Inventor · disambiguated record
Allen M. Carroll
Also filed as: CARROLL ALLEN · CARROLL ALLEN M
11 granted patents·1 pending application·198 citations·filing 1983–2014
90Inventor score
Files withKLA TENCOR CORP6PERKIN ELMER CORP2APPLIED MATERIALS INC1KLA TENCOR TECH CORP1KOJIMA SHINICHI1
Top patents by PatentIndex Score
12 records- 0193US7369217B2Method and device for immersion lithographyMICRONIC LASER SYSTEMS AB·Filed 2003·Granted May 6, 2008·71 cites·31 claims
- 0290US8893059B2Pattern data system for high-performance maskless electron beam lithographyKLA TENCOR CORP·Filed 2013·Granted Nov 18, 2014·12 cites·18 claims
- 0388US4498010AVirtual addressing for E-beam lithographyPERKIN ELMER CORP·Filed 1983·Granted Feb 5, 1985·68 cites·11 claims
- 0483US8373144B1Quasi-annular reflective electron patterning deviceKLA TENCOR CORP·Filed 2010·Granted Feb 12, 2013·5 cites·16 claims
- 0578US9214344B1Pillar-supported array of micro electron lensesKLA TENCOR CORP·Filed 2014·Granted Dec 15, 2015·4 cites·20 claims
- 0675US4788431ASpecimen distance measuring systemPERKIN ELMER CORP·Filed 1987·Granted Nov 29, 1988·21 cites·18 claims
- 0774US6436607B1Border modification for proximity effect correction in lithographyAPPLIED MATERIALS INC·Filed 2000·Granted Aug 20, 2002·12 cites·16 claims
- 0870US7696498B2Electron beam lithography method and apparatus using a dynamically controlled photocathodeKLA TENCOR TECH CORP·Filed 2007·Granted Apr 13, 2010·2 cites·14 claims
- 0969US9245714B2System and method for compressed data transmission in a maskless lithography systemKLA TENCOR CORP·Filed 2013·Granted Jan 26, 2016·2 cites·34 claims
- 1065US9081287B2Methods of measuring overlay errors in area-imaging e-beam lithographyKLA TENCOR CORP·Filed 2013·Granted Jul 14, 2015·1 cites·21 claims
- 1154US7958464B1Electron beam patterningKLA TENCOR CORP·Filed 2008·Granted Jun 7, 2011·0 cites·2 claims
- 1238US2012085919A1Apparatus and methods for pattern generationKOJIMA SHINICHI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →