USD1005245SActiveUtility

Electrode cover for a plasma processing apparatus

90
Assignee: HITACHI HIGH TECH CORPPriority: Apr 19, 2021Filed: Oct 18, 2021Granted: Nov 21, 2023
Est. expiryApr 19, 2041(~14.7 yrs left)· nominal 20-yr term from priority
Inventors:Shintarou NakataniTakamasa IchinoKazunori NakamotoYuki Tanaka
90
PatentIndex Score
14
Cited by
28
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

Join the waitlist — get patent alerts

Track USD1005245S — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.