Inventor · disambiguated record
Eric H. Lenz
Also filed as: LENZ ERIC · LENZ ERIC H · LENZ ERIC HOWARD
80 granted patents·13 pending applications·5,116 citations·filing 1990–2024
99Inventor score
Top patents by PatentIndex Score
93 records- 0199US6949204B1Deformation reduction at the main chamberLAM RES CORP·Filed 2004·Granted Sep 27, 2005·415 cites·6 claims
- 0299US6391787B1Stepped upper electrode for plasma processing uniformityLAM RES CORP·Filed 2000·Granted May 21, 2002·153 cites·29 claims
- 0398US8562272B2Substrate load and unload mechanisms for high throughputLENZ ERIC H·Filed 2010·Granted Oct 22, 2013·450 cites·14 claims
- 0498US6824627B2Stepped upper electrode for plasma processing uniformityLAM RES CORP·Filed 2002·Granted Nov 30, 2004·104 cites·15 claims
- 0598US6432831B2Gas distribution apparatus for semiconductor processingLAM RES CORP·Filed 2001·Granted Aug 13, 2002·315 cites·17 claims
- 0698US6245192B1Gas distribution apparatus for semiconductor processingLAM RES CORP·Filed 1999·Granted Jun 12, 2001·407 cites·15 claims
- 0797US7708859B2Gas distribution system having fast gas switching capabilitiesLAM RES CORP·Filed 2004·Granted May 4, 2010·268 cites·17 claims
- 0897US5074456AComposite electrode for plasma processesLAM RES CORP·Filed 1990·Granted Dec 24, 1991·453 cites·36 claims
- 0996US6786175B2Showerhead electrode design for semiconductor processing reactorLAM RES CORP·Filed 2001·Granted Sep 7, 2004·99 cites·22 claims
- 1096US6389677B1Perimeter wafer liftingLAM RES CORP·Filed 2001·Granted May 21, 2002·98 cites·15 claims
- 1196US6239403B1Power segmented electrodeLAM RES CORP·Filed 2000·Granted May 29, 2001·102 cites·21 claims
- 1296US5998932AFocus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamberLAM RES CORP·Filed 1998·Granted Dec 7, 1999·123 cites·22 claims
- 1396US5534751APlasma etching apparatus utilizing plasma confinementLAM RES CORP·Filed 1995·Granted Jul 9, 1996·290 cites·30 claims
- 1495US8080760B2Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactorDHINDSA RAJINDER·Filed 2010·Granted Dec 20, 2011·30 cites·15 claims
- 1595US7732728B2Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactorLAM RES CORP·Filed 2007·Granted Jun 8, 2010·52 cites·13 claims
- 1695US7712434B2Apparatus including showerhead electrode and heater for plasma processingLAM RES CORP·Filed 2004·Granted May 11, 2010·81 cites·13 claims
- 1795US7525787B2Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating sameLAM RES CORP·Filed 2005·Granted Apr 28, 2009·29 cites·32 claims
- 1895US6602381B1Plasma confinement by use of preferred RF return pathLAM RES CORP·Filed 2001·Granted Aug 5, 2003·49 cites·7 claims
- 1994US6984288B2Plasma processor in plasma confinement region within a vacuum chamberLAM RES CORP·Filed 2001·Granted Jan 10, 2006·52 cites·28 claims
- 2094US6042686APower segmented electrodeLAM RES CORP·Filed 1995·Granted Mar 28, 2000·117 cites·18 claims
- 2193US6872281B1Chamber configuration for confining a plasmaLAM RES CORP·Filed 2000·Granted Mar 29, 2005·66 cites·27 claims
- 2293US6716762B1Plasma confinement by use of preferred RF return pathLAM RES CORP·Filed 2003·Granted Apr 6, 2004·39 cites·8 claims
- 2393US6305677B1Perimeter wafer liftingLAM RES CORP·Filed 1999·Granted Oct 23, 2001·122 cites·34 claims
- 2492US8673785B2Gas distribution system having fast gas switching capabilitiesHUANG ZHISONG·Filed 2010·Granted Mar 18, 2014·10 cites·10 claims
- 2592US7252738B2Apparatus for reducing polymer deposition on a substrate and substrate supportLAM RES CORP·Filed 2002·Granted Aug 7, 2007·60 cites·17 claims
- 2691US8674255B1Apparatus and method for controlling etch uniformityLENZ ERIC·Filed 2005·Granted Mar 18, 2014·23 cites·18 claims
- 2791US6019060ACam-based arrangement for positioning confinement rings in a plasma processing chamberLAM RES CORP·Filed 1998·Granted Feb 1, 2000·136 cites·21 claims
- 2891US5569356AElectrode clamping assembly and method for assembly and use thereofLAM RES CORP·Filed 1995·Granted Oct 29, 1996·183 cites·29 claims
- 2990US8846539B2Apparatus including showerhead electrode and heater for plasma processingDHINDSA RAJINDER·Filed 2010·Granted Sep 30, 2014·10 cites·15 claims
- 3090US8343876B2Fast gas switching plasma processing apparatusLAM RES CORP·Filed 2011·Granted Jan 1, 2013·10 cites·9 claims
- 3190US7867356B2Apparatus for reducing polymer deposition on a substrate and substrate supportLAM RES CORP·Filed 2007·Granted Jan 11, 2011·15 cites·18 claims
- 3290US7094315B2Chamber configuration for confining a plasmaLAM RES CORP·Filed 2004·Granted Aug 22, 2006·46 cites·27 claims
- 3390US6363882B1Lower electrode design for higher uniformityLAM RES CORP·Filed 1999·Granted Apr 2, 2002·57 cites·28 claims
- 3489US6433484B1Wafer area pressure controlLAM RES CORP·Filed 2000·Granted Aug 13, 2002·47 cites·27 claims
- 3589US5472565ATopology induced plasma enhancement for etched uniformity improvementLAM RES CORP·Filed 1993·Granted Dec 5, 1995·53 cites·18 claims
- 3688US10087523B2Vapor delivery method and apparatus for solid and liquid precursorsLAM RES CORP·Filed 2017·Granted Oct 2, 2018·5 cites·23 claims
- 3788US8282698B2Reduction of particle contamination produced by moving mechanisms in a process toolLENZ ERIC H·Filed 2010·Granted Oct 9, 2012·10 cites·35 claims
- 3887US8464736B1Reclaim chemistryLENZ ERIC·Filed 2007·Granted Jun 18, 2013·13 cites·16 claims
- 3987US6669811B2Linear drive system for use in a plasma processing systemLAM RES CORP·Filed 2001·Granted Dec 30, 2003·20 cites·24 claims
- 4086US6838012B2Methods for etching dielectric materialsLAM RES CORP·Filed 2002·Granted Jan 4, 2005·36 cites·29 claims
- 4186US5609720AThermal control of semiconductor wafer during reactive ion etchingLAM RES CORP·Filed 1995·Granted Mar 11, 1997·90 cites·17 claims
- 4285US9951423B2Systems and methods for measuring entrained vaporLAM RES CORP·Filed 2015·Granted Apr 24, 2018·6 cites·23 claims
- 4385US9234775B2Methods for verifying gas flow rates from a gas supply system into a plasma processing chamberLAM RES CORP·Filed 2013·Granted Jan 12, 2016·6 cites·25 claims
- 4484US7405521B2Multiple frequency plasma processor method and apparatusLAM RES CORP·Filed 2003·Granted Jul 29, 2008·35 cites·45 claims
- 4584US6863784B2Linear drive system for use in a plasma processing systemLAM RES CORP·Filed 2003·Granted Mar 8, 2005·15 cites·33 claims
- 4683US7393432B2RF ground switch for plasma processing systemLAM RES CORP·Filed 2004·Granted Jul 1, 2008·19 cites·17 claims
- 4783US5933314AMethod and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucksLAM RES CORP·Filed 1997·Granted Aug 3, 1999·98 cites·17 claims
- 4882US12203168B2Metal depositionLAM RES CORP·Filed 2020·Granted Jan 21, 2025·1 cites·20 claims
- 4982US9111724B2Apparatus and method for controlling plasma potentialKEIL DOUGLAS·Filed 2010·Granted Aug 18, 2015·5 cites·18 claims
- 5081US5942074ASingle-piece gas director for plasma reactorsLAM RES CORP·Filed 1996·Granted Aug 24, 1999·36 cites·10 claims
Showing the top 50 of 93 patent records by PatentIndex Score.
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