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Ring for a plasma processing apparatus

69
Assignee: HITACHI HIGH TECH CORPPriority: Jan 31, 2017Filed: Jul 18, 2017Granted: Dec 25, 2018
Est. expiryJan 31, 2037(~10.5 yrs left)· nominal 20-yr term from priority
Inventors:Takamasa IchinoKohei SatoKazunori Nakamoto
69
PatentIndex Score
12
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33
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1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a ring for a plasma processing apparatus, as shown and described.

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