Inventor
WADA YUICHI
JP61 patents
⚠️ This page may combine multiple inventors who share the name “WADA YUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
23 patentsUS6488984B1Dec 3, 2002
Film deposition method and apparatus
APPLIED MATERIALS INC231 citations98
USD913979SMar 23, 2021
Inner shield for a substrate processing chamber
APPLIED MATERIALS INC27 citations93
US6210539B1Apr 3, 2001
Method and apparatus for producing a uniform density plasma above a substrate
APPLIED MATERIALS INC33 citations93
US6440282B1Aug 27, 2002
Sputtering reactor and method of using an unbalanced magnetron
APPLIED MATERIALS INC75 citations92
US7001788B2Feb 21, 2006
Maskless fabrication of waveguide mirrors
APPLIED MATERIALS INC15 citations84
USD931241SSep 21, 2021
Lower shield for a substrate processing chamber
APPLIED MATERIALS INC5 citations83
US7101725B2Sep 5, 2006
Solution to thermal budget
APPLIED MATERIALS INC9 citations74
US6852626B1Feb 8, 2005
Film deposition method and apparatus
APPLIED MATERIALS INC9 citations73
USD973609SDec 27, 2022
Upper shield with showerhead for a process chamber
APPLIED MATERIALS INC5 citations71
US10991617B2Apr 27, 2021
Methods and apparatus for cleaving of semiconductor substrates
APPLIED MATERIALS INC2 citations69
US12148629B2Nov 19, 2024
Shutter disk
APPLIED MATERIALS INC0 citations62
US11913107B2Feb 27, 2024
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations62
US11862480B2Jan 2, 2024
Shutter disk
APPLIED MATERIALS INC0 citations62
USD971167SNov 29, 2022
Lower shield for a substrate processing chamber
APPLIED MATERIALS INC0 citations62
US6576567B1Jun 10, 2003
Film deposition method and apparatus for semiconductor devices
APPLIED MATERIALS INC3 citations62
US6511538B1Jan 28, 2003
Film deposition method and apparatus for semiconductor devices
APPLIED MATERIALS INC3 citations62
US11629409B2Apr 18, 2023
Inline microwave batch degas chamber
APPLIED MATERIALS INC0 citations59
US11610807B2Mar 21, 2023
Methods and apparatus for cleaving of semiconductor substrates
APPLIED MATERIALS INC0 citations59
US11587799B2Feb 21, 2023
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC0 citations59
US11569122B2Jan 31, 2023
Methods and apparatus for cleaving of semiconductor substrates
APPLIED MATERIALS INC0 citations59
US11289357B2Mar 29, 2022
Methods and apparatus for high voltage electrostatic chuck protection
APPLIED MATERIALS INC0 citations59
US11171017B2Nov 9, 2021
Shutter disk
APPLIED MATERIALS INC0 citations59
US11881385B2Jan 23, 2024
Methods and apparatus for reducing defects in preclean chambers
APPLIED MATERIALS INC0 citations58
MITSUBISHI ELECTRIC CORP
10 patentsUS4451718AMay 29, 1984
Circuit breaker
MITSUBISHI ELECTRIC CORP49 citations92
US4616203AOct 7, 1986
Electromagnetic contactor
MITSUBISHI ELECTRIC CORP24 citations81
US4628163ADec 9, 1986
Power switch
MITSUBISHI ELECTRIC CORP10 citations73
US4596909AJun 24, 1986
Electromagnetic contactor
MITSUBISHI ELECTRIC CORP8 citations73
US4263574AApr 21, 1981
Slit type current limiting fuse
MITSUBISHI ELECTRIC CORP13 citations73
US4539451ASep 3, 1985
Switch
MITSUBISHI ELECTRIC CORP11 citations70
US4786770ANov 22, 1988
Switchgear
MITSUBISHI ELECTRIC CORP16 citations69
US4652707AMar 24, 1987
Power switch
MITSUBISHI ELECTRIC CORP5 citations62
US4642429AFeb 10, 1987
Switch
MITSUBISHI ELECTRIC CORP4 citations62
US4733319AMar 22, 1988
High-speed current limiting circuit breaker
MITSUBISHI ELECTRIC CORP5 citations61
HITACHI INT ELECTRIC INC
9 patentsUS9190299B2Nov 17, 2015
Apparatus for manufacturing semiconductor device, method of manufacturing semiconductor device, and recording medium
HITACHI INT ELECTRIC INC7 citations83
US9587313B2Mar 7, 2017
Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC3 citations72
US10480069B2Nov 19, 2019
Storage device, vaporizer and substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations69
US9816182B2Nov 14, 2017
Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
HITACHI INT ELECTRIC INC6 citations69
US7955948B2Jun 7, 2011
Manufacturing method of semiconductor device
HITACHI INT ELECTRIC INC2 citations63
US10604839B2Mar 31, 2020
Substrate processing apparatus, method of manufacturing semiconductor device, and method of processing substrate
HITACHI INT ELECTRIC INC1 citations61
US10597780B2Mar 24, 2020
Substrate processing apparatus, heater and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
USD795209SAug 22, 2017
Heater for semiconductor thermal process
HITACHI INT ELECTRIC INC1 citations52
USD793975SAug 8, 2017
Heater for semiconductor thermal process
HITACHI INT ELECTRIC INC0 citations52
TOKYO ELECTRON LTD
3 patentsTEL VARIAN LIMITED
2 patentsAPPLIED MATERIAL INC
1 patentTOKAI RUBBER IND INC
1 patentKOKUSAI ELECTRIC CORP
1 patentShowing the top 50 of 61 patents by PatentIndex Score.