Inventor · disambiguated record
Alois Gutmann
Also filed as: GUTMANN ALOIS
38 granted patents·9 pending applications·775 citations·filing 1999–2014
97Inventor score
Files withINFINEON TECHNOLOGIES AG26ZHUANG HAOREN4GUTMANN ALOIS2HAN JIN-PING2INFINEON TECHNOLOGIES CORP2
Top patents by PatentIndex Score
47 records- 0199US7298009B2Semiconductor method and device with mixed orientation substrateINFINEON TECHNOLOGIES AG·Filed 2005·Granted Nov 20, 2007·588 cites·18 claims
- 0291US7687925B2Alignment marks for polarized light lithography and method for use thereofINFINEON TECHNOLOGIES AG·Filed 2005·Granted Mar 30, 2010·19 cites·17 claims
- 0385US7947431B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2010·Granted May 24, 2011·7 cites·19 claims
- 0481US9401322B2Semiconductor devices and structures thereofNAUJOK MARKUS·Filed 2011·Granted Jul 26, 2016·5 cites·24 claims
- 0580US8071261B2Lithography masks and methods of manufacture thereofGUTMANN ALOIS·Filed 2007·Granted Dec 6, 2011·6 cites·37 claims
- 0678US7629225B2Methods of manufacturing semiconductor devices and structures thereofINFINEON TECHNOLOGIES AG·Filed 2005·Granted Dec 8, 2009·6 cites·28 claims
- 0777US8361879B2Stress-inducing structures, methods, and materialsINFINEON TECHNOLOGIES AG·Filed 2008·Granted Jan 29, 2013·5 cites·30 claims
- 0877US7800182B2Semiconductor devices having pFET with SiGe gate electrode and embedded SiGe source/drain regions and methods of making the sameINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 21, 2010·6 cites·17 claims
- 0975US6379869B1Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterningINFINEON TECHNOLOGIES AG·Filed 1999·Granted Apr 30, 2002·36 cites·25 claims
- 1073US8715909B2Lithography systems and methods of manufacturing using thereofGUTMANN ALOIS·Filed 2007·Granted May 6, 2014·4 cites·23 claims
- 1172US6521542B1Method for forming dual damascene structureIBM·Filed 2000·Granted Feb 18, 2003·24 cites·20 claims
- 1271US8907444B2Stress-inducing structures, methods, and materialsINFINEON TECHNOLOGIES AG·Filed 2013·Granted Dec 9, 2014·2 cites·23 claims
- 1371US8349528B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2011·Granted Jan 8, 2013·2 cites·18 claims
- 1471US6420101B1Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposureINFINEON TECHNOLOGIES AG·Filed 2000·Granted Jul 16, 2002·15 cites·4 claims
- 1570US7799486B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 21, 2010·2 cites·30 claims
- 1670US6372408B1Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cyclesINFINEON TECHNOLOGIES AG·Filed 2000·Granted Apr 16, 2002·10 cites·4 claims
- 1769US8183129B2Alignment marks for polarized light lithography and method for use thereofMAROKKEY SAJAN·Filed 2010·Granted May 22, 2012·2 cites·27 claims
- 1869US7795107B2Method for forming isolation structuresINFINEON TECHNOLOGIES AG·Filed 2009·Granted Sep 14, 2010·3 cites·29 claims
- 1969US7674350B2Feature dimension control in a manufacturing processINFINEON TECHNOLOGIES AG·Filed 2007·Granted Mar 9, 2010·2 cites·18 claims
- 2067US7998869B2Contact patterning method with transition etch feedbackSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 16, 2011·2 cites·21 claims
- 2167US7666800B2Feature patterning methodsINFINEON TECHNOLOGIES AG·Filed 2008·Granted Feb 23, 2010·2 cites·24 claims
- 2267US6670646B2Mask and method for patterning a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 30, 2003·8 cites·15 claims
- 2366US8697339B2Semiconductor device manufacturing methodsZHUANG HAOREN·Filed 2011·Granted Apr 15, 2014·2 cites·22 claims
- 2466US8013364B2Semiconductor devices and structures thereofINFINEON TECHNOLOGIES AG·Filed 2009·Granted Sep 6, 2011·2 cites·20 claims
- 2566US7541288B2Methods of forming integrated circuit structures using insulator deposition and insulator gap filling techniquesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 2, 2009·2 cites·23 claims
- 2664US7678622B2Semiconductor method and device with mixed orientation substrateINFINEON TECHNOLOGIES AG·Filed 2007·Granted Mar 16, 2010·2 cites·23 claims
- 2764US7615840B2Device performance improvement using flowfill as material for isolation structuresINFINEON TECHNOLOGIES AG·Filed 2007·Granted Nov 10, 2009·2 cites·11 claims
- 2863US8148235B2Methods of manufacturing semiconductor devicesNAUJOK MARKUS·Filed 2009·Granted Apr 3, 2012·2 cites·46 claims
- 2961US7713824B2Small feature integrated circuit fabricationINFINEON TECHNOLOGIES CORP·Filed 2007·Granted May 11, 2010·1 cites·12 claims
- 3059US8138055B2Semiconductor devices having pFET with SiGe gate electrode and embedded SiGe source/drain regions and methods of making the sameHAN JIN-PING·Filed 2010·Granted Mar 20, 2012·1 cites·23 claims
- 3157US9373717B2Stress-inducing structures, methods, and materialsINFINEON TECHNOLOGIES AG·Filed 2014·Granted Jun 21, 2016·0 cites·20 claims
- 3256US8236699B2Contact patterning method with transition etch feedbackJEON BYUNG-GOO·Filed 2011·Granted Aug 7, 2012·1 cites·18 claims
- 3353US8377800B2Alignment marks for polarized light lithography and method for use thereofINFINEON TECHNOLOGIES AG·Filed 2012·Granted Feb 19, 2013·0 cites·20 claims
- 3453US7947606B2Methods of forming conductive features and structures thereofINFINEON TECHNOLOGIES AG·Filed 2008·Granted May 24, 2011·0 cites·24 claims
- 3551US8007985B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Aug 30, 2011·0 cites·18 claims
- 3651US7820518B2Transistor fabrication methods and structures thereofINFINEON TECHNOLOGIES AG·Filed 2008·Granted Oct 26, 2010·0 cites·23 claims
- 3750US6954002B2System and method of enhancing alignment marksINFINEON TECHNOLOGIES CORP·Filed 2002·Granted Oct 11, 2005·2 cites·10 claims
- 3847US2008286698A1Semiconductor device manufacturing methodsZHUANG HAOREN·Filed 2007·Application pending·0 cites
- 3946US2009091729A1Lithography Systems and Methods of Manufacturing Using ThereofMAROKKEY SAJAN·Filed 2007·Application pending·0 cites
- 4046US2011175148A1Methods of Forming Conductive Features and Structures ThereofYAN JIANG·Filed 2011·Application pending·0 cites
- 4146US2010120177A1Feature Dimension Control in a Manufacturing ProcessINFINEON TECHNOLOGIES AG·Filed 2010·Application pending·0 cites
- 4244US7030506B2Mask and method for using the mask in lithographic processingINFINEON TECHNOLOGIES AG·Filed 2003·Granted Apr 18, 2006·2 cites·21 claims
- 4344US2008303060A1Semiconductor devices and methods of manufacturing thereofHAN JIN-PING·Filed 2007·Application pending·0 cites
- 4439US2007239305A1Process control systems and methodsZHUANG HAOREN·Filed 2006·Application pending·0 cites
- 4538US2007249128A1Ultraviolet (UV) Radiation Treatment Methods for Subatmospheric Chemical Vapor Deposition (SACVD) of Ozone-Tetraethoxysilane (O3-TEOS)KIM JUNJUNG·Filed 2006·Application pending·0 cites
- 4638US2011006373A1Transistor StructureELLER MANFRED·Filed 2010·Application pending·0 cites
- 4735US2007190795A1Method for fabricating a semiconductor device with a high-K dielectricZHUANG HAOREN·Filed 2006·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Alois Gutmann files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →