Inventor · disambiguated record
Alexandra Pazidis
Also filed as: PAZIDIS ALEXANDRA
19 granted patents·10 pending applications·142 citations·filing 2003–2025
92Inventor score
Top patents by PatentIndex Score
29 records- 0193US7738187B2Optical element, projection lens and associated projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Jun 15, 2010·48 cites·31 claims
- 0293US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 0377US8488103B2Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the samePAZIDIS ALEXANDRA·Filed 2010·Granted Jul 16, 2013·3 cites·9 claims
- 0473US8605257B2Projection system with compensation of intensity variations and compensation element thereforPAZIDIS ALEXANDRA·Filed 2005·Granted Dec 10, 2013·7 cites·45 claims
- 0571US9297936B2Mirror with dielectric coatingZEISS CARL LASER OPTICS GMBH·Filed 2012·Granted Mar 29, 2016·3 cites·18 claims
- 0668US8928980B2Micromirror arrangement having a coating and method for the production thereofWEISSENRIEDER KARL-STEFAN·Filed 2012·Granted Jan 6, 2015·3 cites·12 claims
- 0768US7518797B2Microlithographic exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Apr 14, 2009·2 cites·24 claims
- 0867US8395753B2Microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Mar 12, 2013·1 cites·24 claims
- 0961US11982788B2Method for forming nanostructures on a surface and optical elementZEISS CARL SMT GMBH·Filed 2021·Granted May 14, 2024·0 cites·17 claims
- 1061US2025020838A1Reflective optical element for a wavelength in the extreme ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1160US2025389873A1Optical element for reflection of radiation in the vuv wavelength regionZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1258US2024035163A1Method and apparatus for deposition of at least one layer, optical element and optical arrangementZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1355US2017322343A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 1455US2014320955A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1554US7239447B2Objective with crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Jul 3, 2007·4 cites·33 claims
- 1654US2008291419A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1753US11520087B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2021·Granted Dec 6, 2022·0 cites·8 claims
- 1853US7817250B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Oct 19, 2010·0 cites·34 claims
- 1953US2008297754A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2047US8435726B2Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatusPAZIDIS ALEXANDRA·Filed 2008·Granted May 7, 2013·0 cites·29 claims
- 2146US8339575B2Off-axis objectives with rotatable optical elementPAZIDIS ALEXANDRA·Filed 2008·Granted Dec 25, 2012·0 cites·15 claims
- 2246US8049964B2Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an elementZEISS CARL SMT GMBH·Filed 2006·Granted Nov 1, 2011·0 cites·19 claims
- 2346US2007242250A1Objective with crystal lensesZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2445US9733395B2Microlithographic projection exposure apparatusKAMENOV VLADIMIR·Filed 2011·Granted Aug 15, 2017·0 cites·29 claims
- 2545US9684252B2Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an elementZACZEK CHRISTOPH·Filed 2011·Granted Jun 20, 2017·0 cites·13 claims
- 2644US2022206401A1Mirror assembly having a hydrogen barrier and optical assemblyZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 2743US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 2842US2009059189A1Pellicle for use in a microlithographic exposure apparatusZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 2931US6796664B2Method and device for decontaminating optical surfacesZEISS CARL SMT AG·Filed 2003·Granted Sep 28, 2004·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →