Inventor · disambiguated record
Lu Chen
Also filed as: CHEN LU · CHEN LU-CHANG
13 granted patents·1 pending application·68 citations·filing 2001–2024
89Inventor score
Top patents by PatentIndex Score
14 records- 0194US11680313B2Selective deposition on non-metallic surfacesAPPLIED MATERIALS INC·Filed 2020·Granted Jun 20, 2023·3 cites·18 claims
- 0293US8605275B2Detecting defects on a waferCHEN LU·Filed 2011·Granted Dec 10, 2013·22 cites·20 claims
- 0393US8223327B2Systems and methods for detecting defects on a waferCHEN LU·Filed 2009·Granted Jul 17, 2012·24 cites·24 claims
- 0487US10605744B2Systems and methods for detecting defects on a waferKLA TENCOR CORP·Filed 2018·Granted Mar 31, 2020·3 cites·3 claims
- 0586US9880107B2Systems and methods for detecting defects on a waferKLA TENCOR CORP·Filed 2013·Granted Jan 30, 2018·5 cites·44 claims
- 0685US8467047B2Systems and methods for detecting defects on a waferCHEN LU·Filed 2012·Granted Jun 18, 2013·5 cites·17 claims
- 0772US2024183028A1Methods and apparatus for precleaning and treating wafer surfacesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0871US9347891B2Wafer and reticle inspection systems and methods for selecting illumination pupil configurationsKLA TENCOR CORP·Filed 2013·Granted May 24, 2016·1 cites·23 claims
- 0959US11939666B2Methods and apparatus for precleaning and treating wafer surfacesAPPLIED MATERIALS INC·Filed 2020·Granted Mar 26, 2024·0 cites·15 claims
- 1057US9523646B2Wafer and reticle inspection systems and methods for selecting illumination pupil configurationsKLA TENCOR CORP·Filed 2016·Granted Dec 20, 2016·0 cites·27 claims
- 1152US10930550B2Barrier for copper metallization and methods of formingAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·18 claims
- 1251US6696689B2Method and apparatus for avoiding driver gas contamination in an ion implanter gas supply moduleTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Feb 24, 2004·2 cites·18 claims
- 1349US6722022B2Apparatus for calibrating the position of a wafer platform in an ion implanterTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Apr 20, 2004·3 cites·6 claims
- 1436US6605812B1Method reducing the effects of N2 gas contamination in an ion implanterTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Aug 12, 2003·0 cites·20 claims
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