USD824440SActiveUtility

Heater of substrate processing apparatus

Assignee: HITACHI INT ELECTRIC INCPriority: Feb 12, 2016Filed: Aug 10, 2016Granted: Jul 31, 2018
Est. expiryFeb 12, 2036(~9.6 yrs left)· nominal 20-yr term from priority
56
PatentIndex Score
7
Cited by
12
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a heater of substrate processing apparatus, as shown and described.

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