Inventor · disambiguated record
Takamasa Ichino
Also filed as: ICHINO TAKAMASA
17 granted patents·10 pending applications·971 citations·filing 2008–2023
93Inventor score
Top patents by PatentIndex Score
27 records- 0198USD840364SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Feb 12, 2019·453 cites·1 claims
- 0298USD827592SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Sep 4, 2018·448 cites·1 claims
- 0390USD1005245SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Nov 21, 2023·14 cites·1 claims
- 0486US8329054B2Plasma processing apparatus and plasma processing methodICHINO TAKAMASA·Filed 2008·Granted Dec 11, 2012·14 cites·2 claims
- 0582US10763088B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 1, 2020·1 cites·8 claims
- 0682US10692784B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 23, 2020·3 cites·9 claims
- 0778USD840365SCover ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Feb 12, 2019·18 cites·1 claims
- 0875US11094509B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 17, 2021·2 cites·3 claims
- 0970US9566821B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2012·Granted Feb 14, 2017·2 cites·6 claims
- 1070US8186300B2Plasma processing apparatusICHINO TAKAMASA·Filed 2009·Granted May 29, 2012·4 cites·5 claims
- 1169USD836573SRing for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Dec 25, 2018·12 cites·1 claims
- 1252US2024282555A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1351US2025038019A1Manufacturing system and method of semiconductor deviceHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1450US9887070B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Feb 6, 2018·0 cites·6 claims
- 1549US2025232962A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 1648US2024047181A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 1748US2010203736A1Plasma Processing MethodHITACHI HIGH TECH CORP·Filed 2009·Application pending·0 cites
- 1847US2010163187A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2009·Application pending·0 cites
- 1947US2010326957A1Plasma processing apparatus and plasma processing methodMAEDA KENJI·Filed 2009·Application pending·0 cites
- 2046US12334316B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Jun 17, 2025·0 cites·6 claims
- 2146US11315759B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Apr 26, 2022·0 cites·10 claims
- 2246US2025118541A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 2346US2017025254A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Application pending·0 cites
- 2445US12224157B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Granted Feb 11, 2025·0 cites·8 claims
- 2545US9779919B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 3, 2017·0 cites·6 claims
- 2644US2020083026A1Plasma processing deviceHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 2743US10741368B2Plasma processing apparatusHITACHI HIGH-TECH CORP·Filed 2018·Granted Aug 11, 2020·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →