Inventor · disambiguated record
Douglas A. Buchberger, Jr.
Also filed as: BUCHBERGER DOUGLAS · BUCHBERGER DOUGLAS A · BUCHBERGER DOUGLAS A JR · BUCHBERGER DOUGLAS ARTHUR
121 granted patents·38 pending applications·5,608 citations·filing 1992–2024
99Inventor score
Files withAPPLIED MATERIALS INC121BUCHBERGER JR DOUGLAS A6BRILLHART PAUL LUKAS5COLLINS KENNETH S5HOFFMAN DANIEL J4
Top patents by PatentIndex Score
159 records- 0199US6900596B2Capacitively coupled plasma reactor with uniform radial distribution of plasmaAPPLIED MATERIALS INC·Filed 2002·Granted May 31, 2005·224 cites·53 claims
- 0298US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 0398US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 0498US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 0598US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 0698US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 0798US7196283B2Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surfaceAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·118 cites·48 claims
- 0898US6586886B1Gas distribution plate electrode for a plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Jul 1, 2003·115 cites·46 claims
- 0998US6252354B1RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT controlAPPLIED MATERIALS INC·Filed 1996·Granted Jun 26, 2001·337 cites·72 claims
- 1098US6054013AParallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion densityAPPLIED MATERIALS INC·Filed 1996·Granted Apr 25, 2000·596 cites·19 claims
- 1198US5187454AElectronically tuned matching network using predictor-corrector control systemAPPLIED MATERIALS INC·Filed 1992·Granted Feb 16, 1993·165 cites·38 claims
- 1297US10203604B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2016·Granted Feb 12, 2019·16 cites·16 claims
- 1397US9829790B2Immersion field guided exposure and post-exposure bake processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·12 cites·15 claims
- 1497US8937800B2Electrostatic chuck with advanced RF and temperature uniformityLUBOMIRSKY DMITRY·Filed 2013·Granted Jan 20, 2015·305 cites·20 claims
- 1596US8734664B2Method of differential counter electrode tuning in an RF plasma reactorAPPLIED MATERIALS INC·Filed 2013·Granted May 27, 2014·28 cites·19 claims
- 1696US8633423B2Methods and apparatus for controlling substrate temperature in a process chamberLIN XING·Filed 2011·Granted Jan 21, 2014·131 cites·17 claims
- 1796US8092639B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Jan 10, 2012·20 cites·7 claims
- 1896US8012304B2Plasma reactor with a multiple zone thermal control feed forward control apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·27 cites·11 claims
- 1996US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 2096US7649729B2Electrostatic chuck assemblyAPPLIED MATERIALS INC·Filed 2007·Granted Jan 19, 2010·45 cites·19 claims
- 2196US7030335B2Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted Apr 18, 2006·72 cites·125 claims
- 2296US6894245B2Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted May 17, 2005·108 cites·31 claims
- 2396US6077384APlasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 1996·Granted Jun 20, 2000·237 cites·67 claims
- 2496US6074512AInductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·236 cites·101 claims
- 2596US5874361AMethod of processing a wafer within a reaction chamberAPPLIED MATERIALS INC·Filed 1996·Granted Feb 23, 1999·172 cites·5 claims
- 2695US9123762B2Substrate support with symmetrical feed structureLIN XING·Filed 2010·Granted Sep 1, 2015·40 cites·19 claims
- 2795US7846497B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Dec 7, 2010·37 cites·21 claims
- 2895US6623596B1Plasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 23, 2003·84 cites·136 claims
- 2994US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 3094US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 3194US8608900B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Dec 17, 2013·18 cites·20 claims
- 3294US8270141B2Electrostatic chuck with reduced arcingWILLWERTH MICHAEL D·Filed 2010·Granted Sep 18, 2012·26 cites·20 claims
- 3394US5916689AElectrostatic chuck with an impregnated, porous layer that exhibits the Johnson-Rahbeck effectAPPLIED MATERIALS INC·Filed 1996·Granted Jun 29, 1999·187 cites·22 claims
- 3493US11815816B2Apparatus for post exposure bake of photoresistAPPLIED MATERIALS INC·Filed 2021·Granted Nov 14, 2023·2 cites·20 claims
- 3593US9666466B2Electrostatic chuck having thermally isolated zones with minimal crosstalkAPPLIED MATERIALS INC·Filed 2014·Granted May 30, 2017·10 cites·20 claims
- 3693US8329586B2Method of processing a workpiece in a plasma reactor using feed forward thermal controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 11, 2012·11 cites·18 claims
- 3793US8221580B2Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loopsBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Jul 17, 2012·14 cites·18 claims
- 3893US7775236B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·25 cites·20 claims
- 3993US6444085B1Inductively coupled RF plasma reactor having an antenna adjacent a window electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 3, 2002·54 cites·59 claims
- 4093US5684669AMethod for dechucking a workpiece from an electrostatic chuckAPPLIED MATERIALS INC·Filed 1995·Granted Nov 4, 1997·125 cites·20 claims
- 4192US9358702B2Temperature management of aluminium nitride electrostatic chuckAPPLIED MATERIALS INC·Filed 2013·Granted Jun 7, 2016·14 cites·16 claims
- 4292US8980044B2Plasma reactor with a multiple zone thermal control feed forward control apparatusBRILLHART PAUL LUKAS·Filed 2010·Granted Mar 17, 2015·10 cites·19 claims
- 4392US8337660B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 25, 2012·12 cites·13 claims
- 4492US8021521B2Method for agile workpiece temperature control in a plasma reactor using a thermal modelAPPLIED MATERIALS INC·Filed 2006·Granted Sep 20, 2011·13 cites·19 claims
- 4592US6165311AInductively coupled RF plasma reactor having an overhead solenoidal antennaAPPLIED MATERIALS INC·Filed 1996·Granted Dec 26, 2000·98 cites·64 claims
- 4691US10474033B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2017·Granted Nov 12, 2019·4 cites·18 claims
- 4791US8157951B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Apr 17, 2012·18 cites·16 claims
- 4891US7988872B2Method of operating a capacitively coupled plasma reactor with dual temperature control loopsAPPLIED MATERIALS INC·Filed 2006·Granted Aug 2, 2011·19 cites·20 claims
- 4991US7585384B2Apparatus and method to confine plasma and reduce flow resistance in a plasma reactorAPPLIED MATERIALS INC·Filed 2008·Granted Sep 8, 2009·10 cites·11 claims
- 5091US6063233AThermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antennaAPPLIED MATERIALS INC·Filed 1996·Granted May 16, 2000·92 cites·20 claims
Showing the top 50 of 159 patent records by PatentIndex Score.
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