Inventor · disambiguated record
Michael N. Grimbergen
Also filed as: GRIMBERGEN MICHAEL · GRIMBERGEN MICHAEL N
42 granted patents·14 pending applications·1,676 citations·filing 1997–2023
98Inventor score
Files withAPPLIED MATERIALS INC37GRIMBERGEN MICHAEL8GRIMBERGEN MICHAEL N3CHANDRACHOOD MADHAVI R2LEWINGTON RICHARD1
Top patents by PatentIndex Score
56 records- 0199US6390019B1Chamber having improved process monitoring windowAPPLIED MATERIALS INC·Filed 1998·Granted May 21, 2002·186 cites·66 claims
- 0298US6712927B1Chamber having process monitoring windowAPPLIED MATERIALS INC·Filed 2000·Granted Mar 30, 2004·119 cites·70 claims
- 0397US6081334AEndpoint detection for semiconductor processesAPPLIED MATERIALS INC·Filed 1998·Granted Jun 27, 2000·251 cites·34 claims
- 0496US6352049B1Plasma assisted processing chamber with separate control of species densityAPPLIED MATERIALS INC·Filed 1998·Granted Mar 5, 2002·498 cites·24 claims
- 0595US6129807AApparatus for monitoring processing of a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Oct 10, 2000·78 cites·56 claims
- 0695US6074954AProcess for control of the shape of the etch front in the etching of polysiliconAPPLIED MATERIALS INC·Filed 1998·Granted Jun 13, 2000·155 cites·15 claims
- 0792US7632419B1Apparatus and method for monitoring processing of a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Dec 15, 2009·30 cites·25 claims
- 0891US7976671B2Mask etch plasma reactor with variable process gas distributionAPPLIED MATERIALS INC·Filed 2006·Granted Jul 12, 2011·20 cites·16 claims
- 0991US7520999B2Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·16 cites·20 claims
- 1091US6406924B1Endpoint detection in the fabrication of electronic devicesAPPLIED MATERIALS INC·Filed 1999·Granted Jun 18, 2002·93 cites·96 claims
- 1190US8158526B2Endpoint detection for photomask etchingGRIMBERGEN MICHAEL·Filed 2007·Granted Apr 17, 2012·11 cites·5 claims
- 1289US9218944B2Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensorsCHANDRACHOOD MADHAVI R·Filed 2006·Granted Dec 22, 2015·15 cites·12 claims
- 1389US6835275B1Reducing deposition of process residues on a surface in a chamberFiled 2000·Granted Dec 28, 2004·24 cites·36 claims
- 1488US7967930B2Plasma reactor for processing a workpiece and having a tunable cathodeAPPLIED MATERIALS INC·Filed 2006·Granted Jun 28, 2011·11 cites·21 claims
- 1587US8092695B2Endpoint detection for photomask etchingGRIMBERGEN MICHAEL·Filed 2007·Granted Jan 10, 2012·9 cites·6 claims
- 1687US7504041B2Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Mar 17, 2009·13 cites·15 claims
- 1786US9805939B2Dual endpoint detection for advanced phase shift and binary photomasksAPPLIED MATERIALS INC·Filed 2013·Granted Oct 31, 2017·6 cites·18 claims
- 1886US6824813B1Substrate monitoring method and apparatusAPPLIED MATERIALS INC·Filed 2000·Granted Nov 30, 2004·33 cites·40 claims
- 1985US9378930B2Inductively coupled plasma reactor having RF phase control and methods of use thereofGRIMBERGEN MICHAEL N·Filed 2010·Granted Jun 28, 2016·7 cites·14 claims
- 2083US8017029B2Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backsideAPPLIED MATERIALS INC·Filed 2006·Granted Sep 13, 2011·7 cites·19 claims
- 2182US8002946B2Mask etch plasma reactor with cathode providing a uniform distribution of etch rateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 23, 2011·8 cites·11 claims
- 2280US11719952B2Adjustable achromatic collimator assembly for endpoint detection systemsAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·1 cites·20 claims
- 2380US11022877B2Etch processing system having reflective endpoint detectionAPPLIED MATERIALS INC·Filed 2018·Granted Jun 1, 2021·2 cites·13 claims
- 2476US12066639B2Adjustable achromatic collimator assembly for endpoint detection systemsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 20, 2024·0 cites·20 claims
- 2575US8956809B2Apparatus and methods for etching quartz substrate in photomask manufacturing applicationsGRIMBERGEN MICHAEL·Filed 2013·Granted Feb 17, 2015·2 cites·20 claims
- 2675US8012366B2Process for etching a transparent workpiece including backside endpoint detection stepsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·3 cites·16 claims
- 2774US7829243B2Method for plasma etching a chromium layer suitable for photomask fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Nov 9, 2010·4 cites·21 claims
- 2874US6534756B1Ultra-stable, compact, high intensity fiber-coupled light source for use in monitoring and process controlAPPLIED MATERIALS INC·Filed 2000·Granted Mar 18, 2003·15 cites·18 claims
- 2972US7419551B2Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Sep 2, 2008·4 cites·16 claims
- 3071US6284665B1Method for controlling the shape of the etch front in the etching of polysiliconAPPLIED MATERIALS INC·Filed 1999·Granted Sep 4, 2001·31 cites·14 claims
- 3165US12007686B2Etch processing system having reflective endpoint detectionAPPLIED MATERIALS INC·Filed 2021·Granted Jun 11, 2024·0 cites·8 claims
- 3265US7431797B2Plasma reactor with a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·2 cites·19 claims
- 3363US2008272089A1Monitoring etching of a substrate in an etch chamberAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3461US7635546B2Phase shifting photomask and a method of fabricating thereofAPPLIED MATERIALS INC·Filed 2007·Granted Dec 22, 2009·1 cites·10 claims
- 3558US2007068456A1Monitoring processing of a substrate in a processing chamberGRIMBERGEN MICHAEL·Filed 2006·Application pending·0 cites
- 3657US6632321B2Method and apparatus for monitoring and controlling wafer fabrication processAPPLIED MATERIALS INC·Filed 1999·Granted Oct 14, 2003·21 cites·21 claims
- 3756US9142467B2Etch rate detection for anti-reflective coating layer and absorber layer etchingAPPLIED MATERIALS INC·Filed 2014·Granted Sep 22, 2015·0 cites·7 claims
- 3855US10453696B2Dual endpoint detection for advanced phase shift and binary photomasksAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·0 cites·10 claims
- 3952US8900469B2Etch rate detection for anti-reflective coating layer and absorber layer etchingGRIMBERGEN MICHAEL·Filed 2012·Granted Dec 2, 2014·0 cites·12 claims
- 4050US2008099436A1Endpoint detection for photomask etchingGRIMBERGEN MICHAEL·Filed 2007·Application pending·0 cites
- 4148US10170280B2Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wallAPPLIED MATERIALS INC·Filed 2015·Granted Jan 1, 2019·0 cites·15 claims
- 4248US2008099437A1Plasma reactor for processing a transparent workpiece with backside process endpoint detectionLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 4347US8808559B2Etch rate detection for reflective multi-material layers etchingGRIMBERGEN MICHAEL·Filed 2012·Granted Aug 19, 2014·0 cites·7 claims
- 4445US2008099435A1Endpoint detection for photomask etchingGRIMBERGEN MICHAEL·Filed 2007·Application pending·0 cites
- 4544US2008099450A1Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distributionAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4643US8961804B2Etch rate detection for photomask etchingGRIMBERGEN MICHAEL N·Filed 2012·Granted Feb 24, 2015·0 cites·20 claims
- 4743US2008179282A1Mask etch processCHANDRACHOOD MADHAVI R·Filed 2007·Application pending·0 cites
- 4842US8778204B2Methods for reducing photoresist interference when monitoring a target layer in a plasma processGRIMBERGEN MICHAEL N·Filed 2011·Granted Jul 15, 2014·0 cites·20 claims
- 4942US2009325387A1Methods and apparatus for in-situ chamber dry clean during photomask plasma etchingAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 5039US10595365B2Chamber lid heater ring assemblyOUYE ALAN H·Filed 2011·Granted Mar 17, 2020·0 cites·9 claims
Showing the top 50 of 56 patent records by PatentIndex Score.
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