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Electrode plate for a plasma processing apparatus

79
Assignee: KUWABARA YUSEIPriority: Sep 30, 2011Filed: Mar 29, 2012Granted: Feb 11, 2014
Est. expirySep 30, 2031(~5.2 yrs left)· nominal 20-yr term from priority
79
PatentIndex Score
27
Cited by
21
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

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