Inventor · disambiguated record
Vincent E. Burkhart
Also filed as: BURKHART VINCENT · BURKHART VINCENT E
35 granted patents·9 pending applications·1,643 citations·filing 1996–2024
98Inventor score
Top patents by PatentIndex Score
44 records- 0199US5656093AWafer spacing mask for a substrate support chuck and method of fabricating sameAPPLIED MATERIALS INC·Filed 1996·Granted Aug 12, 1997·849 cites·29 claims
- 0295US11835868B2Protective coating for electrostatic chucksLAM RES CORP·Filed 2021·Granted Dec 5, 2023·3 cites·7 claims
- 0395US11183368B2RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucksLAM RES CORP·Filed 2018·Granted Nov 23, 2021·12 cites·42 claims
- 0495US9447499B2Dual plenum, axi-symmetric showerhead with edge-to-center gas deliveryROY SHAMBHU N·Filed 2012·Granted Sep 20, 2016·24 cites·19 claims
- 0593US11086233B2Protective coating for electrostatic chucksLAM RES CORP·Filed 2018·Granted Aug 10, 2021·10 cites·21 claims
- 0692US9337067B2High temperature electrostatic chuck with radial thermal chokesROY SHAMBHU N·Filed 2012·Granted May 10, 2016·17 cites·38 claims
- 0791US12243725B2High temperature RF connection with integral thermal chokeLAM RES CORP·Filed 2022·Granted Mar 4, 2025·1 cites·20 claims
- 0891US6377060B1Method and apparatus for wafer detectionAPPLIED MATERIALS INC·Filed 2000·Granted Apr 23, 2002·75 cites·12 claims
- 0990US7736473B2Magnetron having continuously variable radial positionAPPLIED MATERIALS INC·Filed 2005·Granted Jun 15, 2010·11 cites·8 claims
- 1090US6469283B1Method and apparatus for reducing thermal gradients within a substrate supportAPPLIED MATERIALS INC·Filed 1999·Granted Oct 22, 2002·112 cites·16 claims
- 1189US5764471AMethod and apparatus for balancing an electrostatic force produced by an electrostatic chuckAPPLIED MATERIALS INC·Filed 1996·Granted Jun 9, 1998·83 cites·23 claims
- 1288US12217939B2RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucksLAM RES CORP·Filed 2021·Granted Feb 4, 2025·1 cites·16 claims
- 1388US7018515B2Selectable dual position magnetronAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·21 cites·40 claims
- 1487US6075375AApparatus for wafer detectionAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·92 cites·15 claims
- 1586USD420022SElectrostatic chuck with improved spacing and charge migration reduction maskAPPLIED MATERIALS INC·Filed 1997·Granted Feb 1, 2000·31 cites·1 claims
- 1684US11990360B2Electrostatic chuck (ESC) pedestal voltage isolationLAM RES CORP·Filed 2019·Granted May 21, 2024·3 cites·21 claims
- 1784US8685215B2Mechanism for continuously varying radial position of a magnetronMILLER KEITH A·Filed 2010·Granted Apr 1, 2014·5 cites·12 claims
- 1880US2025118535A1Rf tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucksLAM RES CORP·Filed 2024·Application pending·0 cites
- 1979US6488820B1Method and apparatus for reducing migration of conductive material on a componentAPPLIED MATERIALS INC·Filed 2000·Granted Dec 3, 2002·21 cites·48 claims
- 2078US6303879B1Laminated ceramic with multilayer electrodes and method of fabricationAPPLIED MATERIALS INC·Filed 1999·Granted Oct 16, 2001·50 cites·8 claims
- 2177US2023416922A1Tool for preventing or suppressing arcingLAM RES CORP·Filed 2023·Application pending·0 cites
- 2276USD407073SElectrostatic chuck with improved spacing and charge migration reduction maskAPPLIED MATERIALS INC·Filed 1997·Granted Mar 23, 1999·20 cites·1 claims
