Inventor
HOI SIEW KIT
SG18 patents
Patents
18 patentsUSD908645SJan 26, 2021
Sputtering target for a physical vapor deposition chamber
APPLIED MATERIALS INC29 citations93
USD894137SAug 25, 2020
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC26 citations92
USD851613SJun 18, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC33 citations92
USD1053230SDec 3, 2024
Sputter target for a physical vapor deposition chamber
APPLIED MATERIALS INC17 citations89
US11581167B2Feb 14, 2023
Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber
APPLIED MATERIALS INC2 citations72
US11761078B2Sep 19, 2023
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC2 citations69
US10648071B2May 12, 2020
Process kit having a floating shadow ring
APPLIED MATERIALS INC1 citations61
US12590361B2Mar 31, 2026
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations57
US12564014B2Feb 24, 2026
Method and apparatus for substrate temperature control
APPLIED MATERIALS INC0 citations57
US11674216B2Jun 13, 2023
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) with controlled cooling
APPLIED MATERIALS INC1 citations57
US11670485B2Jun 6, 2023
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)
APPLIED MATERIALS INC1 citations56
US9978639B2May 22, 2018
Methods for reducing copper overhang in a feature of a substrate
APPLIED MATERIALS INC0 citations51
US12046460B1Jul 23, 2024
Programmable electrostatic chuck to enhance aluminum film morphology
APPLIED MATERIALS INC0 citations47
US12037676B1Jul 16, 2024
Programmable ESC to enhance aluminum film morphology
APPLIED MATERIALS INC0 citations47
US11784033B2Oct 10, 2023
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations46
US12467132B2Nov 11, 2025
Methods for depositing film layers
APPLIED MATERIALS INC0 citations45
US12392023B1Aug 19, 2025
Methods and apparatus for depositing amorphous indium tin oxide film
APPLIED MATERIALS INC0 citations43
US11557499B2Jan 17, 2023
Methods and apparatus for prevention of component cracking using stress relief layer
APPLIED MATERIALS INC0 citations43