P

Inventor

HAYASHI DAISUKE

JP202 patents
⚠️ This page may combine multiple inventors who share the name “HAYASHI DAISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

18 patents
USD548705SAug 14, 2007

Attracting disc for an electrostatic chuck for semiconductor production

TOKYO ELECTRON LTD87 citations98
US6334983B1Jan 1, 2002

Processing system

TOKYO ELECTRON LTD52 citations95
USD546784SJul 17, 2007

Attracting disc for an electrostatic chuck for semiconductor production

TOKYO ELECTRON LTD39 citations93
USD493873SAug 3, 2004

Heating gas supplier for semiconductor manufacturing equipment

TOKYO ELECTRON LTD23 citations93
US7338576B2Mar 4, 2008

Plasma processing device

TOKYO ELECTRON LTD41 citations92
US7658816B2Feb 9, 2010

Focus ring and plasma processing apparatus

TOKYO ELECTRON LTD36 citations91
USD490450SMay 25, 2004

Exhaust ring for semiconductor equipment

TOKYO ELECTRON LTD31 citations90
US7678225B2Mar 16, 2010

Focus ring for semiconductor treatment and plasma treatment device

TOKYO ELECTRON LTD21 citations89
US6758941B1Jul 6, 2004

Plasma processing unit, window member for plasma processing unit and electrode plate for plasma processing unit

TOKYO ELECTRON LTD38 citations89
US8048687B2Nov 1, 2011

Processing method for recovering a damaged low-k film of a substrate and storage medium

TOKYO ELECTRON LTD10 citations84
US7619179B2Nov 17, 2009

Electrode for generating plasma and plasma processing apparatus using same

TOKYO ELECTRON LTD12 citations84
USD548200SAug 7, 2007

Attracting disc for an electrostatic chuck for semiconductor production

TOKYO ELECTRON LTD13 citations84
US10153138B2Dec 11, 2018

Plasma etching apparatus

TOKYO ELECTRON LTD7 citations83
US7622017B2Nov 24, 2009

Processing apparatus and gas discharge suppressing member

TOKYO ELECTRON LTD8 citations83
US7481240B2Jan 27, 2009

Partial pressure control system, flow rate control system and shower plate used for partial pressure control system

TOKYO ELECTRON LTD10 citations83
US7023002B2Apr 4, 2006

Surface treating device and surface treating method

TOKYO ELECTRON LTD11 citations83
US10340174B2Jul 2, 2019

Mounting table and plasma processing apparatus

TOKYO ELECTRON LTD7 citations82
US7230202B2Jun 12, 2007

Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod

TOKYO ELECTRON LTD9 citations74

HAYASHI DAISUKE

6 patents

IBM

5 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

5 patents

MITA INDUSTRIAL CO LTD

4 patents

YKK CORP

3 patents

KOMATSU MFG CO LTD

3 patents

NITTO DENKO CORP

1 patent

HIMORI SHINJI

1 patent

HORIBA STEC CO LTD

1 patent

SEIKO EPSON CORP

1 patent

MINAMI MASAKAZU

1 patent

SHIMANUKI KAZUHIKO

1 patent

Showing the top 50 of 202 patents by PatentIndex Score.