       19. The exposure apparatus according to  claim 16 ,
 wherein a mark detecting process, by use of the detection system for the substrate placed on the another one of the first and second movable members, is followed by a relative movement between the one and the another one of the first and second movable members such that the first and second movable members approach each other in a state in which the one of the first and second movable members is arranged opposite to the projection system. 
 
     
     
       20. The exposure apparatus according to  claim 19 ,
 wherein an exposure process for the substrate placed on the one of the first and second movable members is performed in parallel with the mark detecting process for the substrate placed on the another one of the first and second movable members. 
 
     
     
       21. The exposure apparatus according to  claim 20 ,
 wherein the movement of the first and second movable members relative to the liquid immersion member is followed by the exposure process for the substrate placed on the another one of the first and second movable members. 
 
     
     
       22. The exposure apparatus according to  claim 21 ,
 wherein the movement of the approached first and second movable members relative to the liquid immersion member is followed by the movement of the one of the first and second movable members to be away from beneath the projection system and to be at a substrate exchange position for an exchange process of the substrate. 
 
     
     
       23. The exposure apparatus according to  claim 22 ,
 wherein the exposure process for the substrate placed on the first movable member and the exposure process for the substrate placed on the second movable member are alternately performed, and the movement of the approached first and second movable members relative to the immersion member is performed between the exposure processes. 
 
     
     
       24. The exposure apparatus according to  claim 22 ,
 wherein the exposure process of a plurality of the substrates is performed by alternately using the first and second movable members, and the liquid immersion region is maintained beneath the projection system in the exposure process of the plurality of the substrates. 
 
     
     
       25. The exposure apparatus according to  claim 16 ,
 wherein, while a scanning exposure of the substrate, as the exposure, is performed, the substrate is moved in the predetermined direction. 
 
     
     
       26. The exposure apparatus according to  claim 16 ,
 wherein the detection system is arranged at a position different from the projection system in the predetermined direction. 
 
     
     
       27. The exposure apparatus according to  claim 16 , wherein
 the detection system is located in a second area that is different from a first area in which the projection system is located, and 
 for each of the first and second movable members, a moving route from the second area to the first area is substantially different from a moving route from the first area to the second area. 
 
     
     
       28. The exposure apparatus according to  claim 27 ,
 wherein the detection system is arranged at a position different from the projection system in the predetermined direction. 
 
     
     
       29. The exposure apparatus according to  claim 16 , wherein
 the detection system is located in a second area that is different from a first area in which the projection system is located, and 
 for each of the first and second movable members, a moving route from the second area to the first area is substantially the same as a moving route from the first area to the second area. 
 
     
     
       30. The exposure apparatus according to  claim 16 , further comprising:
 an encoder configured to obtain positional information of the first and second movable members, in an exposure process for the substrate, by using at least one of scales provided at rear surfaces of the first and second movable members. 
 
     
     
       31. An exposure method of exposing a substrate with illumination light via liquid, the method comprising:
 supplying the liquid via a liquid immersion member to form a liquid immersion region beneath a catadioptric projection system, the projection system having (a) a plane-convex lens arranged such that a plane surface is in contact with the liquid and (b) a plurality of lenses at least a part of which is used for adjustment of magnification and distortion, the liquid immersion member having an opening through which the illumination light passes and arranged to surround the plane-convex lens; 
 arranging one of a first movable member and a second movable member to be opposite to the projection system, the first movable member having an upper surface and arranged below the projection system and below a detection system, the upper surface having a hole in which the substrate can be placed, the first movable member being arranged such that at least part of the liquid immersion region is maintained by the upper surface when the at least part of the liquid immersion region is located outside the substrate, which is placed in the hole, the second movable member having an upper surface and arranged below the projection system and below the detection system, the second movable member being arranged to be movable relative to the first movable member, the detection system being arranged apart from the projection system and configured to detect a mark on the substrate; 
 executing a relative movement between the first and second movable members such that, while the one of the first and second movable members is arranged opposite to the projection system, another one of the first and second movable members approaches the one of the first and second movable members; and 
 moving the first and second movable members, in an approached state, relative to the liquid immersion member in a predetermined direction, which is orthogonal to an optical axis of the projection system, so that the another one of the first and second movable members is arranged opposite to the projection system in place of the one of the first and second movable members while the liquid immersion region is substantially maintained beneath the projection system, wherein 
 the first and second movable members are moved by use of a motor, parts of which are provided at the first and second movable members respectively, 
 when the liquid immersion region is maintained beneath the projection system by the one of the first and second movable members, which is arranged opposite to the projection system, the another one of the first and second movable members is away from beneath the projection system, 
 the substrate is exposed with the illumination light via the projection system and via the liquid of the liquid immersion region, 
 the mark is detected by the detection system not via the liquid, and 
 the liquid of the liquid immersion region is collected via the liquid immersion member. 
 
