USD827592SActiveUtility

Electrode cover for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Jan 31, 2017Filed: Jul 18, 2017Granted: Sep 4, 2018

Est. expiryJan 31, 2037(~10.5 yrs left)· nominal 20-yr term from priority

PatentIndex Score

448

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References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

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