Inventor · disambiguated record
Robert Charatan
Also filed as: CHARATAN ROBERT
16 granted patents·3 pending applications·205 citations·filing 2002–2020
94Inventor score
Top patents by PatentIndex Score
19 records- 0191US7205226B1Sacrificial layer for protection during trench etchLAM RES CORP·Filed 2005·Granted Apr 17, 2007·21 cites·15 claims
- 0290US7695632B2Critical dimension reduction and roughness controlLAM RES CORP·Filed 2005·Granted Apr 13, 2010·14 cites·18 claims
- 0389US6935938B1Multiple-conditioning member device for chemical mechanical planarization conditioningLAM RES CORP·Filed 2004·Granted Aug 30, 2005·34 cites·17 claims
- 0488US6955588B1Method of and platen for controlling removal rate characteristics in chemical mechanical planarizationLAM RES CORP·Filed 2004·Granted Oct 18, 2005·34 cites·25 claims
- 0587US8268118B2Critical dimension reduction and roughness controlLEE SANGHEON·Filed 2010·Granted Sep 18, 2012·8 cites·5 claims
- 0684US8340827B2Methods for controlling time scale of gas delivery into a processing chamberYUN GUNSU·Filed 2009·Granted Dec 25, 2012·29 cites·15 claims
- 0779US7004825B1Apparatus and associated method for conditioning in chemical mechanical planarizationLAM RES CORP·Filed 2003·Granted Feb 28, 2006·20 cites·12 claims
- 0877US8614149B2Critical dimension reduction and roughness controlLEE SANGHEON·Filed 2012·Granted Dec 24, 2013·3 cites·18 claims
- 0970US8529728B2System and method for critical dimension reduction and pitch reductionCHARATAN ROBERT·Filed 2008·Granted Sep 10, 2013·5 cites·14 claims
- 1070US7442649B2Etch with photoresist maskLAM RES CORP·Filed 2005·Granted Oct 28, 2008·3 cites·12 claims
- 1167US6752898B1Method and apparatus for an air bearing platen with raised topographyLAM RES CORP·Filed 2002·Granted Jun 22, 2004·11 cites·14 claims
- 1266US6958005B1Polishing pad conditioning systemLAM RES CORP·Filed 2004·Granted Oct 25, 2005·11 cites·28 claims
- 1360US7479457B2Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereofLAM RES CORP·Filed 2005·Granted Jan 20, 2009·1 cites·14 claims
- 1457US6899594B1Relative lateral motion in linear CMPLAM RES CORP·Filed 2004·Granted May 31, 2005·7 cites·26 claims
- 1551US7014539B1Method and apparatus for minimizing agglomerate particle size in a polishing fluidLAM RES CORP·Filed 2004·Granted Mar 21, 2006·4 cites·19 claims
- 1642US7427458B2System and method for critical dimension reduction and pitch reductionLAM RES CORP·Filed 2005·Granted Sep 23, 2008·0 cites·14 claims
- 1742US2007243713A1Apparatus and method for generating activated hydrogen for plasma strippingLAM RES CORP·Filed 2006·Application pending·0 cites
- 1841US2004058623A1Polishing media for chemical mechanical planarization (CMP)LAM RES CORP·Filed 2003·Application pending·0 cites
- 1940US2023369028A1Wear Compensating Confinement RingLAM RES CORP·Filed 2020·Application pending·0 cites
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