Inventor · disambiguated record
Keiichi Nagakubo
Also filed as: NAGAKUBO KEIICHI
17 granted patents·3 pending applications·1,637 citations·filing 2005–2020
95Inventor score
Top patents by PatentIndex Score
20 records- 0196USD709537SFocusing ringKUWABARA YUSEI·Filed 2012·Granted Jul 22, 2014·447 cites·1 claims
- 0296USD559993SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 15, 2008·499 cites·1 claims
- 0396USD559994SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 15, 2008·529 cites·1 claims
- 0495US9117635B2Electrode plate for plasma etching and plasma etching apparatusSATOH NAOYUKI·Filed 2011·Granted Aug 25, 2015·11 cites·5 claims
- 0588US9818583B2Electrode plate for plasma etching and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 14, 2017·2 cites·15 claims
- 0688USD699200SElectrode member for a plasma processing apparatusNAGAKUBO KEIICHI·Filed 2012·Granted Feb 11, 2014·45 cites·1 claims
- 0787USD709539SFocusing ringKUWABARA YUSEI·Filed 2012·Granted Jul 22, 2014·40 cites·1 claims
- 0881US11148179B2Method for cleaning substrate transfer mechanism and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Oct 19, 2021·1 cites·14 claims
- 0979US10569310B2Method for cleaning substrate transfer mechanism and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Feb 25, 2020·2 cites·14 claims
- 1079USD699199SElectrode plate for a plasma processing apparatusKUWABARA YUSEI·Filed 2012·Granted Feb 11, 2014·27 cites·1 claims
- 1177US8221579B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2010·Granted Jul 17, 2012·3 cites·8 claims
- 1277USD560284SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 22, 2008·25 cites·1 claims
- 1373US8475622B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2012·Granted Jul 2, 2013·2 cites·6 claims
- 1469US10720356B2Substrate processing apparatus and method of transferring substrateTOKYO ELECTRON LTD·Filed 2017·Granted Jul 21, 2020·1 cites·6 claims
- 1569US8858712B2Electrode for use in plasma processing apparatus and plasma processing apparatusNAGAKUBO KEIICHI·Filed 2010·Granted Oct 14, 2014·3 cites·7 claims
- 1667US8715782B2Surface processing methodTOKYO ELECTRON LTD·Filed 2012·Granted May 6, 2014·0 cites·4 claims
- 1754US2013284375A1Consumable part for use in a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1849US8318034B2Surface processing methodSATOH NAOYUKI·Filed 2010·Granted Nov 27, 2012·0 cites·4 claims
- 1942US2019096702A1Substrate processing apparatus, substrate processing method, and computer storage mediumTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2038US2022013385A1Substrate processing apparatus and substrate transport methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →