Inventor · disambiguated record
Adrianus Hendrik Koevoets
Also filed as: KOEVOETS ADRIANUS HENDRIK
25 granted patents·4 pending applications·58 citations·filing 2009–2022
94Inventor score
Files withASML NETHERLANDS BV21ASML HOLDING NV2BUTLER HANS2AMSL NETHERLANDS B V1KOENEN WILLEM HERMAN GERTRUDA ANNA1
Top patents by PatentIndex Score
29 records- 0195US9507275B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·10 cites·20 claims
- 0290US10955595B2Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Mar 23, 2021·5 cites·18 claims
- 0390US10324383B2Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatusASML HOLDING NV·Filed 2016·Granted Jun 18, 2019·5 cites·24 claims
- 0490US9983489B2Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiationASML NETHERLANDS BV·Filed 2015·Granted May 29, 2018·5 cites·21 claims
- 0589US10747127B2Lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Aug 18, 2020·5 cites·26 claims
- 0689US10416574B2Lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·5 cites·14 claims
- 0786US10120292B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 6, 2018·2 cites·20 claims
- 0885US8300208B2Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatusLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 30, 2012·8 cites·15 claims
- 0981US8144310B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2009·Granted Mar 27, 2012·5 cites·17 claims
- 1080US10747125B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Aug 18, 2020·1 cites·20 claims
- 1177US9618859B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Apr 11, 2017·2 cites·20 claims
- 1270US9696640B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jul 4, 2017·1 cites·12 claims
- 1369US9122173B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2012·Granted Sep 1, 2015·1 cites·16 claims
- 1467US9684249B2Lithographic apparatus with a metrology system for measuring a position of a substrate tableASML NETHERLANDS BV·Filed 2013·Granted Jun 20, 2017·1 cites·17 claims
- 1567US8922756B2Position measurement system, lithographic apparatus and device manufacturing methodKOENEN WILLEM HERMAN GERTRUDA ANNA·Filed 2012·Granted Dec 30, 2014·2 cites·20 claims
- 1661US10935895B2Lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Mar 2, 2021·0 cites·21 claims
- 1756US10712678B2Imprint lithography apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Jul 14, 2020·0 cites·9 claims
- 1854US2024264540A1Substrate holder and methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1952US10394140B2Lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·0 cites·16 claims
- 2051US11740566B2Lithography apparatusASML NETHERLANDS BV·Filed 2020·Granted Aug 29, 2023·0 cites·20 claims
- 2151US9939738B2Lithographic apparatus and an object positioning systemASML NETHERLANDS BV·Filed 2015·Granted Apr 10, 2018·0 cites·20 claims
- 2251US2011001254A1Imprint Lithography Apparatus and MethodASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
- 2350USRE49142ELithographic apparatus and an object positioning systemASML NETHERLANDS BV·Filed 2015·Granted Jul 19, 2022·0 cites·24 claims
- 2450USRE49066EChucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatusASML HOLDING NV·Filed 2016·Granted May 10, 2022·0 cites·50 claims
- 2548US11287752B2Cooling apparatus and plasma-cleaning station for cooling apparatusASML NETHERLANDS BV·Filed 2018·Granted Mar 29, 2022·0 cites·20 claims
- 2648US2024077380A1A method and system for predicting aberrations in a projection systemASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2747US2011194088A1Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing MethodAMSL NETHERLANDS B V·Filed 2009·Application pending·0 cites
- 2843US10018926B2Lithographic apparatus and method of manufacturing a lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jul 10, 2018·0 cites·20 claims
- 2940US9310700B2Lithography method and apparatusKOEVOETS ADRIANUS HENDRIK·Filed 2011·Granted Apr 12, 2016·0 cites·20 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →