Inventor
TATENO HIDETO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “TATENO HIDETO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
16 patentsUSD741823SOct 27, 2015
Vaporizer for substrate processing apparatus
HITACHI INT ELECTRIC INC49 citations96
US11476112B2Oct 18, 2022
Substrate processing apparatus
HITACHI INT ELECTRIC INC6 citations85
USD788705SJun 6, 2017
Heat insulating unit for substrate processing apparatus
HITACHI INT ELECTRIC INC6 citations84
USD788706SJun 6, 2017
Heat insulating unit for substrate processing apparatus
HITACHI INT ELECTRIC INC9 citations84
USD788038SMay 30, 2017
Heat insulating unit for substrate processing apparatus
HITACHI INT ELECTRIC INC14 citations84
USD778457SFeb 7, 2017
Reaction tube
HITACHI INT ELECTRIC INC8 citations84
USD778458SFeb 7, 2017
Reaction tube
HITACHI INT ELECTRIC INC10 citations84
US9190299B2Nov 17, 2015
Apparatus for manufacturing semiconductor device, method of manufacturing semiconductor device, and recording medium
HITACHI INT ELECTRIC INC7 citations83
USD837706SJan 8, 2019
Exhaust pipe
HITACHI INT ELECTRIC INC2 citations73
USD788704SJun 6, 2017
Heat insulating unit for substrate processing apparatus
HITACHI INT ELECTRIC INC4 citations73
US9587313B2Mar 7, 2017
Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC3 citations72
US9793112B2Oct 17, 2017
Method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations71
US9816182B2Nov 14, 2017
Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium
HITACHI INT ELECTRIC INC6 citations69
US12087598B2Sep 10, 2024
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations62
USD813065SMar 20, 2018
Gas sampling cell
HITACHI INT ELECTRIC INC0 citations51
US9502239B2Nov 22, 2016
Substrate processing method, substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations43
KOKUSAI ELECTRIC CORP
7 patentsUS11869764B2Jan 9, 2024
Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP1 citations73
USD1053156SDec 3, 2024
Furnace for substrate processing apparatus
KOKUSAI ELECTRIC CORP2 citations70
US12368043B2Jul 22, 2025
Substrate processing apparatus, processing method, and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations62
USD1070797SApr 15, 2025
Furnace for substrate processing apparatus
KOKUSAI ELECTRIC CORP1 citations61
US12334401B2Jun 17, 2025
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations52
US11499224B2Nov 15, 2022
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations50
US11538716B2Dec 27, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations49