Inventor
MAKINO AKITAKA
JP29 patents
⚠️ This page may combine multiple inventors who share the name “MAKINO AKITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
18 patentsUSD556704SDec 4, 2007
Grounded electrode for a plasma processing apparatus
HITACHI HIGH TECH CORP445 citations99
USD557226SDec 11, 2007
Electrode cover for a plasma processing apparatus
HITACHI HIGH TECH CORP619 citations98
US7828928B2Nov 9, 2010
Vacuum processing apparatus
HITACHI HIGH TECH CORP10 citations92
US7335277B2Feb 26, 2008
Vacuum processing apparatus
HITACHI HIGH TECH CORP24 citations92
USD557425SDec 11, 2007
Cover ring for a plasma processing apparatus
HITACHI HIGH TECH CORP31 citations92
US7247207B2Jul 24, 2007
Vacuum processing apparatus
HITACHI HIGH TECH CORP11 citations92
US7416633B2Aug 26, 2008
Plasma processing apparatus
HITACHI HIGH TECH CORP9 citations84
US7194821B2Mar 27, 2007
Vacuum processing apparatus and vacuum processing method
HITACHI HIGH TECH CORP12 citations83
US6850012B2Feb 1, 2005
Plasma processing apparatus
HITACHI HIGH TECH CORP10 citations74
US7674351B2Mar 9, 2010
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations63
US7641069B2Jan 5, 2010
Vacuum processing apparatus
HITACHI HIGH TECH CORP3 citations63
US7322561B2Jan 29, 2008
Vacuum processing apparatus
HITACHI HIGH TECH CORP2 citations63
US7833382B2Nov 16, 2010
Vacuum processing apparatus
HITACHI HIGH TECH CORP1 citations62
US11710619B2Jul 25, 2023
Vacuum processing apparatus
HITACHI HIGH TECH CORP1 citations60
US7976632B2Jul 12, 2011
Vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations52
US7807581B2Oct 5, 2010
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US10103007B2Oct 16, 2018
Plasma processing apparatus with gas feed and evacuation conduit
HITACHI HIGH TECH CORP0 citations41
US8048259B2Nov 1, 2011
Vacuum processing apparatus
HITACHI HIGH TECH CORP0 citations38