     
     
       32. The exposure method according to  claim 31 , wherein
 the liquid immersion member has a collection port provided at a lower surface side thereof and surrounding the opening, and has a collection flow path provided inside the liquid immersion member, an edge of the collection flow path being connected to the collection port, and 
 the liquid of the liquid immersion region is collected via the collection port and via the collection flow path. 
 
     
     
       33. The exposure method according to  claim 32 ,
 wherein the liquid immersion member has another collection port that is arranged at the lower surface side and that is arranged further away from the opening than the collection port. 
 
     
     
       34. The exposure method according to  claim 32 , wherein
 a supply port is provided at the lower surface side of the liquid immersion member and between the opening and the collection port, 
 a supply flow path is provided inside the liquid immersion member, an end of the supply flow path being connected to the supply port, and 
 the liquid is supplied to the liquid immersion region via the supply flow path and via the supply port. 
 
     
     
       35. The exposure method according to  claim 34 ,
 wherein the liquid immersion member is provided movably with respect to the projection system. 
 
     
     
       36. The exposure method according to  claim 35 ,
 wherein the liquid immersion member is arranged adjacent a lower end portion of the projection system so that the plane-convex lens is located substantially inside the liquid immersion member. 
 
     
     
       37. The exposure method according to  claim 31 ,
 wherein, when the first and second movable members in the approached state move relative to the liquid immersion member, a positional relationship of the first and second movable members in the predetermined direction is substantially maintained. 
 
     
     
       38. The exposure method according to  claim 37 ,
 wherein the relative movement between the first and second movable members includes (a) an approach between the first and second movable members in the predetermined direction and (b) an adjustment of the positional relationship between the first and second movable members in a direction, which intersects the predetermined direction. 
 
     
     
       39. The exposure method according to  claim 38 ,
 wherein the exposure apparatus is configured such that the liquid immersion region is transferred from the one to the another one of the first and second movable members along with the movement of the first and second movable members, in the approached state, relative to the liquid immersion member. 
 
     
     
       40. The exposure method according to  claim 39 ,
 wherein, when the first and second movable members in the approached state move relative to the liquid immersion member, the liquid immersion region is maintained beneath the projection system by at least one of the first and second movable members in the approached state. 
 
     
     
       41. The exposure method according to  claim 31 ,
 wherein the second movable member is arranged such that the substrate can be placed in a hole on the upper surface of the second movable member, and such that at least part of the liquid immersion region is maintained by the upper surface of the second movable member when the at least part of the liquid immersion region is located outside the substrate, which is placed in the hole on the upper surface of the second movable member. 
 
     
     
       42. The exposure method according to  claim 41 ,
 wherein, when the substrate is arranged opposite to the projection system by the first movable member or by the second movable member and is exposed with the illumination light, the liquid immersion region is formed on a part of the substrate and covers an irradiated area of the illumination light. 
 
     
     
       43. The exposure method according to  claim 42 ,
 wherein the first and second movable members are each arranged such that, when the substrate is placed in the hole, a gap is provided between the upper surface thereof and a surface of the substrate, and the upper surface thereof and the surface of the substrate are substantially coplanar. 
 
     
     
       44. The exposure method according to  claim 43 ,
 wherein each of the first and second movable members has a reference provided on the upper surface thereof, and is arranged to move such that a measurement using the reference is executed via the projection system. 
 
     
     
       45. The exposure method according to  claim 44 ,
 wherein the first and second movable members each have a reference member arranged in a hole on the upper surface thereof, which is different from the hole for the substrate, the reference being formed on a surface of the reference member. 
 
     
     
       46. The exposure method according to  claim 45 ,
 wherein, in each of the first and second movable members, the reference member is provided such that a surface thereof, on which the reference is formed, and the upper surface of the first movable member or of the second movable member are substantially coplanar. 
 
     
     
       47. The exposure method according to  claim 46 ,
 wherein, prior to the movement of the approached first and second movable members relative to the liquid immersion member, different operations between the first and second movable members are executed in parallel. 
 
     
     
       48. The exposure method according to  claim 47 ,
 wherein the movement of the first and second movable members relative to the liquid immersion member is followed by the different operations between the one and the another one of the first and second movable members in a state in which the one of the first and second movable members is away from beneath the projection system and in which the another one of the first and second movable members is arranged opposite to the projection system in place of the one of the first and second movable members. 
 
     
     
       49. The exposure method according to  claim 46 ,
 wherein a mark detecting process, by use of the detection system for the substrate placed on the another one of the first and second movable members, is followed by a relative movement between the one and the another one of the first and second movable members such that the first and second movable members approach each other in a state in which the one of the first and second movable members is arranged opposite to the projection system. 
 
     
     
       50. The exposure method according to  claim 49 ,
 wherein an exposure process for the substrate placed on the one of the first and second movable members is performed in parallel with the mark detecting process for the substrate placed on the another one of the first and second movable members. 
 
     
     
       51. The exposure method according to  claim 50 ,
 wherein the movement of the first and second movable members relative to the liquid immersion member is followed by exposure process for the substrate placed on the another one of the first and second movable members. 
 
     
     
       52. The exposure method according to  claim 51 ,
 wherein the movement of the approached first and second movable members relative to the liquid immersion member is followed by the movement of the one of the first and second movable members to be away from beneath the projection system and to be at a substrate exchange position for an exchange process of the substrate. 
 
     
     
       53. The exposure method according to  claim 52 ,
 wherein the exposure process for the substrate placed on the first movable member and the exposure process for the substrate placed on the second movable member are alternately performed, and the movement of the approached first and second movable members relative to the immersion member is performed between the exposure processes. 
 
     
     
       54. The exposure method according to  claim 52 ,
 wherein the exposure process of a plurality of the substrates is performed by alternately using the first and second movable members, and the liquid immersion region is maintained beneath the projection system in the exposure process of the plurality of the substrates. 
 
     
     
       55. The exposure method according to  claim 46 ,
 wherein, while a scanning exposure of the substrate, as the exposure, is performed, the substrate is moved in the predetermined direction. 
 
     
     
       56. The exposure method according to  claim 46 ,
 wherein the mark is detected by the detection system that is arranged at a position different from the projection system in the predetermined direction. 
 
     
     
       57. The exposure method according to  claim 46 , wherein
 the detection system is located in a second area that is different from a first area in which the projection system is located, and 
 for each of the first and second movable members, a moving route from the second area to the first area is substantially different from a moving route from the first area to the second area. 
 
     
     
       58. The exposure method according to  claim 57 ,
 wherein the mark is detected by the detection system that is arranged at a position different from the projection system in the predetermined direction. 
 
     
     
       59. The exposure method according to  claim 46 , wherein
 the detection system is located in a second area that is different from a first area in which the projection system is located, and 
 for each of the first and second movable members, a moving route from the second area to the first area is substantially the same as a moving route from the first area to the second area. 
 
     
     
       60. The exposure method according to  claim 46 ,
 wherein positional information of the first and second movable members is obtained, in an exposure process for the substrate, by using at least one of scales provided at rear surfaces of the first and second movable members. 
 
     
     
       61. A device fabricating method comprising:
 exposing a substrate by use of the exposure apparatus of  claim 1 ; and 
 developing the exposed substrate. 
 
     
     
       62. A device fabricating method comprising:
 exposing a substrate by use of the exposure method of  claim 31 ; and 
 developing the exposed substrate. 
 
     
     
       63. A manufacturing method of an exposure apparatus that is configured to expose a substrate with illumination light via liquid, the method comprising:
 providing a catadioptric projection system having (a) a plane-convex lens arranged such that a plane surface is in contact with the liquid and (b) a plurality of lenses at least a part of which is used for adjustment of magnification and distortion; 
 providing a detection system arranged apart from the projection system and configured to detect a mark on the substrate; 
 providing a liquid immersion member having an opening through which the illumination light passes, the liquid immersion member being arranged to surround the plane-convex lens and such that a liquid immersion region is formed with the liquid beneath the projection system; 
 providing a first movable member, the first movable member having an upper surface and being arranged below the projection system and below the detection system, the upper surface having a hole in which the substrate can be placed, the first movable member being arranged such that at least part of the liquid immersion region is maintained by the upper surface when the at least part of the liquid immersion region is located outside the substrate, which is placed in the hole; 
 providing a second movable member, the second movable member having an upper surface and being arranged below the projection system and below the detection system, the second movable member being arranged to be movable relative to the first movable member; 
 providing a drive system having a motor, parts of which are provided at the first and second movable members respectively, the drive system being configured to move the first and second movable members by use of the motor; and 
 providing a controller coupled to the drive system and configured to control a drive for the first and second movable members, wherein 
 the controller is configured to control the drive system such that, while one of the first and second movable members is arranged opposite to the projection system, another one of the first and second movable members approaches the one of the first and second movable members, and such that the first and second movable members in an approached state move relative to the liquid immersion member in a predetermined direction, which is orthogonal to an optical axis of the projection system, so that the another one of the first and second movable members is arranged opposite to the projection system in place of the one of the first and second movable members while the liquid immersion region is substantially maintained beneath the projection system, 
 when the liquid immersion region is maintained beneath the projection system by the one of the first and second movable members, which is arranged opposite to the projection system, the another one of the first and second movable members is away from beneath the projection system, 
 the immersion area is formed with the liquid which is supplied via the immersion member, 
 the liquid of the liquid immersion region is collected via the liquid immersion member, 
 the substrate is exposed with the illumination light via the projection system and via the liquid of the liquid immersion region, and 
 the mark is detected by the detection system not via the liquid.