Inventor
YOSHIDA HIDENARI
JP44 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIDA HIDENARI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
25 patentsUSD770993SNov 8, 2016
Reaction tube
HITACHI INT ELECTRIC INC485 citations99
USD846514SApr 23, 2019
Boat of substrate processing apparatus
HITACHI INT ELECTRIC INC28 citations94
USD839219SJan 29, 2019
Boat for substrate processing apparatus
HITACHI INT ELECTRIC INC21 citations94
USD791090SJul 4, 2017
Reaction tube
HITACHI INT ELECTRIC INC19 citations92
USD772824SNov 29, 2016
Reaction tube
HITACHI INT ELECTRIC INC21 citations92
USD747279SJan 12, 2016
Boat for substrate processing apparatus
HITACHI INT ELECTRIC INC21 citations92
USD738329SSep 8, 2015
Boat for substrate processing apparatus
HITACHI INT ELECTRIC INC21 citations92
USD737785SSep 1, 2015
Boat for substrate processing apparatus
HITACHI INT ELECTRIC INC18 citations92
USD734730SJul 21, 2015
Boat of substrate processing apparatus
HITACHI INT ELECTRIC INC19 citations92
USD872037SJan 7, 2020
Cover of seal cap for reaction chamber for semiconductor manufacturing
HITACHI INT ELECTRIC INC9 citations84
USD855027SJul 30, 2019
Cover of seal cap for reaction chamber of semiconductor
HITACHI INT ELECTRIC INC8 citations84
USD847301SApr 30, 2019
Return nozzle
HITACHI INT ELECTRIC INC7 citations84
USD847105SApr 30, 2019
Boat of substrate processing apparatus
HITACHI INT ELECTRIC INC13 citations84
USD843958SMar 26, 2019
Reaction tube
HITACHI INT ELECTRIC INC8 citations84
USD842823SMar 12, 2019
Reaction tube
HITACHI INT ELECTRIC INC9 citations84
US11542601B2Jan 3, 2023
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC2 citations73
US11222796B2Jan 11, 2022
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations73
US10689758B2Jun 23, 2020
Substrate processing apparatus, and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US10811271B2Oct 20, 2020
Substrate processing device, manufacturing method for semiconductor device, and reaction tube
HITACHI INT ELECTRIC INC4 citations72
US8791031B2Jul 29, 2014
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations63
US10615061B2Apr 7, 2020
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations62
US11001924B2May 11, 2021
Substrate processing apparatus, nozzle base, and manufacturing method for semiconductor device
HITACHI INT ELECTRIC INC0 citations52
USD793975SAug 8, 2017
Heater for semiconductor thermal process
HITACHI INT ELECTRIC INC0 citations52
US9957616B2May 1, 2018
Substrate processing apparatus and heating unit
HITACHI INT ELECTRIC INC0 citations42
US9111748B2Aug 18, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer readable recording medium
HITACHI INT ELECTRIC INC0 citations39
KOKUSAI ELECTRIC CORP
19 patentsUSD916037SApr 13, 2021
Cover of seal cap for reaction chamber for semiconductor
KOKUSAI ELECTRIC CORP9 citations86
USD937385SNov 30, 2021
Return nozzle
KOKUSAI ELECTRIC CORP10 citations85
US10453735B2Oct 22, 2019
Substrate processing apparatus, reaction tube, semiconductor device manufacturing method, and recording medium
KOKUSAI ELECTRIC CORP8 citations84
US10950457B2Mar 16, 2021
Substrate processing device, manufacturing method for semiconductor device, and reaction tube
KOKUSAI ELECTRIC CORP5 citations83
US11495477B2Nov 8, 2022
Substrate processing apparatus
KOKUSAI ELECTRIC CORP2 citations73
US11453942B2Sep 27, 2022
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations73
US10961625B2Mar 30, 2021
Substrate processing apparatus, reaction tube and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US10808318B2Oct 20, 2020
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP3 citations73
US10731254B2Aug 4, 2020
Protective plate, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP3 citations73
US11685992B2Jun 27, 2023
Substrate processing apparatus, quartz reaction tube and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations72
US12203167B2Jan 21, 2025
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US12062546B2Aug 13, 2024
Substrate processing device, manufacturing method for semiconductor device, and reaction tube
KOKUSAI ELECTRIC CORP1 citations62
US11990359B2May 21, 2024
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11952664B2Apr 9, 2024
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11898247B2Feb 13, 2024
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11859280B2Jan 2, 2024
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11155920B2Oct 26, 2021
Substrate processing apparatus, and method for manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations62
USD928106SAug 17, 2021
Supporting column of insulation unit for semiconductor manufacturing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US10923366B2Feb 16, 2021
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52