- 2375US5923521AMethod and apparatus for balancing an electrostatic force produced by an electrostatic chuckAPPLIED MATERIALS INC·Filed 1998·Granted Jul 13, 1999·38 cites·6 claims
- 2474US5886865AMethod and apparatus for predicting failure of an eletrostatic chuckAPPLIED MATERIALS INC·Filed 1998·Granted Mar 23, 1999·43 cites·21 claims
- 2574US2024045344A1Protective coating for electrostatic chucksLAM RES CORP·Filed 2023·Application pending·0 cites
- 2673US7138039B2Liquid isolation of contact ringsAPPLIED MATERIALS INC·Filed 2003·Granted Nov 21, 2006·7 cites·6 claims
- 2773US2024266202A1Electrostatic chuck (esc) pedestal voltage isolationLAM RES CORP·Filed 2024·Application pending·0 cites
- 2870US11232966B2Electrostatic chucking pedestal with substrate backside purging and thermal sinkingLAM RES CORP·Filed 2018·Granted Jan 25, 2022·1 cites·19 claims
- 2970US5825607AInsulated wafer spacing mask for a substrate support chuck and method of fabricating sameAPPLIED MATERIALS INC·Filed 1996·Granted Oct 20, 1998·36 cites·23 claims
- 3068US2020048770A1Chemical vapor deposition tool for preventing or suppressing arcingLAM RES CORP·Filed 2018·Application pending·0 cites
- 3167US10832936B2Substrate support with increasing areal density and corresponding method of fabricatingLAM RES CORP·Filed 2016·Granted Nov 10, 2020·1 cites·17 claims
- 3267US6843897B2Anode slime reduction method while maintaining low currentAPPLIED MATERIALS INC·Filed 2002·Granted Jan 18, 2005·4 cites·33 claims
- 3365USD420023SElectrostatic chuck with improved spacing mask and workpiece detection deviceAPPLIED MATERIALS INC·Filed 1999·Granted Feb 1, 2000·13 cites·1 claims
- 3464US7067045B2Method and apparatus for sealing electrical contacts during an electrochemical deposition processAPPLIED MATERIALS INC·Filed 2002·Granted Jun 27, 2006·3 cites·23 claims
- 3563USD406852SElectrostatic chuck with improved spacing mask and workpiece detection deviceAPPLIED MATERIALS INC·Filed 1997·Granted Mar 16, 1999·12 cites·1 claims
- 3663US5745332AMonopolar electrostatic chuck having an electrode in contact with a workpieceAPPLIED MATERIALS INC·Filed 1996·Granted Apr 28, 1998·26 cites·14 claims
- 3759US6855235B2Anode impedance control through electrolyte flow controlAPPLIED MATERIALS INC·Filed 2002·Granted Feb 15, 2005·2 cites·36 claims
- 3855US2023073259A1High temperature substrate support with heat spreaderLAM RES CORP·Filed 2021·Application pending·0 cites
- 3950US6869516B2Method for removing electrolyte from electrical contacts and wafer touching areasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 22, 2005·2 cites·19 claims
- 4048US2023369091A1High temperature pedestal with extended electrostatic chuck electrodeLAM RES CORP·Filed 2021·Application pending·0 cites
- 4147US2022367229A1Power source isolation circuits for heater elements of substrate supports of substrate processing systemsLAM RES CORP·Filed 2020·Application pending·0 cites
- 4245US6291777B1Conductive feed-through for creating a surface electrode connection within a dielectric body and method of fabricating sameAPPLIED MATERIALS INC·Filed 1999·Granted Sep 18, 2001·11 cites·20 claims
- 4340US2015163860A1Apparatus and method for uniform irradiation using secondary irradiant energy from a single light sourceLAM RES CORP·Filed 2013·Application pending·0 cites
- 4432US5982607AMonopolar electrostatic chuck having an electrode in contact with a workpieceAPPLIED MATERIALS INC·Filed 1998·Granted Nov 9, 1999·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →