Inventor · disambiguated record
Mandyam Sriram
Also filed as: SRIRAM MANDYAM · SRIRAM MANDYAM A · SRIRAM MANDYAM AMMANJEE
58 granted patents·24 pending applications·2,898 citations·filing 1997–2023
99Inventor score
Files withAPPLIED MATERIALS INC39NOVELLUS SYSTEMS INC22ANTONELLI GEORGE ANDREW4FOX KEITH3CHATTOPADHYAY KAUSHIK2
Top patents by PatentIndex Score
82 records- 0198US10043655B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2017·Granted Aug 7, 2018·28 cites·20 claims
- 0298US9570274B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2015·Granted Feb 14, 2017·30 cites·11 claims
- 0398US8956983B2Conformal doping via plasma activated atomic layer deposition and conformal film depositionSWAMINATHAN SHANKAR·Filed 2012·Granted Feb 17, 2015·588 cites·41 claims
- 0498US8524612B2Plasma-activated deposition of conformal filmsLI MING·Filed 2011·Granted Sep 3, 2013·397 cites·18 claims
- 0598US8101531B1Plasma-activated deposition of conformal filmsLI MING·Filed 2010·Granted Jan 24, 2012·96 cites·18 claims
- 0698US7727880B1Protective self-aligned buffer layers for damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2007·Granted Jun 1, 2010·332 cites·19 claims
- 0798US7648899B1Interfacial layers for electromigration resistance improvement in damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2008·Granted Jan 19, 2010·78 cites·27 claims
- 0897US9611544B2Plasma activated conformal dielectric film depositionLAVOIE ADRIEN·Filed 2011·Granted Apr 4, 2017·44 cites·44 claims
- 0997US8999859B2Plasma activated conformal dielectric film depositionNOVELLUS SYSTEMS INC·Filed 2013·Granted Apr 7, 2015·56 cites·25 claims
- 1097US8728956B2Plasma activated conformal film depositionLAVOIE ADRIEN·Filed 2011·Granted May 20, 2014·541 cites·39 claims
- 1197US8637411B2Plasma activated conformal dielectric film depositionSWAMINATHAN SHANKAR·Filed 2011·Granted Jan 28, 2014·99 cites·44 claims
- 1297US7858510B1Interfacial layers for electromigration resistance improvement in damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2010·Granted Dec 28, 2010·50 cites·22 claims
- 1397US7576006B1Protective self-aligned buffer layers for damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2007·Granted Aug 18, 2009·55 cites·19 claims
- 1497US6017654ACathode materials for lithium-ion secondary cellsUNIV CARNEGIE MELLON·Filed 1997·Granted Jan 25, 2000·157 cites·36 claims
- 1596US9230800B2Plasma activated conformal film depositionNOVELLUS SYSTEMS INC·Filed 2014·Granted Jan 5, 2016·41 cites·22 claims
- 1696US7906817B1High compressive stress carbon liners for MOS devicesNOVELLUS SYSTEMS INC·Filed 2008·Granted Mar 15, 2011·40 cites·8 claims
- 1795US9023731B2Carbon deposition-etch-ash gap fill processNOVELLUS SYSTEMS INC·Filed 2013·Granted May 5, 2015·36 cites·20 claims
- 1894US10236197B2Processing system containing an isolation region separating a deposition chamber from a treatment chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 19, 2019·11 cites·20 claims
- 1994US8741394B2In-situ deposition of film stacksHAVERKAMP JASON·Filed 2010·Granted Jun 3, 2014·25 cites·12 claims
- 2094US8288292B2Depositing conformal boron nitride film by CVD without plasmaANTONELLI GEORGE ANDREW·Filed 2010·Granted Oct 16, 2012·16 cites·30 claims
- 2194US8217513B2Remote plasma processing of interface surfacesANTONELLI GEORGE ANDREW·Filed 2011·Granted Jul 10, 2012·24 cites·19 claims
- 2294US8084339B2Remote plasma processing of interface surfacesANTONELLI GEORGE ANDREW·Filed 2009·Granted Dec 27, 2011·29 cites·16 claims
- 2394US8021486B1Protective self-aligned buffer layers for damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2010·Granted Sep 20, 2011·14 cites·18 claims
- 2493US8709551B2Smooth silicon-containing filmsFOX KEITH·Filed 2010·Granted Apr 29, 2014·25 cites·23 claims
- 2591US7704873B1Protective self-aligned buffer layers for damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2007·Granted Apr 27, 2010·14 cites·27 claims
- 2688US10214816B2PECVD apparatus for in-situ deposition of film stacksNOVELLUS SYSTEMS INC·Filed 2014·Granted Feb 26, 2019·6 cites·9 claims
- 2786US11028477B2Bottom-up gap-fill by surface poisoning treatmentAPPLIED MATERIALS INC·Filed 2016·Granted Jun 8, 2021·4 cites·15 claims
- 2886US8317923B1Protective self-aligned buffer layers for damascene interconnectsCHATTOPADHYAY KAUSHIK·Filed 2010·Granted Nov 27, 2012·8 cites·20 claims
- 2986US7998881B1Method for making high stress boron-doped carbon filmsNOVELLUS SYSTEMS INC·Filed 2008·Granted Aug 16, 2011·11 cites·17 claims
- 3085US9028924B2In-situ deposition of film stacksNOVELLUS SYSTEMS INC·Filed 2012·Granted May 12, 2015·7 cites·14 claims
- 3184US8362571B1High compressive stress carbon liners for MOS devicesNOVELLUS SYSTEMS INC·Filed 2011·Granted Jan 29, 2013·5 cites·17 claims
- 3283US12385138B2Plasma-enhanced deposition of film stacksNOVELLUS SYSTEMS INC·Filed 2023·Granted Aug 12, 2025·0 cites·11 claims
- 3383US9117668B2PECVD deposition of smooth silicon filmsHOLLISTER ALICE·Filed 2012·Granted Aug 25, 2015·8 cites·22 claims
- 3483US7799671B1Interfacial layers for electromigration resistance improvement in damascene interconnectsNOVELLUS SYSTEMS INC·Filed 2009·Granted Sep 21, 2010·11 cites·21 claims
- 3582US8479683B2Apparatus including a plasma chamber and controller including instructions for forming a boron nitride layerANTONELLI GEORGE ANDREW·Filed 2012·Granted Jul 9, 2013·4 cites·1 claims
- 3678US11530480B2Injector for batch processing and methods of useAPPLIED MATERIALS INC·Filed 2022·Granted Dec 20, 2022·0 cites·11 claims
- 3776US10273578B2Top lamp module for carousel deposition chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 30, 2019·1 cites·17 claims
- 3875US12051734B2PMOS high-k metal gatesAPPLIED MATERIALS INC·Filed 2022·Granted Jul 30, 2024·0 cites·13 claims
- 3974US11043386B2Enhanced spatial ALD of metals through controlled precursor mixingAPPLIED MATERIALS INC·Filed 2018·Granted Jun 22, 2021·1 cites·19 claims
- 4073US2024096688A1Single wafer processing environments with spatial separationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4171US11923172B2Paired dynamic parallel plate capacitively coupled plasmasAPPLIED MATERIALS INC·Filed 2022·Granted Mar 5, 2024·0 cites·17 claims
- 4270US11887856B2Enhanced spatial ALD of metals through controlled precursor mixingAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·17 claims
- 4369US12463093B2Method of tuning film properties of metal nitride using plasmaAPPLIED MATERIALS INC·Filed 2023·Granted Nov 4, 2025·0 cites·7 claims
- 4466US11552177B2PMOS high-K metal gatesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·7 claims
- 4564US11261525B2Injector for batch processing and methods of useAPPLIED MATERIALS INC·Filed 2016·Granted Mar 1, 2022·0 cites·15 claims
- 4663US12062545B2Fluorine-free tungsten ALD for dielectric selectivity improvementAPPLIED MATERIALS INC·Filed 2021·Granted Aug 13, 2024·0 cites·13 claims
- 4762US11282676B2Paired dynamic parallel plate capacitively coupled plasmasAPPLIED MATERIALS INC·Filed 2019·Granted Mar 22, 2022·0 cites·19 claims
- 4860US9443716B2Precise critical dimension control using bilayer ALDAPPLIED MATERIALS INC·Filed 2015·Granted Sep 13, 2016·1 cites·20 claims
- 4959US12114488B2Enhancing gapfill performance of dram word lineAPPLIED MATERIALS INC·Filed 2021·Granted Oct 8, 2024·0 cites·13 claims
- 5059US2021384035A1Fluorine-Free Tungsten ALD And Tungsten Selective CVD For DielectricsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
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