Inventor · disambiguated record
Norma Riley
Also filed as: RILEY NORMA · RILEY NORMA B
22 granted patents·2 pending applications·1,448 citations·filing 1991–2009
97Inventor score
Top patents by PatentIndex Score
24 records- 0197US7290813B2Active edge grip rest padASYST TECHNOLOGIES·Filed 2004·Granted Nov 6, 2007·543 cites·17 claims
- 0294US6833322B2Apparatuses and methods for depositing an oxide filmAPPLIED MATERIALS INC·Filed 2002·Granted Dec 21, 2004·72 cites·54 claims
- 0394US6562720B2Apparatus and method for surface finishing a silicon filmAPPLIED MATERIALS INC·Filed 2002·Granted May 13, 2003·99 cites·20 claims
- 0493US5916369AGas inlets for wafer processing chamberAPPLIED MATERIALS INC·Filed 1995·Granted Jun 29, 1999·117 cites·9 claims
- 0591US6489241B1Apparatus and method for surface finishing a silicon filmAPPLIED MATERIALS INC·Filed 1999·Granted Dec 3, 2002·110 cites·22 claims
- 0688US8229587B2Semiconductor fabrication facility visualization system with performance optimizationSHIEH KARL·Filed 2009·Granted Jul 24, 2012·43 cites·24 claims
- 0787US6399510B1Bi-directional processing chamber and method for bi-directional processing of semiconductor substratesAPPLIED MATERIALS INC·Filed 2000·Granted Jun 4, 2002·48 cites·28 claims
- 0885US6254686B1Vented lower liner for heating exhaust gas from a single substrate reactorAPPLIED MATERIALS INC·Filed 2000·Granted Jul 3, 2001·28 cites·9 claims
- 0983US6153260AMethod for heating exhaust gas in a substrate reactorAPPLIED MATERIALS INC·Filed 1997·Granted Nov 28, 2000·45 cites·6 claims
- 1078US5198071AProcess for inhibiting slip and microcracking while forming epitaxial layer on semiconductor waferAPPLIED MATERIALS INC·Filed 1991·Granted Mar 30, 1993·65 cites·24 claims
- 1177US6366861B1Method of determining a wafer characteristic using a film thickness monitorAPPLIED MATERIALS INC·Filed 1997·Granted Apr 2, 2002·49 cites·16 claims
- 1275US7515049B2Extended read range RFID systemASYST TECHNOLOGIES·Filed 2006·Granted Apr 7, 2009·9 cites·18 claims
- 1375US6500734B2Gas inlets for wafer processing chamberAPPLIED MATERIALS INC·Filed 1999·Granted Dec 31, 2002·45 cites·21 claims
- 1473US5855677AMethod and apparatus for controlling the temperature of reaction chamber wallsAPPLIED MATERIALS INC·Filed 1997·Granted Jan 5, 1999·37 cites·28 claims
- 1572US6083323AMethod for controlling the temperature of the walls of a reaction chamber during processingAPPLIED MATERIALS INC·Filed 1998·Granted Jul 4, 2000·34 cites·7 claims
- 1670US5298107AProcessing method for growing thick filmsAPPLIED MATERIALS INC·Filed 1992·Granted Mar 29, 1994·25 cites·6 claims
- 1768US5322567AParticulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatusAPPLIED MATERIALS INC·Filed 1991·Granted Jun 21, 1994·38 cites·19 claims
- 1858US6685779B2Method and a system for sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 2002·Granted Feb 3, 2004·5 cites·15 claims
- 1950US6376387B2Method of sealing an epitaxial silicon layer on a substrateAPPLIED MATERIALS INC·Filed 1999·Granted Apr 23, 2002·13 cites·16 claims
- 2044US5316794AMethod for servicing vacuum chamber using non-reactive gas-filled maintenance enclosureAPPLIED MATERIALS INC·Filed 1992·Granted May 31, 1994·12 cites·9 claims
- 2138US6171966B1Delineation pattern for epitaxial depositionsAPPLIED MATERIALS INC·Filed 1996·Granted Jan 9, 2001·7 cites·13 claims
- 2238US2003092266A1Gas inlets for wafer processing chamberFiled 2003·Application pending·0 cites
- 2338US2003153157A1Low energy ion implantation into SiGeFiled 2002·Application pending·0 cites
- 2433US5411593AApparatus for servicing vacuum chamber using non-reactive gas filled maintenance enclosureAPPLIED MATERIALS INC·Filed 1993·Granted May 2, 1995·4 cites·15 claims
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