USD407073SExpiredUtility

Electrostatic chuck with improved spacing and charge migration reduction mask

76
Assignee: APPLIED MATERIALS INCPriority: Dec 24, 1997Filed: Dec 24, 1997Granted: Mar 23, 1999
Est. expiryDec 24, 2017(expired)· nominal 20-yr term from priority
Inventors:Vincent E. BurkhartAllen FlaniganSteven V. Sansoni
76
PatentIndex Score
20
Cited by
6
References
1
Claims

Claims

exact text as granted — not AI-modified
The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown herein.

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