Inventor
INANAMI RYOICHI
JP35 patents
⚠️ This page may combine multiple inventors who share the name “INANAMI RYOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
18 patentsUS6560768B2May 6, 2003
Circuit pattern design method, circuit pattern design system, and recording medium
TOSHIBA KK28 citations92
US7449700B2Nov 11, 2008
Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device
TOSHIBA KK17 citations84
US7102147B2Sep 5, 2006
Charged particle beam exposure method and method for producing charged particle beam exposure data
TOSHIBA KK8 citations74
US6756159B2Jun 29, 2004
Method of preparing exposure data and method of preparing aperture mask data
TOSHIBA KK8 citations74
US6718532B2Apr 6, 2004
Charged particle beam exposure system using aperture mask in semiconductor manufacture
TOSHIBA KK10 citations74
US6543044B2Apr 1, 2003
Method of extracting characters and computer-readable recording medium
TOSHIBA KK11 citations73
US6481004B2Nov 12, 2002
Circuit pattern design method, exposure method, charged-particle beam exposure system
TOSHIBA KK9 citations73
US7683352B2Mar 23, 2010
Electron beam writing data creating method and electron beam writing data creating apparatus
TOSHIBA KK3 citations63
US7368737B2May 6, 2008
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
TOSHIBA KK2 citations63
US7079994B2Jul 18, 2006
Method and system for producing semiconductor devices
TOSHIBA KK5 citations63
USRE46390EMay 2, 2017
Pattern forming method, processing method, and processing apparatus
TOSHIBA KK0 citations52
US9329490B2May 3, 2016
Pattern formation method, mask for exposure, and exposure apparatus
TOSHIBA KK0 citations52
US7972932B2Jul 5, 2011
Mark forming method and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7914958B2Mar 29, 2011
Semiconductor device manufacturing method
TOSHIBA KK0 citations52
US7301161B2Nov 27, 2007
Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus
TOSHIBA KK0 citations52
USRE46191ENov 1, 2016
Imprint pattern forming method
TOSHIBA KK0 citations51
US9957630B2May 1, 2018
Pattern transfer mold and pattern formation method
TOSHIBA KK0 citations41
US7459705B2Dec 2, 2008
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
TOSHIBA KK0 citations41
INANAMI RYOICHI
5 patentsUS9021983B2May 5, 2015
Stage apparatus and process apparatus
INANAMI RYOICHI7 citations83
US8227151B2Jul 24, 2012
Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device
INANAMI RYOICHI10 citations83
US8468480B2Jun 18, 2013
Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device
INANAMI RYOICHI8 citations82
US8647106B2Feb 11, 2014
Template and method of manufacturing a semiconductor device
INANAMI RYOICHI4 citations71
US8071263B2Dec 6, 2011
Reflective mask and manufacturing method for reflective mask
INANAMI RYOICHI0 citations40
TOSHIBA MEMORY CORP
3 patentsUSRE46901EJun 19, 2018
Drop recipe creating method, database creating method and medium
TOSHIBA MEMORY CORP1 citations52
USRE47271EMar 5, 2019
Imprint recipe creating device and imprint device
TOSHIBA MEMORY CORP0 citations51
USRE47093EOct 23, 2018
Imprint pattern forming method
TOSHIBA MEMORY CORP0 citations51