Inventor
HONMA MANABU
JP56 patents
⚠️ This page may combine multiple inventors who share the name “HONMA MANABU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
22 patentsUS6235121B1May 22, 2001
Vertical thermal treatment apparatus
TOKYO ELECTRON LTD339 citations99
US8372202B2Feb 12, 2013
Film deposition apparatus
TOKYO ELECTRON LTD17 citations93
US5981966ANov 9, 1999
Auto-teaching method in semiconductor processing system
TOKYO ELECTRON LTD49 citations93
USD404015SJan 12, 1999
Wafer boat for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD22 citations93
US10221480B2Mar 5, 2019
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD19 citations85
US8673395B2Mar 18, 2014
Film deposition apparatus, film deposition method, and storage medium
TOKYO ELECTRON LTD10 citations84
US7432475B2Oct 7, 2008
Vertical heat treatment device and method controlling the same
TOKYO ELECTRON LTD17 citations84
US8034723B2Oct 11, 2011
Film deposition apparatus and film deposition method
TOKYO ELECTRON LTD19 citations82
US7674336B2Mar 9, 2010
Processing apparatus
TOKYO ELECTRON LTD11 citations78
US9988717B2Jun 5, 2018
Substrate processing apparatus
TOKYO ELECTRON LTD6 citations73
US9683290B2Jun 20, 2017
Substrate processing apparatus having a pillar support structure for preventing transformation of a ceiling portion
TOKYO ELECTRON LTD2 citations73
US10584416B2Mar 10, 2020
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US12571098B2Mar 10, 2026
Apparatus and method for performing film forming process on substrates in substrate processing chambers
TOKYO ELECTRON LTD0 citations52
US12385136B2Aug 12, 2025
Apparatus for performing film forming process on substrate, and method of exhausting processing gas from apparatus for performing film forming process on substrate
TOKYO ELECTRON LTD0 citations52
US12359302B2Jul 15, 2025
Film deposition apparatus and film deposition method
TOKYO ELECTRON LTD0 citations52
US12297536B2May 13, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations52
US12247287B2Mar 11, 2025
Apparatus for performing film forming process on substrate and method of using vacuum chuck mechanism provided in the apparatus
TOKYO ELECTRON LTD0 citations52
US12091753B2Sep 17, 2024
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US11702747B2Jul 18, 2023
Rotation driving mechanism and rotation driving method, and substrate processing apparatus and substrate processing method using same
TOKYO ELECTRON LTD0 citations52
US11339472B2May 24, 2022
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US11869798B2Jan 9, 2024
Deposition apparatus
TOKYO ELECTRON LTD0 citations51
US11674225B2Jun 13, 2023
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
KATO HITOSHI
13 patentsUS9103030B2Aug 11, 2015
Film deposition apparatus
KATO HITOSHI21 citations93
US8465592B2Jun 18, 2013
Film deposition apparatus
KATO HITOSHI22 citations93
US8465591B2Jun 18, 2013
Film deposition apparatus
KATO HITOSHI22 citations93
US8721790B2May 13, 2014
Film deposition apparatus
KATO HITOSHI23 citations92
US8992685B2Mar 31, 2015
Substrate processing apparatus, substrate processing method, and computer-readable storage medium
KATO HITOSHI18 citations84
US8882915B2Nov 11, 2014
Film deposition apparatus, film deposition method, and computer readable storage medium
KATO HITOSHI19 citations84
US8840727B2Sep 23, 2014
Film deposition apparatus, substrate processor, film deposition method, and computer-readable storage medium
KATO HITOSHI10 citations84
US8808456B2Aug 19, 2014
Film deposition apparatus and substrate process apparatus
KATO HITOSHI20 citations84
US8961691B2Feb 24, 2015
Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the method
KATO HITOSHI11 citations83
US8673079B2Mar 18, 2014
Film deposition apparatus and substrate processing apparatus
KATO HITOSHI11 citations81
US9297072B2Mar 29, 2016
Film deposition apparatus
KATO HITOSHI3 citations73
US9093490B2Jul 28, 2015
Film deposition apparatus
KATO HITOSHI4 citations73
US8944077B2Feb 3, 2015
Film deposition apparatus, cleaning method for the same, and computer storage medium storing program
KATO HITOSHI4 citations73
HONMA MANABU
12 patentsUS9267204B2Feb 23, 2016
Film deposition apparatus, substrate processing apparatus, film deposition method, and storage medium
HONMA MANABU426 citations99
USD655260SMar 6, 2012
Gas-separating plate for reactor for manufacturing semiconductor
HONMA MANABU421 citations98
USD655261SMar 6, 2012
Gas-separating plate for reactor for manufacturing semiconductor
HONMA MANABU421 citations98
USD654884SFeb 28, 2012
Top plate for reactor for manufacturing semiconductor
HONMA MANABU525 citations98
USD654882SFeb 28, 2012
Gas-separating plate for reactor for manufacturing semiconductor
HONMA MANABU421 citations98
USD655257SMar 6, 2012
Top plate for reactor for manufacturing semiconductor
HONMA MANABU23 citations92
USD655259SMar 6, 2012
Top plate for reactor for manufacturing semiconductor
HONMA MANABU22 citations92
USD654883SFeb 28, 2012
Top plate for reactor for manufacturing semiconductor
HONMA MANABU28 citations92
US8518183B2Aug 27, 2013
Film deposition apparatus, substrate process apparatus, film deposition method, and computer readable storage medium
HONMA MANABU11 citations84
USD655262SMar 6, 2012
Side wall for reactor for manufacturing semiconductor
HONMA MANABU8 citations84
USD655258SMar 6, 2012
Side wall for reactor for manufacturing semiconductor
HONMA MANABU11 citations84
US9039837B2May 26, 2015
Film deposition apparatus and substrate processing apparatus
HONMA MANABU3 citations63
AIKAWA KATSUYOSHI
1 patentOHIZUMI YUKIO
1 patentORITO KOHICHI
1 patentShowing the top 50 of 56 patents by PatentIndex Score.