Inventor · disambiguated record
Abdurrahman Sezginer
Also filed as: SEZGINER ABDURRAHMAN
108 granted patents·5 pending applications·5,059 citations·filing 1989–2023
99Inventor score
Files withSCHLUMBERGER TECHNOLOGY CORP30KLA TENCOR CORP22TOKYO ELECTRON LTD14CADENCE DESIGN SYSTEMS INC12INVARIUM INC7
Top patents by PatentIndex Score
113 records- 0199US7480891B2Method and apparatus of model-based photomask synthesisCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jan 20, 2009·248 cites·55 claims
- 0299US6819426B2Overlay alignment metrology using diffraction gratingsTHERMA WAVE INC·Filed 2002·Granted Nov 16, 2004·373 cites·31 claims
- 0398US7568174B2Method for checking printability of a lithography targetCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Jul 28, 2009·185 cites·33 claims
- 0498US7506300B2Apparatus and method for breaking up and merging polygonsCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Mar 17, 2009·232 cites·27 claims
- 0598US7046376B2Overlay targets with isolated, critical-dimension features and apparatus to measure overlayTHERMA WAVE INC·Filed 2003·Granted May 16, 2006·159 cites·13 claims
- 0698US6753961B1Spectroscopic ellipsometer without rotating componentsTHERMA WAVE INC·Filed 2001·Granted Jun 22, 2004·154 cites·29 claims
- 0798US5055788ABorehole measurement of NMR characteristics of earth formationsSCHLUMBERGER TECHNOLOGY CORP·Filed 1989·Granted Oct 8, 1991·143 cites·13 claims
- 0898US5055787ABorehole measurement of NMR characteristics of earth formationsSCHLUMBERGER TECHNOLOGY CORP·Filed 1989·Granted Oct 8, 1991·206 cites·60 claims
- 0998US5023551ANuclear magnetic resonance pulse sequences for use with borehole logging toolsSCHLUMBERGER DOLL RESEARCH·Filed 1989·Granted Jun 11, 1991·266 cites·62 claims
- 1097US9494535B2Scatterometry-based imaging and critical dimension metrologyKLA TENCOR CORP·Filed 2015·Granted Nov 15, 2016·23 cites·25 claims
- 1197US6522137B1Two-dimensional magnetic resonance imaging in a boreholeSCHLUMBERGER TECHNOLOGY CORP·Filed 2000·Granted Feb 18, 2003·140 cites·43 claims
- 1297US5629623APulsed nuclear magnetism tool for formation evaluation while drillingSCHLUMBERGER TECHNOLOGY CORP·Filed 1994·Granted May 13, 1997·142 cites·10 claims
- 1396US7088451B2Scatterometry by phase sensitive reflectometerTOKYO ELECTRON LTD·Filed 2005·Granted Aug 8, 2006·42 cites·18 claims
- 1496US6985232B2Scatterometry by phase sensitive reflectometerTOKYO ELECTRON LTD·Filed 2003·Granted Jan 10, 2006·85 cites·21 claims
- 1596US5705927APulsed nuclear magnetism tool for formation evaluation while drilling including a shortened or truncated CPMG sequenceSCHLUMBERGER TECHNOLOGY CORP·Filed 1996·Granted Jan 6, 1998·145 cites·9 claims
- 1695US7856613B1Method for self-aligned doubled patterning lithographyCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Dec 21, 2010·31 cites·15 claims
- 1795US7600212B2Method of compensating photomask data for the effects of etch and lithography processesCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Oct 6, 2009·39 cites·55 claims
- 1895US7333200B2Overlay metrology method and apparatus using more than one grating per measurement directionTOKYO ELECTRON LTD·Filed 2006·Granted Feb 19, 2008·30 cites·8 claims
- 1995US5363041ADetermining bound and unbound fluid volumes using nuclear magnetic resonance pulse sequencesSCHLUMBERGER TECHNOLOGY CORP·Filed 1992·Granted Nov 8, 1994·125 cites·21 claims
- 2094US7849423B1Method of verifying photomask data based on models of etch and lithography processesCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Dec 7, 2010·61 cites·21 claims
- 2194US7444615B2Calibration on wafer sweet spotsINVARIUM INC·Filed 2005·Granted Oct 28, 2008·25 cites·25 claims
- 2294US7266800B2Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processesINVARIUM INC·Filed 2004·Granted Sep 4, 2007·94 cites·49 claims
- 2394US7042569B2Overlay alignment metrology using diffraction gratingsTOKYO ELECTRON LTD·Filed 2004·Granted May 9, 2006·70 cites·12 claims
- 2494US6778273B2Polarimetric scatterometer for critical dimension measurements of periodic structuresTHERMA WAVE INC·Filed 2002·Granted Aug 17, 2004·51 cites·12 claims
- 2593US9547892B2Apparatus and methods for predicting wafer-level defect printabilityKLA TENCOR CORP·Filed 2015·Granted Jan 17, 2017·7 cites·29 claims
- 2693US8782586B2Method, system, and program product for routing an integrated circuit to be manufactured by doubled patterningSEZGINER ABDURRAHMAN·Filed 2009·Granted Jul 15, 2014·51 cites·24 claims
- 2792US9478019B2Reticle inspection using near-field recoveryKLA TENCOR CORP·Filed 2015·Granted Oct 25, 2016·7 cites·41 claims
- 2892US8069423B2System and method for model based multi-patterning optimizationGHAN JUSTIN·Filed 2008·Granted Nov 29, 2011·30 cites·25 claims
- 2992US7193715B2Measurement of overlay using diffraction gratings when overlay exceeds the grating periodTOKYO ELECTRON LTD·Filed 2003·Granted Mar 20, 2007·46 cites·22 claims
- 3092US5796252ANuclear magnetic resonance borehole logging apparatus and method for ascertaining a volume of hydrocarbons independent of a diffusion coefficientSCHLUMBERGER TECHNOLOGY CORP·Filed 1997·Granted Aug 18, 1998·163 cites·34 claims
- 3191US11921052B2Inspection with previous step subtractionKLA CORP·Filed 2023·Granted Mar 5, 2024·1 cites·38 claims
- 3291US9335206B2Wave front aberration metrology of optics of EUV mask inspection systemKLA TENCOR CORP·Filed 2013·Granted May 10, 2016·8 cites·25 claims
- 3391US8279409B1System and method for calibrating a lithography modelSEZGINER ABDURRAHMAN·Filed 2009·Granted Oct 2, 2012·45 cites·15 claims
- 3491US5557201APulsed nuclear magnetism tool for formation evaluation while drillingSCHLUMBERGER TECHNOLOGY CORP·Filed 1995·Granted Sep 17, 1996·119 cites·44 claims
- 3590US10395361B2Apparatus and methods for inspecting reticlesKLA TENCOR CORP·Filed 2017·Granted Aug 27, 2019·4 cites·26 claims
- 3690US9430824B2Machine learning method and apparatus for inspecting reticlesKLA TENCOR CORP·Filed 2014·Granted Aug 30, 2016·10 cites·24 claims
- 3790US7519940B2Apparatus and method for compensating a lithography projection toolCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Apr 14, 2009·13 cites·35 claims
- 3890US7230703B2Apparatus and method for measuring overlay by diffraction gratingsTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·38 cites·20 claims
- 3989US7913197B1Method for double patterning lithographyCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Mar 22, 2011·23 cites·24 claims
- 4089US7289219B2Polarimetric scatterometry methods for critical dimension measurements of periodic structuresTOKYO ELECTRON LTD·Filed 2005·Granted Oct 30, 2007·10 cites·20 claims
- 4189US5486761ANuclear magnetic resonance measuring apparatusSCHLUMBERGER TECHNOLOGY CORP·Filed 1994·Granted Jan 23, 1996·60 cites·18 claims
- 4289US5376884ANuclear magnetic resonance measuring apparatusSCHLUMBERGER TECHNOLOGY CORP·Filed 1993·Granted Dec 27, 1994·61 cites·25 claims
- 4388US11270430B2Wafer inspection using difference imagesKLA TENCOR CORP·Filed 2018·Granted Mar 8, 2022·5 cites·18 claims
- 4488US9805462B2Machine learning method and apparatus for inspecting reticlesKLA TENCOR CORP·Filed 2017·Granted Oct 31, 2017·5 cites·26 claims
- 4588US9292627B2System and method for modifying a data set of a photomaskCADENCE DESIGN SYSTEMS INC·Filed 2013·Granted Mar 22, 2016·5 cites·24 claims
- 4687US7170604B2Overlay metrology method and apparatus using more than one grating per measurement directionTOKYO ELECTRON LTD·Filed 2003·Granted Jan 30, 2007·35 cites·5 claims
- 4786US8572517B2System and method for modifying a data set of a photomaskPRAMANIK DIPANKAR·Filed 2008·Granted Oct 29, 2013·9 cites·11 claims
- 4886US7283237B2Overlay targets with isolated, critical-dimension features and apparatus to measure overlayTOKYO ELECTRON LTD·Filed 2005·Granted Oct 16, 2007·12 cites·8 claims
- 4986US7230704B2Diffracting, aperiodic targets for overlay metrology and method to detect gross overlayTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·29 cites·23 claims
- 5086US6691779B1Wellbore antennae system and methodSCHLUMBERGER TECHNOLOGY CORP·Filed 1999·Granted Feb 17, 2004·113 cites·28 claims
Showing the top 50 of 113 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →