USD924953SActiveUtility
Gas inlet attachment for substrate processing apparatus
Est. expiryJul 19, 2038(~12 yrs left)· nominal 20-yr term from priority
Inventors:Hironori Shimada
54
PatentIndex Score
6
Cited by
15
References
1
Claims
Claims
exact text as granted — not AI-modifiedCLAIM
I claim the ornamental design for a gas inlet attachment for substrate processing apparatus, as shown and described.Join the waitlist — get patent alerts
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