Inventor · disambiguated record
Yao Zhi Hu
Also filed as: HU YAO ZHI
15 granted patents·1 pending application·1,061 citations·filing 1993–2010
95Inventor score
Files withMATTSON TECH INC9STEAG RTP SYSTEMS INC4LYON ECOLE CENTRALE1MATTSON THERMAL PRODUCTS GMBH1TIMANS PAUL J1
Top patents by PatentIndex Score
16 records- 0198US6451713B1UV pretreatment process for ultra-thin oxynitride formationMATTSON TECH INC·Filed 2001·Granted Sep 17, 2002·510 cites·14 claims
- 0292US6403923B1System for controlling the temperature of a reflective substrate during rapid heatingMATTSON TECH INC·Filed 2000·Granted Jun 11, 2002·66 cites·20 claims
- 0390US6707011B2Rapid thermal processing system for integrated circuitsMATTSON TECH INC·Filed 2002·Granted Mar 16, 2004·50 cites·41 claims
- 0490US6200023B1Method for determining the temperature in a thermal processing chamberSTEAG RTP SYSTEMS INC·Filed 1999·Granted Mar 13, 2001·92 cites·35 claims
- 0589US7737385B2Selective reflectivity process chamber with customized wavelength response and methodMATTSON TECH INC·Filed 2006·Granted Jun 15, 2010·13 cites·22 claims
- 0688US7115837B2Selective reflectivity process chamber with customized wavelength response and methodMATTSON TECH INC·Filed 2003·Granted Oct 3, 2006·38 cites·100 claims
- 0785US6600138B2Rapid thermal processing system for integrated circuitsMATTSON TECH INC·Filed 2001·Granted Jul 29, 2003·32 cites·36 claims
- 0885US6204484B1System for measuring the temperature of a semiconductor wafer during thermal processingSTEAG RTP SYSTEMS INC·Filed 1998·Granted Mar 20, 2001·76 cites·22 claims
- 0983US7977258B2Method and system for thermally processing a plurality of wafer-shaped objectsMATTSON TECH INC·Filed 2007·Granted Jul 12, 2011·11 cites·69 claims
- 1083US6359263B2System for controlling the temperature of a reflective substrate during rapid heatingSTEAG RTP SYSTEMS INC·Filed 1999·Granted Mar 19, 2002·69 cites·15 claims
- 1182US9633876B2Selective reflectivity process chamber with customized wavelength response and methodTIMANS PAUL J·Filed 2010·Granted Apr 25, 2017·5 cites·18 claims
- 1280US6075922AProcess for preventing gas leaks in an atmospheric thermal processing chamberSTEAG RTP SYSTEMS INC·Filed 1997·Granted Jun 13, 2000·68 cites·26 claims
- 1372US6706643B2UV-enhanced oxy-nitridation of semiconductor substratesMATTSON TECH INC·Filed 2002·Granted Mar 16, 2004·14 cites·17 claims
- 1449US7151060B2Device and method for thermally treating semiconductor wafersMATTSON THERMAL PRODUCTS GMBH·Filed 2003·Granted Dec 19, 2006·4 cites·34 claims
- 1548US2009325386A1Process and System For Varying the Exposure to a Chemical Ambient in a Process ChamberMATTSON TECH INC·Filed 2009·Application pending·0 cites
- 1641US5624190AMethod and apparatus for measuring the temperature of an object, in particular a semiconductor, by ellipsometryLYON ECOLE CENTRALE·Filed 1993·Granted Apr 29, 1997·13 cites·11 claims
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