USD840364SActiveUtility

Electrode cover for a plasma processing apparatus

98
Assignee: HITACHI HIGH TECH CORPPriority: Jan 31, 2017Filed: Jul 18, 2017Granted: Feb 12, 2019
Est. expiryJan 31, 2037(~10.5 yrs left)· nominal 20-yr term from priority
Inventors:Takamasa IchinoKohei SatoKazunori Nakamoto
98
PatentIndex Score
453
Cited by
31
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

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